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[PDF] Top 20 Nano oxide thin films deposited via atomic layer deposition on microchannel plates

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Nano oxide thin films deposited via atomic layer deposition on microchannel plates

Nano oxide thin films deposited via atomic layer deposition on microchannel plates

... pared via atomic layer deposition were ...The nano-oxide thin film thickness uniformities for all MCP samples were less than ...homogeneous nano-oxide ... See full document

11

Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing

Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing

... uniform thin fi lms or nanoparticles with controlled sizes and morphologies are ...required. Atomic layer deposition (ALD) is an advanced gas phase thin fi lm deposition method, ... See full document

11

The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

... roughness layer used in SE fitting is fixed as the RMS ...roughness layer is described by a Bruggeman effective medium ap- proximation mixed by 50% Al 2 O 3 and 50% void ... See full document

6

Development of Advanced Nanomaterials for Potential Lithium-Ion Battery Application

Development of Advanced Nanomaterials for Potential Lithium-Ion Battery Application

... metal oxide-graphene nanocomposites ...years, atomic layer deposition (ALD) emerged as a powerful approach to engineering various nanostructures ...vapor deposition (CVD) technique, and ... See full document

256

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition

... conductive oxide (TCO) has received con- siderable attentions and been widely used in electronic and optoelectronic devices [1], such as solar cells [2], liquid crystal [3], and high-definition displays [4], due ... See full document

8

Application of Conductive Thin Films and Selectively Patterned Metal Oxide Coatings on Fibers by Atomic Layer Deposition.

Application of Conductive Thin Films and Selectively Patterned Metal Oxide Coatings on Fibers by Atomic Layer Deposition.

... during deposition on a nylon- 6 nonwoven, as measured (a) using the 2-wire probe under ...coating deposited on bare quartz fibers. In situ, post-deposition conductance measurements were taken as a ... See full document

300

<p>Zirconium Oxide Thin Films Obtained by Atomic Layer Deposition Technology Abolish the Anti-Osteogenic Effect Resulting from miR-21 Inhibition in the Pre-Osteoblastic MC3T3 Cell Line</p>

<p>Zirconium Oxide Thin Films Obtained by Atomic Layer Deposition Technology Abolish the Anti-Osteogenic Effect Resulting from miR-21 Inhibition in the Pre-Osteoblastic MC3T3 Cell Line</p>

... were deposited on cover slips with a diameter of 13 ...the layer to the substrate or its homogeneity, the substrates were washed three times for 5 min, using an ultrasonic cleaner at ... See full document

16

The effect of film thickness on the gas sensing properties of ultra thin TiO2 films deposited by atomic layer deposition

The effect of film thickness on the gas sensing properties of ultra thin TiO2 films deposited by atomic layer deposition

... electron-depleted layer (i.e., space-charge layer) at the material surface ...electron-depleted layer, then theoretically the entire sensing element becomes electron-depleted, providing the least ... See full document

14

Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System

Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System

... a thin oxide film on a clean but unpassi- vated Si surface leads to the formation of new covalent bonds (chemical passivation) and termination of the dangling bonds ...3 thin films by plasma ... See full document

7

Atomic layer deposition of nano-TiO&lt;sub&gt;2&amp;nbsp;&lt;/sub&gt;thin films with enhanced biocompatibility and antimicrobial activity for orthopedic implants

Atomic layer deposition of nano-TiO<sub>2&nbsp;</sub>thin films with enhanced biocompatibility and antimicrobial activity for orthopedic implants

... were deposited onto the Ti substrates by adjusting the reactor temperatures from 120 ° C and 160 ° C to 190 ° ...2 thin layers (Figure ...2 films at higher ... See full document

13

The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin Film Transistors Deposited via Atomic Layer Deposition

The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin Film Transistors Deposited via Atomic Layer Deposition

... films deposited by thermal evaporation were used for source/drain electrodes through a shadow-mask with the channel width W = 1000 μm and channel length L = 60 ...the films was mea- sured with X-ray ... See full document

7

Atomic Layer Deposition of Indium Oxide Nano films for Thin Film Transistors

Atomic Layer Deposition of Indium Oxide Nano films for Thin Film Transistors

... the deposition temperature attains 180 °C, the deposited film becomes ...the deposition temperature, hence resulting in an in- creased RMS ... See full document

8

Deposited TiO2 thin films by atomic layer deposition (ALD) for optical properties

Deposited TiO2 thin films by atomic layer deposition (ALD) for optical properties

... (Atomic Layer Deposition) is an ideal technique for the deposition of nanostructured scale thin films in single layer (Hussin et ...of thin films depends on ... See full document

5

Zirconium doped zinc oxide thin films deposited by atomic layer deposition

Zirconium doped zinc oxide thin films deposited by atomic layer deposition

... The most universally used n-type materials are indium tin oxide (ITO), fluorine tin oxide (FTO), and n-type doped ZnO. ITO is the most common TCO used commercially, manufactured using scale-up DC magnetron ... See full document

275

Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition

Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition

... ZnO thin films grown by thermal and remote plasma-enhanced atomic layer deposition (Thermal ALD and PEALD) and their applications in resistive switching ...ZnO films grown by ... See full document

14

Atomic Layer Deposition for Nano-manufacturing

Atomic Layer Deposition for Nano-manufacturing

... - Identical film properties to R&D and Pilot Scale batch reactor. - Currently in production for commercial product; 920 X 730 mm plate[r] ... See full document

25

Manuscript Title &amp; Authors

Manuscript Title & Authors

... Sulphide thin films were deposited on polished Microscope glass slides of sample plates using solution growth method at different molar concentration for deposition time of 24 ...sample ... See full document

6

Responsivity and Response Time of Nano Silver Oxide on Silicon Heterojunction Detector

Responsivity and Response Time of Nano Silver Oxide on Silicon Heterojunction Detector

... ; oxide nanocrystals and thin films have been intensively pursued for promising applications as a catalyst for ethylene and methanol oxidation , as a sensor for the detection of carbon monoxide and ... See full document

6

Micro and Nanoscale Mapping of Electrical Characterization of Graphene and Semiconductor Heterostructures

Micro and Nanoscale Mapping of Electrical Characterization of Graphene and Semiconductor Heterostructures

... ZnO Thin Films Photocatalytic Activity Synthesized By Sol- Gel Dip Coating Method 231 91 Maryam Abrishamkar A Nano Zeolite Modified Carbon Paste Electrode for Electrocatalytic Oxidation of Hydrogen ... See full document

6

Improvement of carrier diffusion length in silicon nanowire arrays using atomic layer deposition

Improvement of carrier diffusion length in silicon nanowire arrays using atomic layer deposition

... SiNW arrays, the diffusion length was estimated to be 5.76 μm, suggesting that passivation effect was not enough to collect minority carriers since there are defects still remaining. After annealing, the effective ... See full document

8

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