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Surface reactions during plasma enhanced chemical vapor deposition of silicon and silicon based dielectrics

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Figure

Fig 2.1 The silicon cluster used as a model for the monohydride terminated Si(111)
Fig 2.2 Schematic representations of the H abstraction reactions at the monohydride Si
Fig 2.3 Potential energy surfaces for H abstraction by Silyl radicals plotted for the
Fig 2.4 Potential energy surface for H abstraction by Silyl radicals generated using
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