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Surface Mechanisms in Low-Temperature Plasma Deposition of Silicon

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Figure

Fig. 1.2:  Large area PECVD reactor schematic.
Fig. 1.3:  Effect of tip radius on resolution of features in AFM.
Fig. 2.2:  Power spectral density plots for a) 1000 Å a-Si:H film deposited by plasma
Fig. 2.3(a): RMS roughness vs. length scale.  Comparison between PECVD a-Si:H and
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