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[PDF] Top 20 Microstructure and Mechanical Properties of TiN/TiCN/TiC Multilayer Thin Films Deposited by Magnetron Sputtering

Has 10000 "Microstructure and Mechanical Properties of TiN/TiCN/TiC Multilayer Thin Films Deposited by Magnetron Sputtering" found on our website. Below are the top 20 most common "Microstructure and Mechanical Properties of TiN/TiCN/TiC Multilayer Thin Films Deposited by Magnetron Sputtering".

Microstructure and Mechanical Properties of TiN/TiCN/TiC Multilayer Thin Films Deposited by Magnetron Sputtering

Microstructure and Mechanical Properties of TiN/TiCN/TiC Multilayer Thin Films Deposited by Magnetron Sputtering

... the multilayer TiN/TiCN/TiC thin films deposited on CP-Ti, Ti6Al4V and silicon substrates were observed by Quanta 250 FEG model scanning electron ... See full document

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Microstructure and Mechanical Properties of TiN/TiCN/TiC Multilayer Thin Films Deposited by Magnetron Sputtering Abbas Razmi , Ruhi Yeşildal

Microstructure and Mechanical Properties of TiN/TiCN/TiC Multilayer Thin Films Deposited by Magnetron Sputtering Abbas Razmi , Ruhi Yeşildal

... TiN films are commercially important due to their high hardness, high thermal, chemical stability and wear resistance ...material, TiN films usually are deposited on Titanium, steel and ... See full document

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Comparison of Properties of Ti/TiN/TiCN/TiAlN Film Deposited by Cathodic Arc Physical Vapor and Plasma-assisted Chemical Vapor Deposition on Custom 450 Steel Substrates

Comparison of Properties of Ti/TiN/TiCN/TiAlN Film Deposited by Cathodic Arc Physical Vapor and Plasma-assisted Chemical Vapor Deposition on Custom 450 Steel Substrates

... tribological properties of Ti/TiN/TiCN/TiAlN multilayer coatings onto a Custom 450 steel ...The microstructure of the coatings was evaluated using (SEM), and phase formation was ... See full document

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Tribological Properties of Multilayer TiN and MoS2 Thin Films

Tribological Properties of Multilayer TiN and MoS2 Thin Films

... The TiN thin films were deposited by reactive radio frequency (RF) magnetron sputtering method on Al substrates. The deposition was carried out a pressure inside the chamber was ... See full document

6

Influence of the Number of Bilayers on the Mechanical and Tribological Properties in [TiN/TiCrN]n Multilayer Coatings Deposited by Magnetron Sputtering

Influence of the Number of Bilayers on the Mechanical and Tribological Properties in [TiN/TiCrN]n Multilayer Coatings Deposited by Magnetron Sputtering

... For multilayer coatings and as proposed by authors such as WF Piedrahita and collaborators [15] it was evident that the predominant mechanism was an adhesive type wear and when the number of bilayers increased, as ... See full document

14

Structural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputtering

Structural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputtering

... the mechanical properties changing with respect to the indentation depth can be ...BFO thin films, nanoindentation was conducted on the standard fused silica sample to obtain the reasonable ... See full document

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Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates

Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates

... sputter deposited for 20, 30, and 40 min, ...thinner films were favored, yet they still had to be optically thick (thickness greater than 100 nm for ...as-deposited films using spectroscopic ... See full document

8

Effect of Heat Treatment on the Nanoscale Structure and Optical Properties of Cd2SnO4 Thin Films Deposited by RF Magnetron Sputtering

Effect of Heat Treatment on the Nanoscale Structure and Optical Properties of Cd2SnO4 Thin Films Deposited by RF Magnetron Sputtering

... tron sputtering technique on glass substrates at room ...these films as a function of annealing temperature at the ...optical properties of these films, such as the transmittance, T(λ), and ... See full document

11

Growth and Characterization of Cu2znsns4 Thin Film by RF-Magnetron Sputtering

Growth and Characterization of Cu2znsns4 Thin Film by RF-Magnetron Sputtering

... CZTS thin films are generally prepared by thermally activated processes like evaporation and sequential processing which is comprised of deposition of the alloy precursors followed by post- ...be ... See full document

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				MOLYBDENUM TRIOXIDE THIN FILMS DOPED WITH GOLD NANOPARTICLES GROWN BY A SEQUENTIAL METHODOLOGY: PHOTOCHEMICAL METAL-ORGANIC DEPOSITION (PMOD) AND DC-MAGNETRON SPUTTERING

← Return to Article Details MOLYBDENUM TRIOXIDE THIN FILMS DOPED WITH GOLD NANOPARTICLES GROWN BY A SEQUENTIAL METHODOLOGY: PHOTOCHEMICAL METAL-ORGANIC DEPOSITION (PMOD) AND DC-MAGNETRON SPUTTERING

... chromogenic properties of molybdenum oxide on the one hand and the catalytic properties of gold nanoparticles on the other, a binary system that is formed by molybdenum oxide coated with gold nanoparticles ... See full document

5

Magnetron Sputtering of Gadolinium-doped Ceria Electrolyte for Intermediate Temperature Solid Oxide Fuel Cells

Magnetron Sputtering of Gadolinium-doped Ceria Electrolyte for Intermediate Temperature Solid Oxide Fuel Cells

... During magnetron sputtering without applying a substrate bias a strong ion mixing process isn’t ...dense microstructure of films deposited at room temperature substrates may be caused ... See full document

10

Anticorrosion Behavior of Deposited Magnetite on Galvanized Steel in Saline Water Using RF-Magnetron Sputtering

Nafeesa J. Kadhim1* Ahlam M. Farhan1 Harith I. Jaafer2

Anticorrosion Behavior of Deposited Magnetite on Galvanized Steel in Saline Water Using RF-Magnetron Sputtering Nafeesa J. Kadhim1* Ahlam M. Farhan1 Harith I. Jaafer2

... scanning electron microscopy (SEM) technique was a Hitachi S4160.More uniform grains may lead to more protection results, via the surface morphologies. Cross section have been analyzed via a Zeiss Supra 55VP ... See full document

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Growth and Magnetic Characterization of High Manganese Silicide Thin Films

Growth and Magnetic Characterization of High Manganese Silicide Thin Films

... In another widely studied class of DMSs, a 3d-transition metal is used to dope a III-V semiconductor. One existing theory for these III-V DMS is based on the indirect exchange between the local magnetic moments, for ... See full document

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Micro structural and functional properties of TiAlCN/VCN coating produced by High Power Impulse Magnetron Sputtering Technology

Micro structural and functional properties of TiAlCN/VCN coating produced by High Power Impulse Magnetron Sputtering Technology

... the sputtering target, which drives the current “I”, depends upon the gas pressure “P” in the vacuum chamber ...as sputtering yield also decides the amount of sputtering atoms, voltage “V” also plays ... See full document

212

Al Doping Effect on the Surface Morphology of ZnO Films Grown by Reactive RF Magnetron Sputtering

Al Doping Effect on the Surface Morphology of ZnO Films Grown by Reactive RF Magnetron Sputtering

... (ZnO) thin films have been widely studied for applica- tions such as transparent conductive oxides (TCOs) ...indium tin oxide (ITO) is one of the TCOs that are mostly used in optoelectronic devices, ... See full document

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Preparation of Thin Films by a Bipolar Pulsed DC Magnetron Sputtering System Using Ca3Co4O9 and CaMnO3 Targets

Preparation of Thin Films by a Bipolar Pulsed DC Magnetron Sputtering System Using Ca3Co4O9 and CaMnO3 Targets

... sited films. Determining thermoelectric properties of Ca- Co-O film showed the low Seebeck coefficient and high electrical resistivity, which leaded to a low power ... See full document

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Effect of Sputtering Power on the Nucleation and Growth of Cu Films Deposited by Magnetron Sputtering

Effect of Sputtering Power on the Nucleation and Growth of Cu Films Deposited by Magnetron Sputtering

... Cu thin films were deposited on Si(100) substrates using direct current (DC) magnetron ...of sputtering DC power on the electrical, structural properties, and the nucleation and growth ... See full document

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The effect of sputtering RF power on structural, optical and electrical properties of CuO and CuO2 thin films

The effect of sputtering RF power on structural, optical and electrical properties of CuO and CuO2 thin films

... thickness, refraction and absorption coefficients of the layers prepared at 150 and 340 W totally increase with increasing power from 150 to 340 W because the dominant phase in these layers is a Cu 2 O phase and these ... See full document

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Growth, Microstructure and Electrochemical Properties of RF Sputtered LiMn2O4 Thin Films on Au/Polyimide Flexible Substrates

Growth, Microstructure and Electrochemical Properties of RF Sputtered LiMn2O4 Thin Films on Au/Polyimide Flexible Substrates

... the sputtering yield the RF power was maintained at 140 W where the observed deposition rate was 150 ...the films grown on flexible substrate is a positive observation for electro- chemical ...4 ... See full document

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Physical properties of nitrogen doped titanium dioxide thin films prepared by dc magnetron sputtering

Physical properties of nitrogen doped titanium dioxide thin films prepared by dc magnetron sputtering

... mbar.The films deposited at nitrogen partial pressure of 6x10 -3 mbar exhibited homogeneous surface with small grains without cracks and ...The films deposited at higher nitrogen partial ... See full document

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