[PDF] Top 20 Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing
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Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing
... Herein, crystalline molybdenum oxide thin films with controlled phase composition are deposited by atomic layer ...2.89) phase. The phase composition can be ... See full document
11
Atomic Layer Deposition and Molecular Layer Deposition on Polymers.
... and thin film synthesis reaction mechanisms. Molecular layer deposition (MLD) is a vapor phase deposition process, based on atomic layer deposition (ALD) which ... See full document
397
The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition
... in situ spectroscopic ellipsometry (SE) and phase mea- surements in inspection are widely used in semiconductor process and solar cells. These applications are dependent on the accuracy of dielectric constants. ... See full document
6
Effects of doping and annealing on properties of ZnO films grown by atomic layer deposition
... ZnO films are shown in Table ...Al oxide phase as that reported in ...as-grown films (Figures 4, 7, and 8). It can be supposed that the crystalline grains are surrounded by amorphous ... See full document
10
Effects of Deposition Temperature on the Electrochemical Deposition of Zinc Oxide Thin Films from a Chloride Solution
... ZnO thin fi lms calculated using ...morphological control is a key consid- eration to achieve low resistivity with the dense structure and well-connected grains of ZnO ... See full document
7
The effect of film thickness on the gas sensing properties of ultra thin TiO2 films deposited by atomic layer deposition
... too thin to produce significant ...amorphous/poorly crystalline layer forms on the surface of the substrate and it is only after subsequent growth that the nucleation sites start to coalesce and form ... See full document
14
Effect of Deposition Parameters on Electrodeposited Cuprous Oxide Thin Films
... 596 Photocurrent measurements was carried out using a home-built system, which includes a light source, an illumination switch, a three-electrode cell and a controlling system. A 100W tungsten lamp is used to provide ... See full document
8
Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
... Hf atomic percentages decreased as the etching time increased from 130 to 175 s, indicating that the O el- ements diffused into the c-Si substrate, forming an inter- facial layer [18, ...oxygen ... See full document
7
Spray Pyrolysis Deposition of Single and Mixed Oxide Thin Films
... ure 6(a) to 80% in Figure 6(b)), crystallization occurs and a well-structured thin film is produced. These results exhibit the same trend that was observed in a previous Figure 2 for ZnO films. Thus by ... See full document
18
High Quality Germanium Oxide Thin Films: Deposition and Characterization.
... germanium oxide is more striking when looking at mixed ...germanium oxide have been exploited by device manufacturers as the alloys are much higher quality than pure ...germanium oxide in silicon ... See full document
90
Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser induced damage thresholds
... same deposition time used for all films, a greater amount of organic groups remained in the film as compared to inorganic ...of thin films subjected to a high-energy laser. Therefore, ... See full document
7
Chemical Protective Metal-Organic Framework Thin Films on Fiber Systems Driven by Atomic Layer Deposition.
... 15,16 layer-by-layer growth, 17 counter-diffusion, 18 or microwave irradiation, 19 many of which require high temper-atures or relatively long processing ...solution phase, thereby depleting reactants ... See full document
285
Atomic Layer Deposition for Nano-manufacturing
... - Identical film properties to R&D and Pilot Scale batch reactor. - Currently in production for commercial product; 920 X 730 mm plate[r] ... See full document
25
Fabrication of multilayer ZnO/Ti02/Zn0 thin films with enhancement of optical properties by atomic layer deposition (ALD)
... Hou, and K-L Choy, Enhancement of Crystallinity and Optical Properties of Bilayer Ti02 /ZnO Thin Films Prepared by Atomic Layer Deposition.. Patrick, Improvement in corrosion resistance [r] ... See full document
6
(Invited) Vacuum Ultraviolet Photochemical Atomic Layer Deposition of Alumina and Titania Films
... ALD at the low substrate temperature of 60 °C. The growth mechanisms of alumina and titania from trimethyl aluminium and titanium tetraisopropoxide precursors is shown to involve surface elimination and oxidation ... See full document
7
Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal–Oxide–Semiconductor High Electron Mobility Transistors
... A single binding energy (BE) peak for the Ga 3d core level, situated at 20.1 eV, confirmed the presence of Ga–O bonds [21] in the sample and the absence of elem- ental Ga in the film. A single, sharp O 1 s peak, centered ... See full document
9
Density Functional Theory Study of Atomic Layer Deposition of Zinc Oxide on Graphene
... The infrared (IR) spectrum corresponding to the growth of ZnO nanostructures onto a layer of graphene was simulated using the DFT approach. The computational details were described earlier in this article. Because ... See full document
9
Structural and Optical Properties of Al-doped ZnO Thin Films Prepared by Ion Assisted Deposition Method by Post-Step Post-Annealing
... beam deposition system used in the present study is shown in Figure ...while thin films are deposited using the electron beam deposition ...Regarding deposition conditions, the chamber ... See full document
17
The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin Film Transistors Deposited via Atomic Layer Deposition
... channel layer and deep-level defects in the chan- nel/insulator interface ...based oxide TFTs, many studies have been devoted to the development of robust active layers by the incorpor- ation of metal ... See full document
7
Structure and Electro Optical Properties of Thin Films Grown by Alternate Atomic Layer Deposition of ZnO and Al2O3 on the Sapphire Substrate
... incident laser beam used in this study was about 1 mm, which is much larger than the film thickness, it is likely that the stimulated emission was caused by the closed-loop paths in the direction parallel to the film ... See full document
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