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Sub 15nm silicon lines fabrication via PS b PDMS block copolymer lithography

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Figure

Table 1: Details of synthesised polymer characteristics used for the present work.
Figure 1: Top-down SEM images of self-assembled PS-2plasma. The plasma removes upper PDMS wetting layer and part of the PS matrix
Figure 2: Cross-sectional SEM images of cylindrical structure of PS-b-PDMS after solvothermal annealing at 323 k for 3 h
Figure 4: SEM images of silicon nanostructures. (a) Silicon nanowires after 15 s silicon etch

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