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Excimer Laser Annealing of Hydrogen Modulation Doped a Si Film

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Figure

Fig. 1Schematic diagram of RF magnetron sputtering apparatus.
Fig. 2Structure of HMD a-Si films (A, B and C) and a-Si film withuniform H concentration (D)
Fig. 4H concentration as a function of H2/Ar flow rate ratio. The Hconcentration was estimated from the peak due to SiH and SiH2 bonds inthe FT-IR spectra.
Fig. 9Raman peak shift, FWHM and crystalline fraction of poly-Si filmsprepared from HMD a-Si films shown in Fig
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