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High-energy, high-dose O implantation in Si

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Figure

Figure 1.6: Schematic illustration of the wafer bonding and etch-backprocess.12
Figure 1.8: Evolution of damage in SIMOX material with increasing O dose22
Figure 2.1: Schematic of the NEC 1. 7  MV Tandem ion implant er.
Figure 2.2: ScJumatic of the 2 MV van de Graaff accelerator used to perform RBS measurements.
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