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Structural, Electrical and Optical Characterization of SrIrO3 Thin Films Prepared by Laser Ablation

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Figure

Figure 1 shows the GIXRD patterns of SrIrO3prepared at thin films Tsub ¼ RT to 973 K and PO2 ¼ 4 Pa
Fig. 2GIXRD patterns of SrIrO3 thin films prepared at Tsub ¼ 973 K andPO2 ¼ 4 to 67 Pa
Fig. 4Schematic crystal structure of IrO2 (a unit cell) (a) and SrIrO3 (1/2of a unit cell) (b).
Figure 8 compares the resistivity of SrIrO3 with those of Ir
+2

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