[PDF] Top 20 Effect Of Electrical Grounding Of Substrate On The Magnetron Sputtering Of Titanium Film

... alloys, titanium usually can be alloyed with iron, aluminum, vanadium, and many more among others ...coating, titanium is nearly as resistant to corrosion as platinum, and resists many salt solutions, acids ... See full document

... the film deposited on the nonconductive glass ...in film thickness between the conductive and nonconductive substrates can be explained by the following mechanism: (i) stronger Coulombic attractions of the ... See full document

... and electrical properties of Ti thin films prepared by using RF magnetron sputtering under sputtering power of 75W to 150W at relatively low temperature (200 ...the film deposited at ... See full document

... thin film capacitor, dye-sensitized solar cells and photovoltaic ...thin film various methods have been developed such as sol-gel, pulsed laser deposition, drop- casting, electrochemical etching, metal ... See full document

... D. Electrical properties of AZO thin films The electrical property of AZO films is also an impor- tant factor for its performance in ...the substrate position facing the target is due to the high ... See full document

... different substrate temperatures using rf sputtering with Ar/N 2 ratio of about ...and electrical properties of TiN thin films were characterized with x-ray diffraction (XRD), atomic force microscopy ... See full document

... the electrical field of the electromagnetic radiation of light [10] ...pulsed-DC sputtering and PECVD, which is used for simultaneous Au sputtering and SiO 2 deposition [18] [19], and RF ... See full document

... textile substrate is very unsmooth, so even under the same sput‐ tering condition, the film structures at different positions of the textile substrate are com‐ pletely ...fabric substrate and ... See full document

... a titanium magnetron cath- ode excited by a direct current and two microwave coaxial antennas located per- pendicularly to the magnetron substrate holder ...the substrate, it can be ... See full document

... the magnetron cathode was ...silicon substrate (100) with a diameter of 25.4 mm was mounted on the substrate stage separated at a distance of 70 mm from the titanium ...silicon ... See full document

... thin film coatings manufactured in this ...thin film coatings is examined using FESEM, so that the correlation between the deposition rate and thickness of thin films is ...SS substrate is known as ... See full document

... and sputtering. Among of the techniques, magnetron sputtering is known for its simplicity, provides controllable critical process parameters [9], high deposition rate, competitive costs, good ... See full document

... a substrate enables the deposition of a thin ...beam sputtering is not widely used for industrial large scale ...the substrate during thin film deposition[1]. The sputtering process ... See full document

... INTRODUCTION Titanium dioxide (TiO 2 ) is most suitable for industrial and environment applications such as energy conversion, self-cleaning, air purification, destruction of microorganisms, ...like ... See full document

... the substrate temperature and sputtering pressure of direct current (DC-) magnetron sputtering process are important factors to control the morphology of thin film, 13) they may affect the ... See full document

... the magnetron discharge was pulsed at 200 kHz to provide a power density of ...to substrate distance, using the SnO 2 powder ...thin film was measured to be below 170 °C at the substrate using ... See full document

... silicon, substrate under conditions listed in Table ...the electrical conductivity and dielectric constant were measured as a function of temperature (30–250°C) and frequency (5 Hz–13 MHz by a capacitance ... See full document

... beam sputtering [10], electron beam evaporation [11, 12], RF sputtering [13, 14], hybrid sputtering [15], pulsed laser deposition [16], photo- chemical deposition [17], sol–gel [18], spray pyrolysis ... See full document

... °C. The composition of the films was controlled by varying RF power of CdS and ZnS in such a ratio so that zinc content in the thin films was low. The composition, structural, optical and surface morphological properties ... See full document

... the sputtering system plays an important role in the nucleation and growth of Cu films as well as electrical and structural ...different sputtering power during the initial stage of ...DC ... See full document