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Etch and rinse

Effect of Amalgam Corroded Products on Quality of Hybrid Layer Using Etch and Rinse and Self-etch Adhesive Systems

Effect of Amalgam Corroded Products on Quality of Hybrid Layer Using Etch and Rinse and Self-etch Adhesive Systems

... At present, the use of resin composite materials in conjunction with dental adhesive is emerging of choice for replacement of existing amalgam restorations. The dentinal tubules of the discolored dentin were found to be ...

7

Effect of 940nm Diode Laser Irradiation on Microtensile Bond Strength of an Etch and Rinse Adhesive (Single Bond 2) to Dentin

Effect of 940nm Diode Laser Irradiation on Microtensile Bond Strength of an Etch and Rinse Adhesive (Single Bond 2) to Dentin

... an etch and rinse bonding system was introduced with two- step etch and rinse protocol, which requires mixing of the two components of primer and bonding agent in order to facilitate the ...

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Bond strength and micromorphology of resin-dentin interface of etch-and-rinse dentin bonding agents after 1-year of water storage

Bond strength and micromorphology of resin-dentin interface of etch-and-rinse dentin bonding agents after 1-year of water storage

... The three-step etch-and-rinse Optibond FL was used as a control group, since it is con- sidered the gold standard in terms of bonding durability [3]. Hydrophilic and hydropho- bic monomers are presented in ...

8

Comparative evaluation of degree of conversion of Etch-and-Rinse and Self-etch adhesive systems using QTH and led light curing units: An In vitro study

Comparative evaluation of degree of conversion of Etch-and-Rinse and Self-etch adhesive systems using QTH and led light curing units: An In vitro study

... two-step etch-and-rinse (Single Bond, 3M ESPE) and two all-in-one self-etch adhesive systems (One-Up Bond F, Tokuyama; Adper Prompt, 3M ESPE) using ATR-FTIR with a real-time spectrum ...the ...

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Influence of light-curing distance on degree of conversion and cytotoxicity of etch-and-rinse and self-etch adhesives

Influence of light-curing distance on degree of conversion and cytotoxicity of etch-and-rinse and self-etch adhesives

... Within the limitations of the present study (chosen light-curing unit, adhesives and distances between light- curing tip and adhesives surface), it can be concluded that the distance bet[r] ...

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Effect of Dimethyl Sulfoxide on Bond Strength of a Self-Etch Primer and an Etch and Rinse Adhesive to Surface and Deep Dentin

Effect of Dimethyl Sulfoxide on Bond Strength of a Self-Etch Primer and an Etch and Rinse Adhesive to Surface and Deep Dentin

... DMSO is a chemical penetration enhancing [34] am- phiphilic solvent, fully miscible in all the solvents used in adhesive dentistry. [27] This agent is able to penetrate biological surfaces [28] and compete with water ...

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The Effect of Temperature on Shear Bond Strength of Clearfil SE Bond and Adper Single Bond Adhesive Systems to Dentin

The Effect of Temperature on Shear Bond Strength of Clearfil SE Bond and Adper Single Bond Adhesive Systems to Dentin

... an etch-and-rinse (Adper single bond) and a self-etch (Clearfil SE Bond) were stored at temperatures of 4˚C, 25˚C and 40˚C for 30 minutes and were then applied on the prepared labial surface ...

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Effect of Lactic Acid on Microleakage of Class V Low-Shrinkage Composite Restorations

Effect of Lactic Acid on Microleakage of Class V Low-Shrinkage Composite Restorations

... Many clinical and laboratory studies have demonstrated that the adhesive interface is the weakest area in adhesive restorations [16-18]. The mechanism of action of the currently used bonding systems (both ...

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An In vitro Evaluation of the Effect of Four Dentin Bonding System on the Bond Strength between Quartz Fiber Post and Composite Core

An In vitro Evaluation of the Effect of Four Dentin Bonding System on the Bond Strength between Quartz Fiber Post and Composite Core

... The posts were first immersed in a 24% hydrogen peroxide solution for 10 min at room temperature and were, then, rinsed with running water for 2 min and gently air-dried. The bonding agents, used in this study, were four ...

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Effect of Chlorhexidine and Cystatin Incorporated Adhesives on MMPs and Cysteine Cathepsin-An In-vitro Zymographic Analysis

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... Activation of cysteine cathepsin activity and conversion into its mature form, at neutral pH is regulated by Glycosminoglycans (GAGs) [25,38]. During acid-demineralization cysteine cathepsins activate MMPs by proteolytic ...

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The Effect of Saliva Contamination on Shear Bond Strength of Two Universal Bonding Agents-An in vitro Study

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... Dentin bonding agents have evolved from the gold standard-etch and rinse fifth generation adhesives to the present universal adhesives. The different generations of dentin bonding agents have witnessed a ...

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An in Vitro Comparison of Bonding Effectiveness of Different Adhesive Strategies on Erbium:Yttrium Alluminum Garnet Laser Irradiated Dentin

An in Vitro Comparison of Bonding Effectiveness of Different Adhesive Strategies on Erbium:Yttrium Alluminum Garnet Laser Irradiated Dentin

... an etch and rinse and a self-etch adhesive system combined with a resin composite, a self-adhesive resin composite and a glass- ionomer cement to laser and silicon carbide (SiC) paper-prepared human ...

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Microshear Bond Strength of Scotchbond Universal Adhesive to Primary and Permanent Dentin: A Six-Month In Vitro Study

Microshear Bond Strength of Scotchbond Universal Adhesive to Primary and Permanent Dentin: A Six-Month In Vitro Study

... or etch-and-rinse), and duration of storage in distilled water (24 hours and six months), as well as the quantitative dependent variable of microshear bond strength, three-way analysis of variance (ANOVA) ...

8

Microshear Bond Strength of Different Adhesive Systems to Dentin

Microshear Bond Strength of Different Adhesive Systems to Dentin

... in etch and rinse mode in our ...of etch and rinse systems is the suboptimal infiltration of resin into the demineralized collagen network and subsequently poor adaptation of the bonding resin ...

7

An Etching Study for Self-Aligned Double Patterning

An Etching Study for Self-Aligned Double Patterning

... as a preventive maintenance measure to not replace the bulbs as often as the tool does not see 24/7 use. A trend was shown that the first wafer after a clean was slightly less uniform, on the order of 0.59% or 10nm ...

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Modeling Tools for Environmental and Economic Uncertainties in Nanomanufacturing

Modeling Tools for Environmental and Economic Uncertainties in Nanomanufacturing

... 8 Wafer clean Rinse and dry Cascade rinse and dry 9 Etch Film patterning SF 6 , CHF 3 plasma etch 10 Etch Resist removal HF wet etch. 11 Wafer clean Rinse and dry Cascade rinse and dry[r] ...

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Nanoleakage in indirect composite restorations using different combinations of resin coating technique

Nanoleakage in indirect composite restorations using different combinations of resin coating technique

... G1: Etch-rinse 2steps/Hydrophobic monomer [Single Bond 2/Bond of Scotch Bond Multipurpose (SB2/ B)]; G2: Etch-rinse 2steps/Flow composite-resin [SB2/Filtek Flow (SB2/FL)], G3: Self-etch ...

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The Modelization of the Wet Etching Rate by the Segregation Boron and Phosphorus Distributions in Si/SiO2

The Modelization of the Wet Etching Rate by the Segregation Boron and Phosphorus Distributions in Si/SiO2

... The analytical expressions used to model the etch rate match very well with experimental results. We have indi- rectly shown in this study, a qualitative and/or a quantitative way, to calculate the degree of ...

8

Nanofabrication for On-Chip Optical Levitation, Atom-Trapping, and Superconducting Quantum Circuits

Nanofabrication for On-Chip Optical Levitation, Atom-Trapping, and Superconducting Quantum Circuits

... an optical fiber mode into our waveguide [2]. The waveguide coupling tip is designed to maximize the mode overlap between the fiber mode and waveguide mode. The fiber is self-aligned to the waveguide center by lowering ...

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Addition polymerization toward the synthesis of photoresists for microlithography with carbon dioxide development

Addition polymerization toward the synthesis of photoresists for microlithography with carbon dioxide development

... non-volatile etch products—including those formed by interactions with the etch chamber itself 9 —have the potential to redeposit onto the ...in etch compositions with a low F/C ratio, fast-etching ...

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