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Ordered GeSi nanorings grown on patterned Si (001) substrates

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Figure

Figure 1 Schematic illustration for the fabrication of ordered pit-pattern. (a) Closed-packed PS single ML pattern
Figure 2 Schematic sample structure.
Figure 5 AFM images of ordered nanorings grown at 610°C with Si capping thicknesses of (a) 1.5 nm (b) 2.0 nm(c) 3.0 nm (d) 4.0 nm.
Figure 6 Distribution of lateral sizes. (a) pits after etching, (b) pits with QDs therein and diameters of (c) ordered QDs, (d) orderednanorings grown at 610°C, (e) ordered nanorings grown at 640°C and (f) ordered nanorings grown at 610°C and then annealed
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