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Measurement of Amplitude and Phase Pupil Variation for EUV Lithography Systems

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Figure

Figure 1. An example of a projection lithography system used for relief pattern transfer to a wafer
Figure 2. Typical spectrum of a mercury arc lamp. 6
Figure 58. An iterative solution for both coma and trefoil obtained via the QUIP eigenfunction algorithm
Figure 60. An example of measuring a synthetic wavefront composed from only fifth-order astigmatism using the QUIP algorithm
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