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Development of Nanosphere Lithography for Semiconductor Device Applications

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Figure

Figure 1  Visual illustration of deposition method 1: a) set glass slide at small angle to surface, b) apply
Figure 2  Visual illustration of deposition method 2: a) set glass slide flat in empty container, b) fill water
Figure 3  PL system setup.
Figure 4  NSL with 2.5% sphere solution on silicon, air dried.
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