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Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique

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Figure

Table 1.  Roughness measurements of the polished, etched and coated samples.
Fig. 1.  (a) AFM image, (b) Low magnification and (c) High magnification SEM image of ion etched sample
Fig. 2.  (a) AFM image and (b) SEM image of 15 minutes deposited coating; (c) AFM image and (d) SEM image of 30 minutes deposited coating; (e) AFM image and (f) SEM image of 60 minutes deposited coating; (g) AFM image and (h) SEM image of 120 minutes depos
Fig. 3.  (a) Cross section of nodular defect, (b) open void defect, (c) pinhole defects, (d) cone-like
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