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Permanent annihilation of thermally activated defects which limit the lifetime of float zone silicon

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Figure

Table 1 FZ materials used in this work. The nitrogen concentra-tion was determined by SIMS and the resistivity is as quoted by the manufacturers
Figure 1 : Inverse effective lifetime (at Δn = 1015 cm-3) versus inverse sample thickness for 1 cm FZ n- and p-type silicon
Figure 5: Uncalibrated PL images of quarter 100mm diameter nitrogen doped FZ 100 Ω·cm n-type silicon samples annealed at 500°C (left) and 1000°C (right) in oxygen for 30 mins
Figure 6: Effective lifetime (at Δn = 1015 cm-3) of nitrogen doped FZ 1 (red), 10 (green) and 100 (blue) Ω·cm n-type silicon (i) as-grown, (ii) after a 450°C anneal, (iii) followed by a 1000°C anneal, and (iv) a subsequent anneal at 450°C

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