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Preparation of Calcium Phosphate Films by Radiofrequency Magnetron Sputtering

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Figure

Fig. 1XRD patterns of �-TCP source powder, and the surface of hot-pressed �-TCP target before and after sputtering for 630 ks.
Fig. 3FTIR spectra of film and HAp powder.
Fig. 5Effect of oxygen gas concentration in the sputtering gas (CO2) and RF power on the phase in films at total pressures of (a) 0.5 Pa and(b) 5 Pa
Fig. 8Effect of RF power on deposition rate at total pressures of (a) 0.5 Paand (b) 5 Pa for the deposition time of 18 ks.
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