High Power Pulsed Magnetron Sputtering
Linköping University Post Print. CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study
... using high- power pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by ...
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Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... increased resulting into flatter surfaces. The cross-section appeared glassy for lowest N 2 flow rate, figure 6a, and became faceted (figure 6b to e) as the flow rate increased. Similar dependency of microstructure on ...
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Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... Similar dependency of microstructure on nitrogen flow rate of CrNx coatings has been reported by Greczynski et al. when pure HIPIMS along with a high pulsed bias voltage of 150 V was used. 21 However, the ...
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Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... increased resulting into flatter surfaces. The cross-section appeared glassy for lowest N 2 flow rate, figure 6a, and became faceted (figure 6b to e) as the flow rate increased. Similar dependency of microstructure on ...
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Influence of power pulse parameters on the microstructure and properties of the AlCrN coatings by a modulated pulsed power magnetron sputtering
... In Figure 14c,d, the O 1s peak is substantially higher and the N 1s peak has become marginal in the 800 ◦ C wear track as compared to that in the 600 ◦ C specimen. The XPS analyses confirmed that the coatings in the wear ...
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High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering
... using pulsed DC magnetron sputtering is of particular ...deposition power at the magne- tron target (corresponding to a power density of ~ ...is high and much faster than can be ...
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High rate deposition of thin film CdTe solar cells by pulsed dc magnetron sputtering
... Optimization of the process involved a number of parameters including control of pulse frequency, power and working gas pressure. The devices deposited using the process are exceptionally uniform enabling the CdTe ...
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TaN thin films deposited by modulated pulsed power magnetron sputtering: Coating solutions for harsh environments
... P a g e 182 | 286 β alloys: Al- and V-free new Ti alloys. Different alloys can be found including mainly the following alloying elements: Mo, Nb, Ta and Zr. Currently, all these metallic biomaterials are commonly used ...
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The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering
... using pulsed DC magnetron sputtering (PDCMS) [18] to sputter thin films of CdS in highly stable process condi- ...produces high deposition rates which are much higher than those obtained using ...
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The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering
... using pulsed DC magnetron sputtering (PDCMS) [18] to sputter thin films of CdS in highly stable process condi- ...produces high deposition rates which are much higher than those obtained using ...
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Pulsed DC magnetron sputtering deposition of crystalline photocatalytic titania coatings at elevated process pressures
... etc.) magnetron sputtering (MS) is a method of particular industrial importance as it offers a number of advantages, including large area uniformity, good control over chemical and morphological properties ...
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Preparation of Thin Films by a Bipolar Pulsed DC Magnetron Sputtering System Using Ca3Co4O9 and CaMnO3 Targets
... The thermoelectric properties were assessed from Seebeck coefficient and electrical resistivity measurements at room temperature. The power factors were calculated. It was found that the optical emission spectrums ...
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High-power Impulse Magnetron Sputtering
... Description of industry specific problem impact Analysis of industry specific financial market potential Potential companies Analyzed application fields build the foundation for an p[r] ...
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Advanced coatings through pulsed magnetron sputtering
... in high efficiency photovoltaic ...into high performance photovoltaic devices. Their high resistance to radiation damage 8 Optical transmission spectra for CIS coating ...
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Dynamic pressure measurements in high power impulse magnetron sputtering
... is high enough (in the order of 1- 100mTorr) to expose the substrate to a significant number of impinging ...a sputtering event, and the target atom can now be transported towards the substrate, eventually ...
Pulsed DC magnetron sputtering of transparent conductive oxide layers
... meaning that the substrate carrier was moved below the three available target stations with a velocity of approximately 130 cm/min. The film thickness could be varied by the number of passes. The target to sub- strate ...
Pulsed DC reactive magnetron sputtering of aluminum nitride thin films
... what observed for glass due to the limitations of the mean free path. It may be induced by geometrical effects associated with disordered nature of the structure. Lambropoulos et al [122,123] reported the thermal ...
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High power impulse magnetron sputtering discharges: Instabilities and plasma self organization
... To study the discharge with high temporal- and spatial resolution, we observed the cathode surface face-on through a silica glass view port with wavelength cutoff at 300 nm. The window retained transparency over a ...
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Plasma diagnosis of reactive high power impulse magnetron sputtering (HiPIMS) discharges
... 2.3 Magnetron discharge In diode sputtering, the pressure required to maintain a sufficiently dense plasma is com- parably high when compared to a magnetron sputtering ...a ...
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Effect of Sputtering Power on the Nucleation and Growth of Cu Films Deposited by Magnetron Sputtering
... DC power helps to increase the surface mobility and this results in forming a large crystallite size which may be due to high adatom energy, and thereby highly crystalline Cu films can be ...DC power ...
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