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DIELECTRIC PERMITTIVITY MEASURING TECHNIQUE OF FILM-SHAPED MATERIALS AT LOW MICROWAVE FREQUENCIES FROM OPEN-END COPLANAR WAVEGUIDE J. Hinojosa

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Figure

Figure 1.3-D view of the CPWs with different terminationimpedances. (a) CPW open-circuit
Figure 2. Top view of the test fixture with an open-end CPW cell.
Figure 3. Measuredand upper maximum uncertainties bounds caused by the VNA forϵReal permittivity
Figure 5.Evolution of the loss tangent bounds for two realpermittivityvaluesversusfrequencylinkedonlytomaximummeasurement uncertainties caused by the VNA (Agilent TechnologiesE5070B) [15].

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