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Non-destructive imaging for quality assurance of magnetoresistive random-access memory junctions

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Figure

Figure 1. (a) Evaluation techniques for embedded junctions. SEM images taken at the electron-beam acceleration of (b) 1 and (c) 5 keV
Figure 2. Demonstration of the effect of changing beam energy, Ee, on the maximum penetration depth of BSEs and spent electrons, simulated in CASINO
Figure 4. Demonstration of the effect of changing angle of incidence, simulated in CASINO
Figure 5. (a) and (d) Scanning electron images of a high and low TMR junction, respectively, taken at 10.5 keV
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