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Electromagnetics and Photonics Commons Engineering Physics Commons , and the Materials Science and Engineering Commons

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Figure

FIG. 2. Cross section microstructuresof thin film: (a) secondary electronimage at 15 000x and (b) secondaryelectron image at 100 000x showingthe average thickness of the film of350 nm.
FIG. 5. m vs. T at an applied field of at 1000 Oe (79.58 kA/m) showing pres-ence of two transitions; a minor transition of Gd5Si4 phase between 320 Kand 345 K (inset) and a major broad transition between 10 and 150 K fromtwo or more phases in the film.

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