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Internal Stress in Nickel Thin Films Electrodeposited by a Rectangular Current Pulse Technique

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Figure

Figure 1. A plot of the current efficiency vs. the duty cycle in rectangular pulse current electrodeposition
Figure 2. Internal stress in the nickel thin film electrodeposited at a current pulse amplitude of 25 mA cm-2, an on-time of 5 ms, and an off-time of 5 ms
Figure 3. Internal stress in the nickel thin film electrodeposited at a current pulse amplitude of 25 mA cm-2 and an on-time of 5 ms for five kinds of the off-time Toff
Figure 4. Internal stress in the nickel thin film electrodeposited at a current pulse amplitude of 25 mA cm-2 and an off-time of 5 ms for three kinds of the current on-time Ton
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