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Influences of Process Condition of Magnetron Sputtering on Magnetostrictive Susceptibility of Fe2 2Sm Alloy Film

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Figure

Fig. 1). X-ray diffraction crystalline peaks are not remark-
Fig. 2Applied magnetic field dependent magnetostriction of Fe2:2Smalloy film prepared under each sputtering pressure at each substratetemperature.
Fig. 4Schematic diagram of Thornton model15) applied for magnetron sputtering process and SEM micrograph of Zone I, Zone Tand Zone II.
Fig. 5Applied magnetic field dependent magnetostrictive susceptibilityof Fe2:2Sm alloy film prepared under each sputtering gas pressure from0.2 to 1.0 Pa at 5:0 � 10�4 Pa of standard residual gas pressure at 323 K ofsubstrate temperature.
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