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Fabrication of photonic band gap crystal using microtransfer molded templates

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Figure

FIG. 1. �a� Photoresist pattern on silicon wafer. �b� PDSM on silicon wafer.�c� Cross section of PDMS
FIG. 2. The first and second layers are deliberated offset by several epoxybars. The third layer is aligned making use of the first layer offset as areference.
FIG. 5. SEM picture of a four-layer sol-gel infiltrated 1 �m structure aftercalcination.

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