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ECE 230B: Winter 2013

Solid-State Electronic Devices

Professor Yuan Taur

Electrical & Computer Engineering

Electrical & Computer Engineering

University of California, San Diego

(2)

ECE 230B: Winter 2013

Solid-State Electronic Devices

Prerequist: ECE 103 135A B or equivalent and ECE 230A Prerequist: ECE 103, 135A, B, or equivalent and ECE 230A Instructor: Yuan Taur

Office: EBU1-3801 Office: EBU1 3801 Phone: 534-3816

[email protected]

Office hours: Wednesday, Friday, 11-12, or by appointmenty, y, , y pp Course website: http://ted.ucsd.edu

TA: no

This course covers the physics of solid-state electronic devices, including p-n junctions, MOS devices, field-effect transistors, bipolar transistors, etc.

Principles of CMOS and bipolar scaling to nanometer dimensions and their high frequency performance in digital and analog circuits will be taught. q y p g g g

(3)

Topics to be Covered

1) Band diagram, Fermi level, Poisson’s

eq., Carrier transport (1.5 wks)

2.1

2) P-n junction (1 wk)

3) MOS device (1 wk)

2.2 2.3

4) Schottky diodes, High field effects (1 wk)

5) MOSFETs (1.5 wks)

2.4-2.5 3

6) CMOS scaling and design (1.5 wks)

7) CMOS performance factors (1 wk)

4 5

8) Bipolar transistors and SiGe (1.5 wks)

Textbook: “Fundamentals of Modern VLSI Devices, 2nd ed.”

6-8 ,

(4)

Homework and Grading Policy

g

y

Biweekly homework without handing in.

Answers will be posted.

20%--Two quizes (open book, calculator

ll

d)

allowed).

30%--Midterm (Closed book, calculator

d

f

id d

t

and one page of one-sided notes

allowed).

50% Final (Closed book calculator and

50%--Final (Closed book, calculator and

(5)
(6)

Electron Energy Levels and Bands

gy

Discrete electron energy

levels in an atom:

Broadening into electron

energy bands in a solid:

levels in an atom:

energy bands in a solid:

There are forbidden energy gaps between

There are forbidden energy gaps between

(7)

The Origin of Energy Gap in a

Crystalline Solid

(8)

The Origin of Energy Gap in a

Crystalline Solid

(9)
(10)
(11)

Metals, Insulators, and Semiconductors

Insulators: E

g

> 4-5 eV

(12)

Metals, Insulators, and Semiconductors

(13)

Energy Band Diagram of Silicon

Hole energy Conduction band e e gy Ec Eg Ei Ev

E = 1 12 eV

Electron energy Valence band

E

g

= 1.12 eV

kT/q = 0.026 V

@ 300 K

Free electron ( ) F h l (+) energy

@ 300 K

Free hole (+)

(14)

Density of States

N(E)dE : Number of electronic states per unit volume with an

energy between E and (E + dE) in the conduction band. From quantum mechanics, there is one allowed state in a phase space of volume ( x px)( y py)( z pz) = h3.

N E dE

g

dp dp dp

h

x y z

( )

2

3

where dpxdpydpz is the volume in the momentum space

within which the electron energy lies between E and E + dE,

g is the number of equivalent minima in the conduction band g is the number of equivalent minima in the conduction band,

and the factor of two arises from the two possible directions of electron spin. The conduction band of silicon has a six-fold degeneracy, so g = 6. g y, g

(15)

Density of States

If the electron kinetic energy is not too high, one can apply the parabolic approximation,

p

2

p

2

p

2

where (E Ec) is the electron kinetic energy, and mx, my, mz are the effective masses inversely proportional to the

E E

p

m

p

m

p

m

c x x y y z z

2

2

2

are the effective masses inversely proportional to the

curvatures of the band. For silicon conduction band in the 100 direction, the longitudinal mass is mx = 0.92m0 and the transverse masses are m = m = 0 19m

transverse masses are my = mz = 0.19m0.

The volume of the ellipsoid in momentum space is (4 /3)(8mxmymz)1/2(E E

c)3/2. The volume dpxdpydpz within

which the electron energy lies between E and E + dE is which the electron energy lies between E and E + dE is 4 (2mxmymz)1/2(E E c)1/2dE. N E dE( ) 8 g 2m m m3x y z E E dE N E dE h E E dEc ( ) 3

(16)

Fermi-Dirac Statistical Distribution

f E

e

E Ef kT

( )

(

1

)/

1 e

f

1

(17)

Fermi Level and Thermal Equilibrium

Consider two electronic systems in contact with Fermi levels

Ef1 and Ef2. The corresponding distribution functions are fD1(E) and fD2(E). If Ef1 > Ef2, then fD1(E) > fD2(E) for all E.

Electrons flow from 1 to 2.

E kT E E D kT E E D f f

e

E

f

e

E

f

1 ( )/ 2 ( )/ 2 1

1

1

)

(

1

1

)

(

E E

e

Ef1 Ef2 Th l ilib i N t fl E E

(18)

Electron and Hole Densities

Conduction band E E E E band Eg Ec n E f Ev Valence band p Free hole (+)

Free electron ( ) N(E) f (E) n and p

1/2 1 ( ) E 2 8 ) ( 3x y z E Ec h m m m g E N

(19)

Electron and Hole Densities

Fermi-Dirac distribution:

f E

e

E Ef kT

( )

(

1

)/

1

Non-degenerate approximation, For (E - Eff)/kT >> 1,

f E

( )

e

(E Ef)/kT For (E - Ef)/kT << -1,

f E

( )

1

e

(Ef E kT)/

Carrying out the integrations,

n N e

c (E Ec f)/kT

p N e

v

E Ef v kT

( )/

2

Nc, Nv: Effective density of states, 3/2

3 (2 ) 2 kT h m m m g Nc x y z

V lid f

d i

fi ld

diti

(20)

Intrinsic Silicon

n N e

c (E Ec f)/kT

p N e

v

E Ef v kT

( )/

Intrinsic silicon: Charge neutrality requires n = p = ni,

E E E E kT N N i f c v c v 2 2 ln

Intrinsic Fermi level:

Intrinsic carrier ni N N ec v E E kT N N e c v E kT c v g ( )/2 /2 Intrinsic carrier density: kT E E i i f

e

n

n

( )/

p

n

i

e

(Ei Ef )/kT 2

n

np

p

(21)
(22)

Atomic/molecular weight 28.09 60.08

At l l / 3 5 0 1022 2 3 1022

Physical Properties Si SiO2

Atoms or molecules/cm3 5.0 1022 2.3 1022

Density (g/cm3) 2.33 2.27

Crystal structure Diamond Amorphous

L tti t t (Å) 5 43

Lattice constant (Å) 5.43

---Energy gap (eV) 1.12 8-9

Dielectric constant 11.7 3.9

Intrinsic carrier concentration (cm 3) 1 4 1010

Intrinsic carrier concentration (cm 3) 1.4 1010

---Carrier mobility (cm2/V-s) Electron: 1430

---Hole: 470

---Effective density of states (cm 3) Conduction band N : 3 2 1019

Effective density of states (cm 3) Conduction band N

c: 3.2 1019 ---Valence band Nv: 1.8 1019 ---Breakdown field (V/cm) 3 105 >107 Melting point ( C) 1415 1600 1700 Melting point ( C) 1415 1600-1700 Thermal conductivity (W/cm- C) 1.5 0.014 Specific heat (J/g- C) 0.7 1.0

(23)

Extrinsic (n-type and p-type) Silicon

Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si P+ q B Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si P B +q (b) (a) (c)

(24)
(25)

Band Diagrams of n-type and

p-type Silicon

Conduction band Conduction band

Ec E Ec Eg Eg c E Ei Ei Ed Ea Ef Ef

Valence band Valence band

Ev Ev a

Free electron ( ) Free hole (+)

( ) t (b) t

(26)

Fermi Level in Extrinsic Silicon

n N e

c (E Ec f)/kT

p N e

v

E Ef v kT

( )/

For n-type silicon with donor concentration Nd, charge neutrality requires n = p + Nd+ N

d (assuming complete ionization).

Therefore,

E

E

kT

N

N

c f c d

ln

Or, in terms of ni and Ei,

E

E

kT

N

n

f i d i

ln

Note that np = n2 independent of E (n- or p-type)

For Nd > Nc, Ef > Ec degenerate n+ silicon. Need full F-D eq.

(27)
(28)

Fermi Level in Extrinsic Silicon

If incomplete ionization, Nd+ < N

d where

Ef is then solved from

N

N

f E

N

e

d d

1

d d

1

Ed Ef kT

1

1

1 2

(

)

( / )

( )/ f

N e

N

e

N e

c E E kT d E E kT v E E kT c f d f f v ( ) / ( ) / ( ) /

1 2

Condition for complete ionization:

N

e

d (Ec Ed )/kT

1

Requires the donor energy level to be within a few kT of the bottom of the conduction band

N

c

e

c d

( )

1

(29)
(30)
(31)
(32)
(33)

Carrier Transport: Drift

kT

v

m

n th

2

3

2

1

* 2 At 300 K, vth ~ 107 cm/s

Mean free path :

Average distance between collisions, ~10-5 cm

Mean free time cn:

Average time between collisions, ~ 1 ps

*

/ m

q

(34)

Mobilityy

E

d

v

1,600 40 1,200 1,400 30 V -s ) t ( cm /s) 2 Electrons T = 300 K 600 800 1,000 20 obility (cm /V on co ef fi ci en t 2 l 200 400 10 M o Diff usi o Holes

1E+140 1E+15 1E+16 1E+17 1E+18 1E+19 1E+200

Doping concentration (cm )-3

1

1

1

1

1

1

(35)

Resistivity of Silicon

y

E

n d drift n

qnv

qn

J

, 1 n n qn

(36)

Velocity Saturation

y

1E+7 ity ( cm /s) 1E+6 arr ier ve lo c Electr ons s

1E+2 1E+3 1E+4 1E+5

1E+5 C a Holes T=300 K

cm/s

10

7

v

1E+2 1E+3 1E+4 1E+5

Electric field (V/cm)

cm/s

10

(37)

Carrier Transport: Diffusion

n(x+l) atio n, n

J

qD

dn

dx

n diff, n n(x) n(x l) on co nc en tr a n(x-l)

D

kT

q

n n El ec tr o

q

D

p

kT

p x Distance x+l x-l

q

p p

(38)

Poisson’s Equation

i

i

E

q

Define intrinsic potential:

q

dx

d

-=

E

Electric field:

dx

si

x

dx

d

dx

d

(

)

2 2

E

Poisson’s eq.:

)

(

)

(

)

(

)

(

2 2

x

N

x

N

x

n

x

p

q

dx

d

dx

d

a d si

E

Or, s

Q

dx

x)

(

1

E

Gauss’s law:

(39)

2-D Poisson’s Equation

net y x y x ) ( ) ( E E where Ex = / x and Ey = / y. ) , 0 ( ) , 0 ( 2 1y y Ey y E At the interface between 1 and 2, 1(0,y) = 2(0,y).

) , 0 ( ) , 0 ( 2 2 1 1Ex y Ex y

Also (x)Ex must be continuous at x = 0

FIGURE 2.11. Diagram for

discussing the boundary conditions (x y) (x y)

1 2

of electric field at the interface between two dielectric media. (x,y)

1 2(x,y)

x y

(40)

Carrier Concentration in terms

of Electrostatic Potential

Silicon Silicon surface B f i b kT q N n ln q s Ec Ei Eg q B q ( )x E i q n (> 0) Ev Ef

n

n e

i (E Ef i)/kT

n e

i q( i f)/kT

Oxide p-type silicon

x

(41)

Debye Length

LD ddx i q N xd n ei q i f kT 2 2 ( ) ( ) / Ei Ef D dx si d2( ) 2N i d dx q N kT q N x i d si i si d 2 2 2 ( ) ( ) ( ) Nd Nd+ Nd Solution: i ~ exp(-x/LD) where L kT q N D si d 2

(42)

Current Density Equations

Combining drift and diffusion components,

dx dn qD + qn Jn nE n Or, dx dx dp qD qp Jp pE p dn kT d Or, dx dn qn kT dx d qn J i n n dx dp qp kT dx d qp J i p p dx d qn Jn n f d d qp Jp p f dx d J J J n p 1 f

If both n and p take on their equilibrium values, then , and

dx qp dx

dx p p dx dx

Current proportional to the gradient of Fermi level assuming local equilibrium and local Fermi level.q

(43)

Current Density Equations

dx dn qD + qn Jn nE n dp D J E

When electrons and holes are not in local equilibrium, define quasi-Fermi levels Efn, Efp such that

dx dp qD qp

Jp pE p

define quasi Fermi levels Efn, Efp such that

Then d kT dn d kT E E i i fn e n n ( )/ p nie(Ei Efp)/kT J qn d dx kT qn dn dx qn d dx n n i n n J qp d dx kT qp dp dx qp d dx p p i p p where dx qp dx dx p p p i i fn n n n q kT q E ln i i fp p n p q kT q E ln

are the quasi-Fermi potentials.

(44)
(45)
(46)
(47)

Current Continuity Equations

From conservation of mobile charge,

n J R G n 1 t q x R G n n n p J R G p 1

where G

n

, G

p

, R

n

, R

p

are electron-hole generation

and recombination rates.

t q x Rp Gp

In the steady state with negligible electron-hole

generation and recombination rates,

g

,

dJ

n

/dx = 0

dJ

p

/dx = 0

Si

l

ti it

f l t

d h l

t

(48)

Dielectric Relaxation Time

Neglect R

n

, G

n

in the current continuity equation,

n

1

J

From Ohm’s law, J

n

= E/

n

n

t

q

J

x

n

1

And from Poisson’s equation with majority carrier

density n, E/ x = qn/

si

S bstit ting into c rrent contin it eq ation

Substituting into current continuity equation:

n

t

n

The solution is of the form n(t) exp( t/

n si

)

where

n si

10

-12

s is the majority carrier

References

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