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Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser induced damage thresholds

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Figure

Table 1 The fabrication process parameters in this work
Figure 4(c-1) displays a magnified image for the damage
Figure 4 Damage morphologies for HfO2/Al2O3 anti-reflector deposited using the different precursor types in group two
Figure 8 shows the damage morphology of the HfO2thin film. The dominant damage morphology was seento be peeling when the laser source was used at a lowenergy (as shown in Figure 8a,b)
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