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Atomic Scale AES EELS Analysis of Structure Phase State and Growth Mechanism of Layered Nanostructures

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Figure

Table 1. Quantitative AES-analysis of thickness and composition in surface phases (on base of [8])
Figure 1. Auger-analysis of the two cases of the growth of Si on CrSi2 (0001) at a deposition rate of Si: (a) 2 Å/min-curve 1 and (b) 0.5 Å/min-curve 2 [17]
Figure 2. Possible mechanisms of growth based on a combination of two from the three growth processes (the layered-character growth, island growth and intermixing)
Figure 3. Typical thickness dependences of the Auger-peak intensities for the Fe on Si(001)2 × 1 films in the case of lowered (a) (c) and high (b) (d) temperatures of the beam vapor during the growth [9]
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