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Fabrication and Evaluation of Devices Containing High K Gate Dielectrics and Metal Gate Electrodes for the 70 and 50NM Technology Nodes of ITRS

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Figure

Fig. 1. RBS spectra of the TaSixNy films deposited on SiO2 /p-type Si substrate with
Fig. 1. RBS spectra of as-deposited TaSixNy film as a function of the N2 flow rate.
Fig. 2. The variation of N concentration vs N2 flow rate.
Fig. 4. Typical C-V curves of TaSixNy electrode capacitor with the N2 flow rate,  after annealing at 400ºC for 30min
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