DC magnetron sputter deposition
Anisotropic Tix Sn1 x O2 nanostructures prepared by magnetron sputter deposition
... For the deposition step, the power of RF sputtering was fixed, while the power of DC sputtering was regu- lated at the discharge currents 0.15, 0.20, and 0.25 A, respectively, for the three prepared samples ...
5
Pt Supported on Ti for Methanol Electrooxidation by Magnetron Sputter Method
... A Pt catalyst thin film was coated on the surface of Ti foil by magnetron sputtering. A sputtering system (HITACHI e1030) was employed to deposit Pt catalyst onto the Ti. The base vacuum pressure was set at 0.5 Pa ...
7
Aluminum nitride deposition using an AlN/Al sputter cycle technique
... a DC magnetron reactive sputtering ...the deposition is interrupted before a highly insulating film is grown on the chamber ...This deposition of a metal layer conceals the highly insulating ...
10
Surface Free Energy of Alloy Nitride Coatings Deposited Using Closed Field Unbalanced Magnetron Sputter Ion Plating
... remove the residual solvent. The substrate was then placed on a sample holder for coating. In all of these cases, the substrates were Ar plasma ion cleaned using pulsed DC bias before deposition. Nitrogen ...
7
← Return to Article Details MOLYBDENUM TRIOXIDE THIN FILMS DOPED WITH GOLD NANOPARTICLES GROWN BY A SEQUENTIAL METHODOLOGY: PHOTOCHEMICAL METAL-ORGANIC DEPOSITION (PMOD) AND DC-MAGNETRON SPUTTERING
... and DC-magnetron sputtering ...5-s sputter depositing, and their size was directly related to the time used in the sputtering ...Increased deposition time caused significant particle growth, ...
5
MAGNETIC AND STRUCTURAL PROPERTIES OF NI-MN-GA FILMS PRODUCED VIA PHYSICAL VAPOR TRI-DEPOSITION
... target magnetron sputtering system (AJA International, Figure ...W DC power supplies, two 300 W RF and a 100 W RF bias/etch power ...main sputter chamber to a base pressure of 10 -7 ...
86
Influence of oxygen in the sputter gas on creating a conducting interface in LaAlO3/SrTiO3
... We have used the calibration of ref. [10] for the deposition rate. We have not measured the LAO thickness of our samples. The LAO layer needs to be at least four unit cells thick in order to create a conducting ...
55
Decorative vacuum coating technologies Certottica Longarone. Thin Film Plasma Coating Technologies
... High Plasma Impuls Magnetron Sputtering Deposition of tribological and hard coatings. Magnetron sputter plasma for the deposition of optical thin films[r] ...
39
Development of corrosion resistant niobium based PVD coatings
... unbalanced magnetron sputtering ...unbalanced magnetron sputtering at a low deposition temperature (T = 250QC) under reduced ion ...to deposition has a significant influence on the corrosion ...
192
Influence of silver nanoparticles on the optical properties of methylene blue and curcumine dyes
... spectra. Chemical Physics Letters. Photochromic silver nanoparticles fabricated by sputter deposition. Journal of Applied Physics. Elements of modern physics. Tata Mcgraw-Hill, Ne[r] ...
180
Formation of Nanoporous Anodic Alumina by Anodization of Aluminum Films on Glass Substrates
... The aim of our work is to study the formation of PAA from aluminum films, prepared by the method of DC magnetron sputtering at different deposition parameters. We studied the films with a thickness ...
11
Non-conducting interfaces of LaAlO3/SrTiO3 produced in sputter deposition: The role of stoichiometry
... The picture from the data is then as follows. The LAO films and the LAO/STO interfaces prepared by sputtering in a high oxygen pressure have crystallographic properties very similar to those grown by PLD or MBE, but the ...
5
Nitrification of Reactively Magnetron Sputter Deposited Ti Cu Nano Composite Thin Films
... in magnetron sputter process rely on the possibility of producing thin films with new properties, markedly different from those of corresponding equilib- rium bulk phases when one considers a nano-composite ...
8
Sputter growth and characterization of metamagnetic B2-ordered FeRh epilayers.
... In this protocol, thin films of the ordered FeRh alloy are made with dc-magnetron sputtering on MgO (001) substrates. The samples are grown in a magnetic field of about 200 Oe provided by a permanent magnet ...
8
The microstructure and properties of unbalanced magnetron sputtered CrN[x] coatings
... (conventional magnetron), having the same magnetic field strength for the inner and outer pole, are most efficient in ionization of the sputter ...high sputter rates can be ...“balanced” ...
246
Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... flow rate, figure 6a, and became faceted (figure 6b to e) as the flow rate increased. Similar dependency of microstructure on nitrogen flow rate of CrNx coatings has been reported by G. Greczynski et. al. when pure ...
26
Balzers Sputter Coater SCD 050
... The SCD 050 is a bench top, sputter deposition system designed for thin films on substrates up to 6 inches. Morphology and thickness is user controlled using power, pressure, working distance, and a Syscon ...
8
Highly (200)-Preferred Orientation TiN Thin Films Grown by DC Reactive Magnetron Sputtering
... Several deposition techniques have been applied in the deposition of TiN films, such as metal-organic chemical vapor deposition (MOCVD), plasma enhanced chemical vapor deposition (PECVD), ...
5
Electrical Characteristics of Doped ZnO/Cu2O Heterojunction Diode by Sputtering Method
... [4] Pugalenthi, A. S., Balasundaraprabhu, R., Gunasekaran, V., Muthukumarasamy, N., Prasanna, S., & Jayakumar, S. (2015). Effect of Thickness on the Structural, Optical and Electrical Properties of RF ...
6
Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... a DC generator in constant power mode) is a direct result of continuously reducing sputtering yield owing to the formation of a compound which has a higher secondary electron emission ...
9