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Effect of Heat Treatment on the Hardness of Ti Mo N Films Deposited by RF Reactive Magnetron Sputtering

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Figure

Fig. 1Dependence of hardness on the nitrogen gas flow rate (fN2) duringdeposition.
Fig. 3XRD patterns of the Ti-Mo-N films deposited at various nitrogen gas flow rates of [A] fN2 ¼ 0:2 ccm, [B] 0.3 ccm, and [C] 2.0 ccm,in (a) as-deposited specimens and specimens heat treated at (b) 300, (c) 500, (d) 700, (e) 900, (f) 1000, and (g) 1100�C.
Figure 7 shows TEM-EDS mapping of the film deposited
Fig. 7TEM-EDS concentration maps of the Ti-Mo-N films deposited at fN2 ¼ 0:2 ccm after heat treatment at 1000�C; (a) a bright-fieldimage, and EDS maps of (b) Mo L and (c) Ti K
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