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Direct Evidence of Polycrystalline Silicon Thin Films Formation during Aluminum Induced Crystallization by In Situ Heating TEM Observation

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Figure

Fig. 1Cross-sectional BF-TEM image of as-deposited a-Si/Al film.
Fig. 3A series of BF-TEM images of a-Si/Al film taken during in-situ heating at 553 K (average time interval 15 s).
Fig. 5(a) BF-TEM image, (b) to (e) micro diffraction patterns and (f) and (g) EDS line analysis profile of in-situ heated (at 473 K for0.3 ks) a-Si/Al film.
Fig. 7The Al-Si phase diagram with the metastable line and the T0 curve.

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