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Field Electron Emission from a CNx:H Films Formed on Al Films Using Supermagnetron Plasma CVD

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Figure

Figure 1. Schematic of the pulsed supermagnetron plasma CVD apparatus.
Figure 2. Deposition rate of a-CNx:H films as a function of UPRF (100 - 400 W). LORF is 400 W
Figure 3. Optical band gap of a-CNx:H films as a function of UPRF (100 - 400 W). LORF is 400 W
Figure 6. Emission current-voltage characteristics of a-CNx:H film deposited on the p-Si substrate at 200/400 W
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