[PDF] Top 20 Deposited TiO2 thin films by atomic layer deposition (ALD) for optical properties
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Deposited TiO2 thin films by atomic layer deposition (ALD) for optical properties
... than 260°C. He suggested that this was related to the thermally activated nucleation process, which results in a larger number of smaller grains at higher deposition temperatures. Similar surface roughness ... See full document
5
Fabrication of multilayer ZnO/Ti02/Zn0 thin films with enhancement of optical properties by atomic layer deposition (ALD)
... Hou, and K-L Choy, Enhancement of Crystallinity and Optical Properties of Bilayer Ti02 /ZnO Thin Films Prepared by Atomic Layer Deposition.. Patrick, Improvement in corrosion resistance [r] ... See full document
6
Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition
... structural, optical, and electrical properties of ALD-based AZO films with doping concen- trations ranging from ...the films deposited by ALD ...ZnO films. SE ... See full document
8
Nano oxide thin films deposited via atomic layer deposition on microchannel plates
... From the gain and resistance results shown in Figure 11, the film prepared on condition 4 with the highest resist- ance also has one of the lowest gains. This could be caused by saturation of the MCP since the more ... See full document
11
Phase change properties of GeSbTe thin films deposited by plasma enchanced atomic layer depositon
... are plotted in Figure 5. Reversible phase-change process has been observed. As revealed, once the programing voltage increases beyond the threshold voltage, the cell resistance starts to drop due to the crystallization ... See full document
5
Enhanced band edge photoluminescence from ZnO passivated ZnO nanoflowers by atomic layer deposition
... the optical properties, the as-grown sam- ple was coated by a ZnO thin film by ...ZnO films grown by ALD would have few zinc in- terstitials and oxygen vacancies [17]; hence, it is a ... See full document
6
Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
... Thermal ALD ZnO films contain a high density of defects as evidenced by the high carrier concentration which is attributed to the oxygen vacancies or ...a thin ZnO layer, many conducting ... See full document
14
Effects of Rapid Thermal Annealing and Different Oxidants on the Properties of LaxAlyO Nanolaminate Films Deposited by Atomic Layer Deposition
... of ALD which facilitates the growth of conformal thin films with accurate thickness ...control. ALD is also suitable for depositions on trench- type ...for thin films, the ... See full document
9
The effect of film thickness on the gas sensing properties of ultra thin TiO2 films deposited by atomic layer deposition
... ultra-thin films deposited are extremely conformal and continuous to the underlying ...substrate. ALD allows atomic level control of film growth, allowing fabrication of materials with ... See full document
14
Optical and microstructural properties of ZnO/TiO2 nanolaminates prepared by atomic layer deposition
... vapor deposition, pulsed laser deposition, and co-sputtering ...nanolaminate films require precisely controlled factors including interfacial roughness, interdiffusion be- tween layers, ... See full document
5
Zirconium doped zinc oxide thin films deposited by atomic layer deposition
... the ALD window, the growth rate decreases, due to desorption and incomplete reaction respectively [212]-[213] ...thermal ALD is reported to result in growth rate of ...the ALD window [215]-[217] . ... See full document
275
Atomic layer deposition of nano-TiO<sub>2 </sub>thin films with enhanced biocompatibility and antimicrobial activity for orthopedic implants
... Nanostructured TiO 2 coatings on Ti-based implants using the ALD technique showed promising antimicrobial efficacy toward gram-positive bacteria (S. aureus), gram-negative bacteria (E. coli), and ... See full document
13
(Invited) Vacuum Ultraviolet Photochemical Atomic Layer Deposition of Alumina and Titania Films
... dielectric properties of the alumina MOS and titania MIM structures have been investigated using capacitance-voltage and current- voltage measurements ...photochemical ALD dielectrics are comparable to ... See full document
7
Structural, morphological, and optical properties of TiO2 thin films synthesized by the electro phoretic deposition technique
... structural properties showing a polycrystalline aspect is carried out by X-Ray diffraction ...using atomic force microscopy (AFM) show no cracks in the ... See full document
7
Structure and Electro Optical Properties of Thin Films Grown by Alternate Atomic Layer Deposition of ZnO and Al2O3 on the Sapphire Substrate
... Before structural investigation, we examined the electro- optical properties of the prepared specimens. PL spectra from the ZnO film and ZnO:Al (4%) film are shown in Figs. 2(a) and 2(b), respectively. The ... See full document
8
The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition
... SE is routinely used in optical characterization and film thickness determination. In the SE measurement, a linearly polarized light is illuminated on the sample. The polarization state will be changed after the ... See full document
6
A composite CdS thin film/TiO2 nanotube structure by ultrafast successive electrochemical deposition toward photovoltaic application
... the thin film-sensitized cell had generally less shunt resist- ance, which might be due to its lower probability of re- combination with better electron transport within the CTF ...of deposited film with a ... See full document
13
Magnesium Doping for the Promotion of Rutile Phase Formation in the Pulsed Laser Deposition of TiO2 Thin Films
... The optical properties were clarified by spectroscopic el- lipsometry (M-2000, J. A. Woollam Co., Ltd). This measure- ment included obtaining an ellipsometric parameter (Φ, Δ) with incident angles from 50 ... See full document
6
The Atomic Layer Deposition of Noble Metals for Microelectronics Applications
... lately. Atomic layer deposition has been one of the fastest growing technologies for past decades due to its process nature of excellent conformality and thickness control ...Ru ALD nucleation ... See full document
143
Improvement of carrier diffusion length in silicon nanowire arrays using atomic layer deposition
... oxide layer existing on the surface of the SiNW array was removed with a HF ...was deposited by PECVD under the same condition as the heterojunction crystalline silicon solar cell in which the fabrication ... See full document
8
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