Deposition of c-axis orientation aluminum nitride films on flexible polymer substrates by reactive direct-current magnetron sputtering

In this work, thin films of NiO have been deposited using dc reactive magnetron sputtering technique at room temperature and effect of annealing the films at different

It has been shown that the reactive ion beam sputtering technique is efficient for the deposition of silica thin films at 550 °C, using an oxygen partial pressure of 2 × 10 − 4

Hence, in the present investigation, thin films of LiMn 2 O 4 are de- posited on Au/polyimide flexible substrates using RF magnetron sputtering technique at a moderate substrate

Zinc oxide (ZnO) and aluminum-doped zinc oxide (ZnO:Al) thin films were deposited onto glass and silicon substrates by RF magnetron sputtering using a zinc-aluminum target1. Both

(i) Deposition of silicon nitride thin films on silicon oxide coated silicon substrates using the stochiometric sputtering target under sputtering power from 100

Gold nanoparticles (AuNPs) were deposited by DC-magnetron sputtering onto molybdenum trioxide (MoO 3 ) thin films grown by Photochemical Metal-.. Organic Deposition (PMOD) on

Here, we study the formation of rutile and anatase polymorphs of titanium dioxide by controll- ing the oxygen flow rate during DC reactive magnetron sputtering followed by annealing

(i) Deposition of silicon nitride thin films on silicon oxide coated silicon substrates using the stochiometric sputtering target under sputtering power from 100