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Properties of High Nitrogen Content Carbon Nitride Thin Films Prepared by a Radio Frequency Magnetron Sputtering Deposition Technique

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Figure

Figure 1-1:  A summary of the different bonding configurations possible between carbon and nitrogen with their valence and conduction band energies
Figure 1-2: Schematic of the vacuum deposition chamber.
Figure 1-3: Custom built magnetron sputtering deposition equipment. Two different types of plasma are shown close-up, a pure argon plasma on the left and a mix of argon and nitrogen plasma on the right
Figure 1-6: Different bonding environments for nitrogen in CNx films.
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