ECE 230B: Winter 2013
Solid-State Electronic Devices
Professor Yuan Taur
Electrical & Computer Engineering
Electrical & Computer Engineering
University of California, San Diego
ECE 230B: Winter 2013
Solid-State Electronic Devices
Prerequist: ECE 103 135A B or equivalent and ECE 230A Prerequist: ECE 103, 135A, B, or equivalent and ECE 230A Instructor: Yuan Taur
Office: EBU1-3801 Office: EBU1 3801 Phone: 534-3816
Office hours: Wednesday, Friday, 11-12, or by appointmenty, y, , y pp Course website: http://ted.ucsd.edu
TA: no
This course covers the physics of solid-state electronic devices, including p-n junctions, MOS devices, field-effect transistors, bipolar transistors, etc.
Principles of CMOS and bipolar scaling to nanometer dimensions and their high frequency performance in digital and analog circuits will be taught. q y p g g g
Topics to be Covered
1) Band diagram, Fermi level, Poisson’s
eq., Carrier transport (1.5 wks)
2.1
2) P-n junction (1 wk)
3) MOS device (1 wk)
2.2 2.3
4) Schottky diodes, High field effects (1 wk)
5) MOSFETs (1.5 wks)
2.4-2.5 3
6) CMOS scaling and design (1.5 wks)
7) CMOS performance factors (1 wk)
4 5
8) Bipolar transistors and SiGe (1.5 wks)
Textbook: “Fundamentals of Modern VLSI Devices, 2nd ed.”
6-8 ,
Homework and Grading Policy
g
y
•
Biweekly homework without handing in.
Answers will be posted.
•
20%--Two quizes (open book, calculator
ll
d)
allowed).
•
30%--Midterm (Closed book, calculator
d
f
id d
t
and one page of one-sided notes
allowed).
•
50% Final (Closed book calculator and
•
50%--Final (Closed book, calculator and
Electron Energy Levels and Bands
gy
Discrete electron energy
levels in an atom:
Broadening into electron
energy bands in a solid:
levels in an atom:
energy bands in a solid:
There are forbidden energy gaps between
There are forbidden energy gaps between
The Origin of Energy Gap in a
Crystalline Solid
The Origin of Energy Gap in a
Crystalline Solid
Metals, Insulators, and Semiconductors
Insulators: E
g> 4-5 eV
Metals, Insulators, and Semiconductors
Energy Band Diagram of Silicon
Hole energy Conduction band e e gy Ec Eg Ei EvE = 1 12 eV
Electron energy Valence bandE
g= 1.12 eV
kT/q = 0.026 V
@ 300 K
Free electron ( ) F h l (+) energy@ 300 K
Free hole (+)Density of States
N(E)dE : Number of electronic states per unit volume with an
energy between E and (E + dE) in the conduction band. From quantum mechanics, there is one allowed state in a phase space of volume ( x px)( y py)( z pz) = h3.
N E dE
g
dp dp dp
h
x y z
( )
2
3where dpxdpydpz is the volume in the momentum space
within which the electron energy lies between E and E + dE,
g is the number of equivalent minima in the conduction band g is the number of equivalent minima in the conduction band,
and the factor of two arises from the two possible directions of electron spin. The conduction band of silicon has a six-fold degeneracy, so g = 6. g y, g
Density of States
If the electron kinetic energy is not too high, one can apply the parabolic approximation,
p
2p
2p
2where (E Ec) is the electron kinetic energy, and mx, my, mz are the effective masses inversely proportional to the
E E
p
m
p
m
p
m
c x x y y z z2
2
2
are the effective masses inversely proportional to the
curvatures of the band. For silicon conduction band in the 100 direction, the longitudinal mass is mx = 0.92m0 and the transverse masses are m = m = 0 19m
transverse masses are my = mz = 0.19m0.
The volume of the ellipsoid in momentum space is (4 /3)(8mxmymz)1/2(E E
c)3/2. The volume dpxdpydpz within
which the electron energy lies between E and E + dE is which the electron energy lies between E and E + dE is 4 (2mxmymz)1/2(E E c)1/2dE. N E dE( ) 8 g 2m m m3x y z E E dE N E dE h E E dEc ( ) 3
Fermi-Dirac Statistical Distribution
f E
e
E Ef kT( )
(1
)/1 e
f1
Fermi Level and Thermal Equilibrium
Consider two electronic systems in contact with Fermi levels
Ef1 and Ef2. The corresponding distribution functions are fD1(E) and fD2(E). If Ef1 > Ef2, then fD1(E) > fD2(E) for all E.
Electrons flow from 1 to 2.
E kT E E D kT E E D f f
e
E
f
e
E
f
1 ( )/ 2 ( )/ 2 11
1
)
(
1
1
)
(
E Ee
Ef1 Ef2 Th l ilib i N t fl E EElectron and Hole Densities
Conduction band E E E E band Eg Ec n E f Ev Valence band p Free hole (+)Free electron ( ) N(E) f (E) n and p
1/2 1 ( ) E 2 8 ) ( 3x y z E Ec h m m m g E N
Electron and Hole Densities
Fermi-Dirac distribution:f E
e
E Ef kT( )
(1
)/1
Non-degenerate approximation, For (E - Eff)/kT >> 1,f E
( )
e
(E Ef)/kT For (E - Ef)/kT << -1,f E
( )
1
e
(Ef E kT)/Carrying out the integrations,
n N e
c (E Ec f)/kTp N e
v
E Ef v kT
( )/
2
Nc, Nv: Effective density of states, 3/2
3 (2 ) 2 kT h m m m g Nc x y z
V lid f
d i
fi ld
diti
Intrinsic Silicon
n N e
c (E Ec f)/kTp N e
v
E Ef v kT
( )/
Intrinsic silicon: Charge neutrality requires n = p = ni,
E E E E kT N N i f c v c v 2 2 ln
Intrinsic Fermi level:
Intrinsic carrier ni N N ec v E E kT N N e c v E kT c v g ( )/2 /2 Intrinsic carrier density: kT E E i i f
e
n
n
( )/p
n
ie
(Ei Ef )/kT 2n
np
p
Atomic/molecular weight 28.09 60.08
At l l / 3 5 0 1022 2 3 1022
Physical Properties Si SiO2
Atoms or molecules/cm3 5.0 1022 2.3 1022
Density (g/cm3) 2.33 2.27
Crystal structure Diamond Amorphous
L tti t t (Å) 5 43
Lattice constant (Å) 5.43
---Energy gap (eV) 1.12 8-9
Dielectric constant 11.7 3.9
Intrinsic carrier concentration (cm 3) 1 4 1010
Intrinsic carrier concentration (cm 3) 1.4 1010
---Carrier mobility (cm2/V-s) Electron: 1430
---Hole: 470
---Effective density of states (cm 3) Conduction band N : 3 2 1019
Effective density of states (cm 3) Conduction band N
c: 3.2 1019 ---Valence band Nv: 1.8 1019 ---Breakdown field (V/cm) 3 105 >107 Melting point ( C) 1415 1600 1700 Melting point ( C) 1415 1600-1700 Thermal conductivity (W/cm- C) 1.5 0.014 Specific heat (J/g- C) 0.7 1.0
Extrinsic (n-type and p-type) Silicon
Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si P+ q B Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si Si P B +q (b) (a) (c)Band Diagrams of n-type and
p-type Silicon
Conduction band Conduction band
Ec E Ec Eg Eg c E Ei Ei Ed Ea Ef Ef
Valence band Valence band
Ev Ev a
Free electron ( ) Free hole (+)
( ) t (b) t
Fermi Level in Extrinsic Silicon
n N e
c (E Ec f)/kTp N e
v
E Ef v kT
( )/
For n-type silicon with donor concentration Nd, charge neutrality requires n = p + Nd+ N
d (assuming complete ionization).
Therefore,
E
E
kT
N
N
c f c dln
Or, in terms of ni and Ei,
E
E
kT
N
n
f i d iln
Note that np = n2 independent of E (n- or p-type)
For Nd > Nc, Ef > Ec degenerate n+ silicon. Need full F-D eq.
Fermi Level in Extrinsic Silicon
If incomplete ionization, Nd+ < N
d where
Ef is then solved from
N
N
f E
N
e
d d1
d d1
Ed Ef kT1
1
1 2
(
)
( / )
( )/ fN e
N
e
N e
c E E kT d E E kT v E E kT c f d f f v ( ) / ( ) / ( ) /1 2
Condition for complete ionization:
N
e
d (Ec Ed )/kT
1
Requires the donor energy level to be within a few kT of the bottom of the conduction band
N
ce
c d
( )
1
Carrier Transport: Drift
kT
v
m
n th2
3
2
1
* 2 At 300 K, vth ~ 107 cm/sMean free path :
Average distance between collisions, ~10-5 cm
Mean free time cn:
Average time between collisions, ~ 1 ps
*
/ m
q
Mobilityy
E
dv
1,600 40 1,200 1,400 30 V -s ) t ( cm /s) 2 Electrons T = 300 K 600 800 1,000 20 obility (cm /V on co ef fi ci en t 2 l 200 400 10 M o Diff usi o Holes1E+140 1E+15 1E+16 1E+17 1E+18 1E+19 1E+200
Doping concentration (cm )-3
1
1
1
1
1
1
Resistivity of Silicon
y
E
n d drift nqnv
qn
J
, 1 n n qnVelocity Saturation
y
1E+7 ity ( cm /s) 1E+6 arr ier ve lo c Electr ons s1E+2 1E+3 1E+4 1E+5
1E+5 C a Holes T=300 K
cm/s
10
7v
1E+2 1E+3 1E+4 1E+5
Electric field (V/cm)
cm/s
10
Carrier Transport: Diffusion
n(x+l) atio n, nJ
qD
dn
dx
n diff, n n(x) n(x l) on co nc en tr a n(x-l)D
kT
q
n n El ec tr oq
D
pkT
p x Distance x+l x-lq
p pPoisson’s Equation
i
i
E
q
Define intrinsic potential:
q
dx
d
-=
E
Electric field:dx
six
dx
d
dx
d
(
)
2 2E
Poisson’s eq.:)
(
)
(
)
(
)
(
2 2x
N
x
N
x
n
x
p
q
dx
d
dx
d
a d siE
Or, sQ
dx
x)
(
1
E
Gauss’s law:2-D Poisson’s Equation
net y x y x ) ( ) ( E E where Ex = / x and Ey = / y. ) , 0 ( ) , 0 ( 2 1y y Ey y E At the interface between 1 and 2, 1(0,y) = 2(0,y).) , 0 ( ) , 0 ( 2 2 1 1Ex y Ex y
Also (x)Ex must be continuous at x = 0
FIGURE 2.11. Diagram for
discussing the boundary conditions (x y) (x y)
1 2
of electric field at the interface between two dielectric media. (x,y)
1 2(x,y)
x y
Carrier Concentration in terms
of Electrostatic Potential
Silicon Silicon surface B f i b kT q N n ln q s Ec Ei Eg q B q ( )x E i q n (> 0) Ev Efn
n e
i (E Ef i)/kTn e
i q( i f)/kTOxide p-type silicon
x
Debye Length
LD ddx i q N xd n ei q i f kT 2 2 ( ) ( ) / Ei Ef D dx si d2( ) 2N i d dx q N kT q N x i d si i si d 2 2 2 ( ) ( ) ( ) Nd Nd+ Nd Solution: i ~ exp(-x/LD) where L kT q N D si d 2Current Density Equations
Combining drift and diffusion components,
dx dn qD + qn Jn nE n Or, dx dx dp qD qp Jp pE p dn kT d Or, dx dn qn kT dx d qn J i n n dx dp qp kT dx d qp J i p p dx d qn Jn n f d d qp Jp p f dx d J J J n p 1 f
If both n and p take on their equilibrium values, then , and
dx qp dx
dx p p dx dx
Current proportional to the gradient of Fermi level assuming local equilibrium and local Fermi level.q
Current Density Equations
dx dn qD + qn Jn nE n dp D J EWhen electrons and holes are not in local equilibrium, define quasi-Fermi levels Efn, Efp such that
dx dp qD qp
Jp pE p
define quasi Fermi levels Efn, Efp such that
Then d kT dn d kT E E i i fn e n n ( )/ p nie(Ei Efp)/kT J qn d dx kT qn dn dx qn d dx n n i n n J qp d dx kT qp dp dx qp d dx p p i p p where dx qp dx dx p p p i i fn n n n q kT q E ln i i fp p n p q kT q E ln
are the quasi-Fermi potentials.
Current Continuity Equations
From conservation of mobile charge,
n J R G n 1 t q x R G n n n p J R G p 1
where G
n, G
p, R
n, R
pare electron-hole generation
and recombination rates.
t q x Rp Gp