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Numerical studies of the low pressure RF plasma

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Figure

Figure 1.2: Etch reactor configurations, (a) Symmetric system, (b) Reactive
Figure 1.4: (a) The energy spectrum of secondary electrons resulting from
Figure 1.5: The intensity of the 750.4 nm line of argon shown as a func­
Figure 3.1: The total number of electron sheets, the average plasma potential
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