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Formation of Poly Si Films on Glass Substrates by Using Microwave Plasma Heating and Fabrication of TFT’s on the Films

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Figure

Figure 1. (a) Cross-sectional structure and (b) plan view optical image of sample with structure B after plasma heating for 60 s
Figure 3. (a) Cross-sectional structure and (b) plan view optical image of sample with structure A after plasma heating for 60 s
Figure 5. Id-Vd characteristics of the sample with structure B after annealing for 120 s

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