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Influence of Sputter Deposition Time on the Growth of c Axis Oriented AlN/Si Thin Films for Microelectronic Application

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Figure

Table 1. AlN deposition parameters.
Table 2. Structural parameters calculated from XRD data.
Figure 4. (a) Graph between capacitance and frequency for different deposition time; (b) Graph between dielectric con-stant and frequency for different deposition time; (c) Graph between dissipation factor and frequency for different depo- sition time

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