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Electrodeless Measurement Technique of Complex Dielectric Permittivity of High-K Dielectric Films in the Millimeter Wavelength Range

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Figure

Figure 1. Schematic of microwave OR with a two-layer sample.
Figure 2. Inclusion coefficient of substrate (εs = 10) as a function of substrate thickness.
Figure 3. Inclusion coefficient of the film as a function of it’s permittivity at different film thicknesses.Substrate (ε = 10) with thickness (a) λ/4 and (b) λ/2.
Figure 4.Results of electrodeless measurements ((a)(Ba εfand (b) tan δf) of three types of0.5Sr0.5)TiO3 films with different dopant concentration at frequency ∼ 50 GHz (red icons) andgeneralized frequency dependences of dielectric parameters of films (violet filling — guide for eyes).

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