in the PS
TE-VSC SEMINAR
Christina Yin Vallgren
on behalf of LIU-PS project
Supervisor: Paolo Chiggiato
LIU-PS coordinator: Simone Gilardoni
Vacuum, Surfaces and Coatings Group (VSC), TE-department CERN, Geneva, Switzerland
Outline
1
Introduction
Luminosity: quantity to evaluate accelerator performance
Electron Cloud (EC): one of main limitations for High
Luminosity LHC
Electron Cloud Elimination Methods
Electron Cloud Detection Methods
2
New Electron Cloud Detectors in the PS
Existing Electron Cloud monitor in the PS
Motivation of this work
Development 1: Shielded button-type pick-up
Development 2: Electron-photon Emission
3
Implementation in the PS
The chosen magnet: MU98
Development 1: Shielded button-type pick-up
Development 2: Electron-photon Emission
Summary and Outlook
Outline
1
Introduction
Luminosity: quantity to evaluate accelerator performance
Electron Cloud (EC): one of main limitations for High
Luminosity LHC
Electron Cloud Elimination Methods
Electron Cloud Detection Methods
2New Electron Cloud Detectors in the PS
Existing Electron Cloud monitor in the PS
Motivation of this work
Development 1: Shielded button-type pick-up
Development 2: Electron-photon Emission
3
Implementation in the PS
The chosen magnet: MU98
Development 1: Shielded button-type pick-up
Development 2: Electron-photon Emission
Summary and Outlook
Luminosity:
L
[cm
−
2
s
−
1
]
Definition: a measure of the probability (rate) of particle
encounters per unit area in a collision process.
The total counting rate of a physics event
R
is given as:
R
=
L
×
σ
phys(1)
σ
phys: cross-section of studied physics process - very low
To increase
R
, increase luminosity
L
.
Luminosity:
L
[cm
−
2
s
−
1
]
The luminosity for two bunches with identical distribution profiles
is defined as:
L
=
fN
1N
24
πσ
xσ
z(2)
f
: the encountering frequency
N
1,
N
2: the numbers of particles
(the number of bunches
×
the bunch intensity)
σ
x,
σ
z: the horizontal and vertical rms bunch widths
The luminosity can be increased by:
increasing the bunch intensity or the number of bunches, i.e.
N
1,
N
2.
increasing beam focusing at the interaction zones, i.e.
σ
x,
σ
z.
Electron Cloud Build-Up
In high-energy proton, positron or ion particle accelerators, an’Electron Cloud’can
develop:
initiated by:
residual gas ionization (X+p→X++p+e−). [the PS case]
photoemission from synchrotron radiation (X+hν→X++e−).
sustained by:
subsequent secondary electron emission via a beam-induced
multipactoring process if the maximumSecondary Electron Yield (SEY)of
the beam pipe surface is larger than acritical value.
Primary Electron (PE)
Surface of the beam pipe
Secondary Electron (SE) SE 1
SE 2
The surface has SEY δ = 2
Secondary Electron Yield (SEY) γ
5 ns 5 ns 20 ns 20 ns γ γ 6 / 52
Electron Cloud Build-Up
The electron cloud leads to:
dynamic pressure rise (electron stimulated desorption).
beam instabilities.
transverse emittance blow-up (bunch expansion).
thermal load in cryogenic vacuum systems.
fast or slow beam losses.
The electron cloud: one of the main limitations for the high
luminosity LHC in the future
L
=
f
N
1N
24
π
σ
xσ
z(3)
Electron Cloud Build-Up
The electron cloud leads to:
dynamic pressure rise (electron stimulated desorption).
beam instabilities.
transverse emittance blow-up (bunch expansion).
thermal load in cryogenic vacuum systems.
fast or slow beam losses.
The electron cloud: one of the main limitations for the high
luminosity LHC in the future
L
⇓
=
f
N
1↓
N
2↓
4
π
σ
x↑
σ
z↑
(4)
Electron Cloud Elimination Methods
Elimination of electron cloud in accelerators Mechanical modification in vacuum chambers Clearing electrodes (need of additional electrical feedthroughs) Chambers with grooves and slots (reduction of beam pipe aperture)Chambers with solenoid winding (not applicable in the cases of e.g. dipoles)
Modification of material properties in
vacuum chambers
Thin Film Coatings Surface conditioning (beam scrubbing, graphitization)
TiN (works under the effect of conditioning in-situ) TiZrV (NEG) (activation at 180⁰C in-situ) Amorphous carbon thin film •δmax ~ 1.0
•No need of bakeout •Slow ageing •Large scale production
Electron Cloud Detection Methods
EC detection
Local EC measurements
Button-type
pickups Strip detectors
Integrated EC over a long section Microwave transmission Phase shift vs total beam intensity New proposal (photon detection) • Simple, fast • Used in the PS and the SPS straight sections
• Simple, fast, position • Used in the SPS
straight sections
Implemented in
the SPS dipole Measured in the LHC
Outline
1
Introduction
Luminosity: quantity to evaluate accelerator performance
Electron Cloud (EC): one of main limitations for High
Luminosity LHC
Electron Cloud Elimination Methods
Electron Cloud Detection Methods
2
New Electron Cloud Detectors in the PS
Existing Electron Cloud monitor in the PS
Motivation of this work
Development 1: Shielded button-type pick-up
Development 2: Electron-photon Emission
3Implementation in the PS
The chosen magnet: MU98
Development 1: Shielded button-type pick-up
Development 2: Electron-photon Emission
Summary and Outlook
Existing Electron Cloud monitor in the PS
First observation of EC in the PS in 2000s.
First electron cloud set-up in PS straight section 98, 2007 - bare st.st. vacuum chamber
Second set-up in PS straight section 84, 2008 - a-C coated st.st. vacuum chamber
F. Caspers, T. Kroyer, E. Mahner
Plan for the LIU-PS electron cloud studies
So far, nodirectelectron cloud monitor in any main magnet
A dipole in straight section doesnot represent the real situation in a main
magnet:
Nohigh magnetic field
Noramp of magnetic field
In straight sections with
C-magnet
In a dipole magnet Direct Electron Cloud Measurements
?
Plan for the LIU-PS electron cloud studies
Measurements of electron cloud in arealmagnet, will provide:
Predictionof the EC build-up distribution in the PS magnets for higher intensity beams in the frame of the upgrade program.
Validationof the EC simulation models and codes.
In straight sections with
C-magnet
In a dipole magnet Direct Electron Cloud Measurements
Development of New Electron Cloud
Monitors in the PS main magnet 1. Development 1 2. Development 2
Development 1: Shielded button-type pick-up
- Design
Idealposition for a pick-up: on the
top/bottom of vacuum chamber due to magnetic field
Not possibledue to space limitation in the
PS main magnet
PS magnet vacuum chamber
LHC beam
B
e- e-
shielded pick-up
DN40 flange placed 30◦to
the bottom part of the vacuum chamber
Use radial steering to move the beam towards the EC pick-up. (30mm possible provided by simulations)
Development 1: Shielded button-type pick-up
- Design
Idealposition for a pick-up: on the
top/bottom of vacuum chamber due to magnetic field
Not possibledue to space limitation in the
PS main magnet DN40 flange placed 30◦to
the bottom part of the vacuum chamber
Use radial steering to move the beam towards the EC pick-up. (30mm possible provided by simulations)
Development 1: Shielded button-type pick-up
- Design
Idealposition for a pick-up: on the
top/bottom of vacuum chamber due to magnetic field
Not possibledue to space limitation in the
PS main magnet
DN40 flange placed 30◦to
the bottom part of the vacuum chamber
Use radial steering to move the beam towards the EC pick-up. (30mm possible provided by simulations)
Shield Stainless steel plate coated by Ag?
PS magnet vacuum chamber
Different types of PS beam
Development 1: Shielded button-type pick-up
- Simulations
SCALA analysis tool within OPERA-3D to validate current
measurement efficiency
Beam displacement of 30 mm: 3.3
µ
A arrives on the pick-up
40 mm width electron cloud flux of 2x10-4 A/mm2
B (y) = 1.2 T
Bias of +60 V on the pick-up
Electron cloud current arrives on the pick-up = 16.18 nA
B (y) = 1.2 T 40 mm width electron cloud flux of 2x10-4 A/mm2
Bias of +60 V on the pick-up Electron cloud current arrives on the pick-up = 3.3 mA
Assume:
The LHC type beams creates a flux of electron cloud: Width of 40 mm and
Current density of 2×10−6A/mm2.
Dipole magnetic field: 1.2 T. Pick-up biase: +60 V.
Development 2: Electron-photon Emission
- Theory
Phenomenology of electrons impinging on a surface
e-
Sample Excited volume X-rays
UV, IR and visible cathodoluminescence Secondary electrons Auger electrons Back-scattered electrons
Schematic of the principle of metal cathodoluminescence
Development 2: Electron-photon Emission
- Theory
Phenomenology of electrons impinging on a surface
e-
Sample Excited volume X-rays
UV, IR and visible cathodoluminescence Secondary electrons Auger electrons Back-scattered electrons
Schematic of the principle of metal cathodoluminescence Einitial Evacuum Efinal Efermi level e- ELUMO EHOMO
LUMO : lowest unoccupied molecular orbital
HUMO: highest unoccupied molecularorbital Secondary electrons
(escape from the surface)
Secondary electrons (fall into unoccupied states)
h𝜐
Primary electrons ~300 eV
Unoccupied states
Occupied states
Development 2: Electron-photon Emission
- Theory => Application
Corrected cathodoluminescence spectra of clean Cu at electron energies 300 eV and 1 keV.
B. Papanicolaou and et. al., J. Phys. Chem. Solids, vol. 37, pp. 403-409, 1976.
Cathodoluminescence of copper and nickel surfaces 405
i- !- I I I I I 6 5 4 3 ENERGY (eV) 2 COPPER Clean Surface 300 eV Uncorrected Spectrum L
Fig. 2. Cathodoluminescence spectrum of clean Cu. The spectrum is uncorrected for the system response.
COPPER Clean Surface Corrected Spectrum I, 1 ,,I,,,,,,,,,,,,,,, 200 300 400 500 600 WAVELENGTH (nm)
Fig. 3. Corrected cathodoluminescence spectra of clean Cu at electron energies 300 eV and 1 keV. The 230 nm peak appears in every uncorrected lumines-
cence spectrum of copper and nickel and it is independent of the surface condition. This peak does not appear in the corrected spectra. It is due to an apparent drop in the transmittance of quartz at 240nm. Filters, lenses, P-M tube window and P-M chamber window are all made of quartz.
A comparison of the luminescence spectra for both Cu and Ni before and after oxidation (Figs. 3,6-S) shows that the 520nm peak can be associated unequivocally to the existence of an oxide layer. The peak disappeared after proper cleaning of the surface. This result substantiates our contention that thin films of insulators and semicon- ductors can luminesce much more efficiently than metals,
so for any reliable measurement of luminescence from metal the surface must be clean.
This 520nm green luminescence, which appears on oxidized surfaces of Cu and Ni, is also observed on oxidized surfaces of Ta and stainless steel. It is not observed, however, on cleaved surfaces of MO&, a layer compound with extremely inert surface property. The emitted light therefore is most likely characteristic of 02- ions rather than of the various compounds.
The green luminescence is visible in a dark room. The light is not emitted uniformly from the surface, rather, it takes the form of a uniformly distributed high density of fine points covering the whole surface, with the emission at a few scratches, introduced during mechanical polishing,
EC measurement via electron-photon emission.
Electrons in EC has relatively low energies (300 eV).
Expected photon wavelength with 300eV electrons: 200nm-700nm (visible).
Expected photon energies: from 2 eV to 5eV.
Development 2: Electron-photon Emission
- Theory => Application
Corrected cathodoluminescence spectra of clean Cu at electron energies 300 eV and 1 keV.
B. Papanicolaou and et. al., J. Phys. Chem. Solids, vol. 37, pp. 403-409, 1976.
Cathodoluminescence of copper and nickel surfaces 405
i- !- I I I I I 6 5 4 3 ENERGY (eV) 2 COPPER Clean Surface 300 eV Uncorrected Spectrum L
Fig. 2. Cathodoluminescence spectrum of clean Cu. The spectrum is uncorrected for the system response.
COPPER Clean Surface Corrected Spectrum I, 1 ,,I,,,,,,,,,,,,,,, 200 300 400 500 600 WAVELENGTH (nm)
Fig. 3. Corrected cathodoluminescence spectra of clean Cu at electron energies 300 eV and 1 keV. The 230 nm peak appears in every uncorrected lumines-
cence spectrum of copper and nickel and it is independent of the surface condition. This peak does not appear in the corrected spectra. It is due to an apparent drop in the transmittance of quartz at 240nm. Filters, lenses, P-M tube window and P-M chamber window are all made of quartz.
A comparison of the luminescence spectra for both Cu and Ni before and after oxidation (Figs. 3,6-S) shows that the 520nm peak can be associated unequivocally to the existence of an oxide layer. The peak disappeared after proper cleaning of the surface. This result substantiates our contention that thin films of insulators and semicon- ductors can luminesce much more efficiently than metals,
so for any reliable measurement of luminescence from metal the surface must be clean.
This 520nm green luminescence, which appears on oxidized surfaces of Cu and Ni, is also observed on oxidized surfaces of Ta and stainless steel. It is not observed, however, on cleaved surfaces of MO&, a layer compound with extremely inert surface property. The emitted light therefore is most likely characteristic of 02- ions rather than of the various compounds.
The green luminescence is visible in a dark room. The light is not emitted uniformly from the surface, rather, it takes the form of a uniformly distributed high density of fine points covering the whole surface, with the emission at a few scratches, introduced during mechanical polishing,
EC measurement via electron-photon emission.
Electrons in EC has relatively low energies (300 eV).
Expected photon wavelength with 300eV electrons: 200nm-700nm (visible).
Expected photon energies: from 2 eV to 5eV.
PS magnet vacuum chamber
LHC types beam B e- e- hν hν hν hν hν hν hν Optical window Photomultiplier 22 / 52
Development 2: Electron-photon Emission
- Theory => Application
Synchrotron Radiation levels in different accelerators.
The UV and visible photons in the PS are out of the SR range. Electron-photon Emission method can be applied the PS.
by Roberto Kersevan 700nm 200nm
Development 2: Electron-photon Emission
- Theory => Application
Synchrotron Radiation levels in different accelerators.
The UV and visible photons in the PS are out of the SR range. Electron-photon Emission method can be applied the PS.
by Roberto Kersevan 700nm 200nm
Development 2: Electron-photon Emission
- Experimental set-up in the lab
1 Electron gun: low temperature BaO
cathode (1150K)
2 Gridanddeflection: prevent the
electrons arrive on the sample.
3 Sample: +18 V.
4 Quartz window: 200-2000 nm
transmission 100%.
5 Collimating lens: optimized for
200-2500 nm.
6 Optical fiber: transfer the light from
the system to the spectrometer.
7 Andor Spectrograph: with CCD
camera (200-770 nm).
Electron bombard stainless steel surface to validate emitted photons and in which
ranges they are.
1. Electron gun with BaO cathode Low light emitter (1150K)
3. Sample Bias of +18V 4. Quartz window 5. Collimating lens 6. Optical fiber 7. Andor Shamrock Spectrograph Computer 7. Andor iDus spectroscopy camera 200-770nm 𝑒𝑒− 20o 2. Grid 2. Deflection 2. Collector 25 / 52
Development 2: Electron-photon Emission
- Experimental set-up in the lab
1 Electron gun: low temperature BaO
cathode (1150K)
2 Gridanddeflection: prevent the
electrons arrive on the sample.
3 Sample: +18 V.
4 Quartz window: 200-2000 nm
transmission 100%.
5 Collimating lens: optimized for
200-2500 nm.
6 Optical fiber: transfer the light from
the system to the spectrometer.
7 Andor Spectrograph: with CCD
camera (200-770 nm).
Electron bombard stainless steel surface to validate emitted photons and in which
ranges they are.
1. Electron gun with BaO cathode Low light emitter (1150K)
3. Sample Bias of +18V 4. Quartz window 5. Collimating lens 6. Optical fiber 7. Andor Shamrock Spectrograph Computer 7. Andor iDus spectroscopy camera 200-770nm 𝑒𝑒− 20o 2. Grid 2. Deflection 2. Collector 26 / 52
Development 2: Electron-photon Emission
- Experimental set-up in the lab
1 Electron gun: low temperature BaO
cathode (1150K)
2 Gridanddeflection: prevent the
electrons arrive on the sample.
3 Sample: +18 V.
4 Quartz window: 200-2000 nm
transmission 100%.
5 Collimating lens: optimized for
200-2500 nm.
6 Optical fiber: transfer the light from
the system to the spectrometer.
7 Andor Spectrograph: with CCD
camera (200-770 nm).
Electron bombard stainless steel surface to validate emitted photons and in which
ranges they are.
1. Electron gun with BaO cathode Low light emitter (1150K)
3. Sample Bias of +18V 4. Quartz window 5. Collimating lens 6. Optical fiber 7. Andor Shamrock Spectrograph Computer 7. Andor iDus spectroscopy camera 200-770nm 𝑒𝑒− 20o 2. Grid 2. Deflection 2. Collector 27 / 52
Development 2: Electron-photon Emission
- Experimental results in the lab
Cathodoluminescence spectra of an oxidized stainless steel at electron energy of 300 eV. (The spectra are uncorrected for the system response.)
Averaging 10 measurements of 60 s integration time with 5 accumulations.
The photon counts seems to beproportionalto the electron current on the
sample.
The experimentally estimated yield on st.st. of5×10−11ph/elfor E = 300 eV.
100 200 300 400 500 600 700 800 −50 0 50 100 150 200 250 300 350 400
Oxidized stainless steel, I(sample)=3µA/2mm2
Wavelength [nm]
Intensity [Counts for 60s with 5 accumelations]
Raw data of 10 measurements Smooth data 100 200 300 400 500 600 700 800 −100 0 100 200 300 400 500 600 700 800
Oxidized stainless steel, I(sample)=9µA/2mm2
Wavelength [nm]
Intensity [Counts for 60s with 5 accumelations]
Raw data of 10 measurements Smooth data
Outline
1
Introduction
Luminosity: quantity to evaluate accelerator performance
Electron Cloud (EC): one of main limitations for High
Luminosity LHC
Electron Cloud Elimination Methods
Electron Cloud Detection Methods
2
New Electron Cloud Detectors in the PS
Existing Electron Cloud monitor in the PS
Motivation of this work
Development 1: Shielded button-type pick-up
Development 2: Electron-photon Emission
3
Implementation in the PS
The chosen magnet: MU98
Development 1: Shielded button-type pick-up
Development 2: Electron-photon Emission
Summary and Outlook
Which magnet to choose?
Possible magnets to choose:
LS1 => Good moment to benefit the opportunityOur preferable MU is in Sector 9 Sector 9: Radiation cool
MU98: next to the existing EC monitor
in SS98
Standard stainless steel vacuum chamber.
Never refurbished.
Cabling to 355/R-017: <50m. Benefit the existing electronics. Radial steering possible: beam can be moved towards the pick-up by 30 mm. MU55 EC monitor SS98 355/R-017 30 / 52
Implementation in the PS MU98 vacuum chamber
Two flanges are added to the MU98 vacuum chamber: DN35 for installation of shielded pick-up. DN63 for installation of optical window.
DN63: optical window
DN35: shield pick-up
Development 1: Shielded button-type pick-up
- 3D design
BNC coaxial connector DN40 CF Flange with feedtrough from LESKER St. Steel arm welded on flangeAl2O3 ceramic part Silver painted on blue surfaces
St. Steel sheet th 0.2mm welded on the support
Holes Ø1mm / space 2mm Contacts with
vacuum chamber
St. Steel parts
ELECTRON PICK-UP FOR MU98 VACUUM CHAMBER
Development 1: Shielded button-type pick-up
- Pick-up
Grid ϕ = 1 mm
DN40 with feedthrough Ceramic block with silver painting
Adjustable arm to ease the insertion
Development 1: Shielded button-type pick-up
- Pick-up
Development 1: Shielded button-type pick-up
- Signal Treatment
Similar electronics used for the existing pick-up in the SS98 will be applied.
System bandwidth (0.045-350 MHz) is mainly limited by cable
attenuation.
Input and output signals Signal read-out by oscilloscope
0 0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2 x 10−6 0 0.5 1 1.5 Time [s]
EC arrived on the pick−up [
µ
A] Assumed EC arrived on the pick−up = 1 µA
0 0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 2 x 10−6 0 5 10 15 Time [s] Output voltage [ µ V] Detected Voltage 35 / 52
Development 1: Shielded button-type pick-up
- Signal Treatment: Previous results in SS98
25ns 72 bunches nominal LHC beam
1.21×1011p/b 0 0.5 1 1.5 2 x 10−6 −0.02 0 0.02 time [s]
pick−up signal [a.u.]
0 0.5 1 1.5 2 x 10−6 0.1 0.2 0.3 time [s]
electron cloud signal [a.u.]
50ns 36 bunches nominal LHC beam
1.4×1011p/b 0 0.5 1 1.5 2 x 10−6 −0.02 −0.01 0 0.01 0.02 time [s]
pick−up signal [a.u.]
0 0.5 1 1.5 2 x 10−6 −0.02 0 0.02 time [s]
electron cloud signal [a.u.]
Development 2: Electron-photon Emission
- Input used for estimation of the number of expected photons
1. Experimental electron-photon yield = 5x10-11 ph/el (stainless steel)
2. Reflectivity of stainless steel: 20-50% (assume 40%)
=> Sticking factor = 0.6
3. Electron cloud density = 1 µA/mm2 4. Electron cloud area = 8.4x102 mm2
Development 2: Electron-photon Emission
- Monte Carlo simulation for estimation of the number of expected photons
Photon yield of 1.2% 1575 photons expected
• Electron bombardment area = 8.4x102 mm2
• # of electrons generated by beam (ref Giovanni & co) = 8.4x102 mm2 x 1e-6 C/s mm2/1.6e-19C = 5.25x1016 electron/s • Experimental radiation yield = 5x10-11 ph/el (stainless steel)
• # of photons emitted by electrons = 2.625x106 photons • # of photon reaches detector =
1.2% x 2.625x106 photons= 3.15x104 photons/s
• During the last 40-50ms electron cloud development of the PS
•1575 photons can be detected!
Photon yield of 8% with Al/MgF2
coating
10500 photons expected
• Electron bombardment area = 8.4x102 mm2
• # of electrons generated by beam (ref Giovanni & co) = 8.4x102 mm2 x 1e-6 C/s mm2/1.6e-19C = 5.25x1016 electron/s • Experimental radiation yield = 5x10-11 ph/el (stainless steel)
• # of photons emitted by electrons = 2.625x106 photons
• # of photon reaches detector = 8% x 2.625x106 photons = 2.1x105 photons/s
• During the last 40-50ms electron cloud development of the PS
•10500 photons can be detected!
High reflectivity coating (85% Mylar foil with Al/MgF2)
Development 2: Electron-photon Emission
- Monte Carlo simulation for estimation of the number of expected photons
Photon yield of 8% with Al/MgF2
coating
10500 photons expected
• Electron bombardment area = 8.4x102 mm2
• # of electrons generated by beam (ref Giovanni & co) = 8.4x102 mm2 x 1e-6 C/s mm2/1.6e-19C = 5.25x1016 electron/s • Experimental radiation yield = 5x10-11 ph/el (stainless steel)
• # of photons emitted by electrons = 2.625x106 photons
• # of photon reaches detector = 8% x 2.625x106 photons = 2.1x105 photons/s
• During the last 40-50ms electron cloud development of the PS
•10500 photons can be detected!
High reflectivity coating (85% Mylar foil with Al/MgF2)
# of photons arriving on the DN63 window 0 20 40 60 80 0 20 40 60 80 0 0.01 0.02 0.03 0.04 0.05
along vertical axis Photons detected on the DN63 quartz window
along horizontal axis
Photon detector yield
0 0.005 0.01 0.015 0.02 0.025 0.03 0.035 0.04 39 / 52
Development 2: Electron-photon Emission
- Multi-Channel Plate - Photon Multiplier Tube (MCP-PMT)
Multi-channel plate PMT from Photonis is chosen
due to high magnetic field (1.2T)
Lab measurement set-up to validate the MCP-PMT BI lab set-up Pulsed Laser f = 1/25ns Filter Photonis MCP-PMT UV range 70000 e-/ph Hamamatsu High speed amplifier
x63 (to reduce laser beam Intensity) Ortec Amplifier + timing discriminator Discriminate 20mV LeCroy oscilloscope 2GHz HV power supply -2400V LV power supply +15 V 40 / 52
Development 2: Electron-photon Emission
- PS measurement set-up
Magnetic field map in MU98
MCP-PMT: magnetic field direction dependency
Development 2: Electron-photon Emission
- PS measurement set-up
Magnetic field map in MU98
0 0.2 0.4 0.6 0.8 0 0.1 0.2 0.3 0.4 0 0.5 1 1.5 2 x−axis (m) Magnetic field in MU98
y−axis (m)
Magnetic field (T)
MCP-PMT: magnetic field direction dependency
Development 2: Electron-photon Emission
- PS measurement set-up
PS measurement set-up PS tunnel 355-R-017 160mm 20mm 300mm 100mm 50mm Lens 1 f1 = 100mm Φ = 50mm UV mirror Φ = 50mm Lens 2 f1 = 40mm Φ = 50mm MCP-PMT AMP x63 Electron cloud 40 mm Electron cloud 40 mm 70mm Φ = 60mm HV power supply -2400V Discriminator 20 mV LeCroy oscilloscope 2GHz LV power supply +15 V HV -2400V: BNC1 LV +15V: BNC2 output: BNC3 Black boxTrigger at C2460ms in the PS cycle Measure the last 50ms
ZNQCVP-63-NM ZNQCVP-63-NM
Development 2: Electron-photon Emission
- PS measurement set-up
Black box installed in the PS: Main magnet 98 Amplifier x63 Lens 1: f1 = 100mm UV mirror Lens 2: f2 = 40mm Multi-channel plate PMT 44 / 52
Summary and Outlook
A project from the beginning to the end.
A collaboration with different people from different groups.
Still some work to be done.
Improvement is also needed.
First nominal beam in the PS planned on 14th of July.
More results to come soon...
Summary and Outlook
A project from the beginning to the end.
A collaboration with different people from different groups.
Still some work to be done.
Improvement is also needed.
First nominal beam in the PS planned on 14th of July.
More results to come soon...
Summary and Outlook
A project from the beginning to the end.
A collaboration with different people from different groups.
Still some work to be done.
Improvement is also needed.
First nominal beam in the PS planned on 14th of July.
More results to come soon...
This project has been collaboration with different people from different groups,
thanks to Everyone who has been involved in this project.
Special thanks to:
Holger
,
Mounir
,
Wil
,
Ivo
,
Luigi
,
Phillippe
and
Paul
2for all the
supports for the experimental set-ups, both in the lab and in the PS.
Mauro
,
Jose
,
Marton
,
Daniel Schoerling
(TE-MSC),
Simone Gilardoni
/
Guido Sterbini
/
Giovanni Rumolo
/
Giovanni Iadarola
(BE-ABP) for all
the inspiring discussions and simulations needed for this work.
Enrico Bravin
/
Marcus Palm
/
Stefano Mazzoni
(BE-BI),
Thomas
Schneider
/
Thierry Gys
(PH-DT) for the discussion concerning
photo-detection in the PS and the lending of their lab instrumentation.
The CERN Drawing Office (
Teddy Capelli
and
Cedric Eymin
) and Main
Workshop for their collaboration and effort in designing and fabricating all
new vacuum equipment during the LS1.
Backup Slide
PS beam production
h=7 b. sp. ≈ 330 ns (4 - 6 b.) b. sp.≈100 ns (18 b.) h=21 h=42 b.sp.=50 ns (36 b.) h=84 b.sp.=25 ns (72 b.) Triplesplitting splittingDouble splittingDouble shorteningBunch
Backup Slide
PS beam production
h=7 b. sp. ≈ 330 ns (4 - 6 b.) b. sp.≈100 ns (18 b.) h=21 h=42 b.sp.=50 ns (36 b.) h=84 b.sp.=25 ns (72 b.) Triplesplitting splittingDouble splittingDouble shorteningBunch
Before the last bunch splitting e-cloud not expected nor observed
Backup Slide
PS beam production
h=7
b. sp. ≈ 330 ns (4 - 6 b.) b. sp.≈100 ns (18 b.) h=21
Triple
splitting splittingDouble splittingDouble shorteningBunch
0 10 20 30 40 50 60 50 150 250 300 200 100 40 M H z R F V o lt ag e [ kV ] Time [ms] h=42 b.sp. = 50 ns (36 b.) b.sp. = 25 ns (72 b.) h=84 Double splitting Adiabatic shortening Bunch rotation b.l.≈14 ns 11 ns 4 ns 51 / 52
Backup Slide
PS beam production
h=7
b. sp. ≈ 330 ns (4 - 6 b.) b. sp.≈100 ns (18 b.) h=21
Triple
splitting splittingDouble splittingDouble shorteningBunch
0 10 20 30 40 50 60 50 150 250 300 200 100 40 M H z R F V o lt ag e [ kV ] Time [ms] h=42 b.sp. = 50 ns (36 b.) b.sp. = 25 ns (72 b.) h=84 Double splitting Adiabatic shortening Bunch rotation b.l.≈14 ns 11 ns 4 ns
E-cloud expected and observed