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Controllable growth of aluminum nanorods using physical vapor deposition

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Figure

Figure 1 Oxygen surfactant mechanism schematic. Schematic ofcontrollably growing Al nanorods (in gray) using physical vapordeposition, with O atoms (red spheres) as surfactant.
Figure 3 Low-temperature growth. SEM image of Al nanorodsgrown at a low vacuum of 10−2 Pa and a low substrate temperatureof 225 K.
Figure 4 Analysis of annealed Al nanorods. (a) EDS spectra of Al nanorods as grown and after annealing at 475 K for 1 day in air, with theSEM image of the annealed Al nanorods as an inset and (b) TEM images of Al nanorods before (left) and after the annealing at 475 K (middle)and 875 K (right).

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