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Deposition and characterisation of Ti02 layer using magnetron sputtering deposition technique

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Figure

Figure of swollen large Titanium target due to water Copper plated target for good heat disperse
Figure 2.2 : The cross section of dual - target magnetron sputtering system.
Figure 2.3 : The concept of plasma activity inside the deposition chamber.
Figure 2.4 : The magnetron sputtering deposition chamber with 6 view port & water
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