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Methods for the calibrated measurement of the scattering parameters of planar multi-port devices

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Figure

Fig. 2. Measurement of a multi-port with a 2-port VNA.
Fig. 6. Error model of a two-port VNA with four measurementchannels on the basis of the 7-term model.
Fig. 9. Calibration structures for a microstrip four-port fixture.
Fig. 12. Comparison of the calculated magnitude of |S12| of thebends with an orientation to the right () and to the left ().
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