Plasma Sputtering
Solution Plasma Sputtering Processes for the Synthesis of PtAu/C Catalysts for Li-Air Batteries
... involved sputtering discharge in liquid, and did not require the use of chemical species such as surfactants and/or ...solution plasma sputtering was driven by a pulsed power supply, and was ...
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Preparation of Au/SiO2 Nano Composite Multilayers by Helicon Plasma Sputtering and Their Optical Properties
... P. Brault et al. 19) has investigated the nucleation and ini- tial growth of platinum films deposited on an amorphous car- bon membrane surface by plasma sputtering. They found that nano-particles nucleated ...
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Optical Properties of Au/SiO2 Nano Composite Films Prepared by Induction Coil Coupled Plasma Sputtering
... coupled plasma sputtering (ULVAC, MB95-1010). The sputtering system has a pair of conventional dc magnetron cathodes in which a circular radio-frequency (RF)-induction coil is enhanced in front of ...
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Characteristics and Operation Conditions of a Closed Field Unbalanced Dual Magnetrons Plasma Sputtering System
... magnetron plasma sputtering system was characterized to introduce its performance in accordance to Paschen’s law and governing properties of such de- position ...
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Structural Properties of Hydroxyapatite (HA ) Thin Film on Ti-6Al-4V Alloy Prepared by Radio Frequency Plasma Sputtering
... data of HAp thin films formed on the surface of Ti- 6Al-4V alloy respectively. In spite of the existence α and β phases of Ti-6Al-4V alloy. The HAp thin films were built on whole surface of substrate. The uncoated ...
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Electron Energy Loss Spectroscopy of Carbon Films Prepared by Electron Cyclotron Resonance Plasma Sputtering
... While a variety of techniques have been applied to prepare a protective hard carbon film for hard-disks, the physical ori- gins of the mechanical and electrical properties of the films are still not fully understood. In ...
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Diagnostic of Plasma Spectral and Development Ti6Al4V Alloy with Deposition Titanium Layer by R-F Sputtering
... Ti-6Al-4V alloy samples were used in plasma sputtering (3 x 10 x 10) mm using a diamond cutter (Struers, Denmark). Ti-6Al-4V alloys were manufactured by grinding and polishing mirror respectively, using the ...
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Tungsten nanostructure formation in a magnetron sputtering device
... Diego. Prior to doing some experimental work on their large scale high power plasma devices, a compilation of many fuzz samples in the literature was undertaken. This brought together many fuzz samples covering ...
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Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... reactive sputtering has been thoroughly investigated and reported by various ...reactive sputtering, the formation of a com- pound layer on the target alters the voltage–current charac- teristics of the ...
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Simulation of plasma properties in magnetron sputtering with Kr gas
... :electron plasma period T ,end of the ion flow, the time 280T, and the time ...total plasma density, three-dimensional spatial profile density of ions and electrons, and finally examining the behavior of ...
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Effects of Titanium Sputtering Current on Structure and Morphology of TiZrN Films Prepared by Reactive DC Magnetron Co Sputtering
... Zr sputtering current was fixed at 0.6 A and Ti sputtering current varied from ...Ti sputtering current on the structure and morphology of the films were investigated by XRD, AFM, FE-SEM, TEM and ...
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Aluminum nitride films by reactive sputtering
... N2 Composition Figure 3-3 Affect of annealing on thickness 51 Figure 3-4 Affect of annealing on refractive index 52 Figure 3-5 Capacitance as a function of plate area 52 Figure 3-6 Optic[r] ...
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Collision spike Sputtering of Au Nanoparticles
... spike sputtering of bulk Au targets showed that the energy loss to the electronic system will withdraw the energy from the atomic system; this may happen so rapidly that the collision spike may be quickly quenched ...
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Advanced coatings through pulsed magnetron sputtering
... Pulsed magnetron sputtering (PMS) has become established as the process of choice for the deposition of dielectric materials for many applications. The process is attractive because it offers stable arc free ...
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Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... reactive sputtering is well-known and has been studied in depth over the ...Magnetron Sputtering (HIPIMS), which have highly ionized plasmas of the depositing species (metal and gas ions), target poisoning ...
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An interferometric force probe for beam diagnostics and the study of sputtering
... An example of a force vector measurement was presented, where the energetic par- ticles of a broad-beam ion source impacted at variable angles at the probe target. Two different target materials were used, namely copper ...
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Origin of atomic clusters during ion sputtering
... during sputtering primarily because this technique allows the size distribu- tions of clusters, at least for those comprising up to about 40 atoms, to be determined both accurately and conve- niently [2 ...
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Electrochemical Behavior of Nb2O5 Films Produced by Magnetron Sputtering
... coatings on the electrochemical behavior of AISI 316 stainless steel. The films were deposited for 15, 30 and 50 minutes by using DC magnetron sputtering technique. The corrosion resistance was evaluated by ...
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ZnO Films Deposited on Glass by Means of DC Sputtering
... Quemener et al . reported electronic properties of Al-doped ZnO deposited on p-type Si wafer by DC magnetron sputtering [22]. They observed the rectifying feature in I-V characteristics. They annealed their ...
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Nickel coatings by Inductively Coupled Impulse Sputtering (ICIS)
... Magnetron-based sputtering techniques suffer from low target utilisation rates of ...Impulse Sputtering (ICIS) is a new development which aims to solve the previously mentioned issues by eliminating the ...
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