Refractive index of alumina layers deposited in Ar atmosphere with pressure of 5×10 -4 mbar. is comparable with those deposited under vacuum giving values of about 1.65 at

The profound effect of film thickness on the structural, optical and electrical properties of Al:ZnO thin films was observed.. The X-ray diffraction depicts c-axis, plane (002)

The refractive indices and absorption coefficients of the pulsed laser deposited ZnS thin films varies with thickness and for each thickness the transmission is

Stable rutile type tetragonal chromium dioxide (CrO 2 ) thin films have been deposited on lattice-matched layers of TiO 2 by KrF.. excimer laser based pulsed laser deposition

All measurements indicate that the films were mainly dominated by the 2212 phase and results showed that superconducting transitions are affected by the annealing

Polycrystalline zinc oxide (ZnO) thin films have been deposited at 450 ˚ C onto glass and silicon substrates by pulsed laser deposition technique (PLD)..

Samples grown under the optimized growth conditions (700°C, 30 Pa of O 2 , target with 50% excess K) as mentioned above, exhibit a high structural quality as attested by XRD

SnO 2 , HfO 2 , pulsed laser deposition, thin film, epitaxial growth, magnetic thin films,.. ferromagnetic materials,

The thin films of europium doped gallium and gadolinium oxides and indium gallium zinc oxide were deposited on c-axis oriented sapphire substrates by Pulsed Laser Deposition

The lattice parameters, phase and film orientation of 0.6BiFeO3 – 0.4PbTiO3 and 0.7BiFeO3 – 0.3PbTiO3 films on preferentially orientated platinum substrates as a function of

Metev, "Process Characteristics and Film Properties in Pulsed Laser Deposition," in Pulsed Laser Deposition of Thin Films , a. Geohegan, "Diagnostics and

reached a steady state, whereas the pure AlMgB 14 thin films had not quite reached a steady- state friction even at the 17,500 meter mark. Film deposition time was 10 minutes

considered to improve the adhesion strength: increasing the substrate temperature during the deposition process and depositing a titanium interlayer between the steel substrate and

During our thin film deposition experiments the target was always rotated and a laser fluence of 5 J/cm2 was used; therefore the results reported above show that the K

Bi-layer Cr/Ag thin films were deposited onto silicon and glass substrates using DC magnetron sputtering system. Laser treatment of thin metal films at different laser energy has

The ionic conductivity of as-deposited amorphous YSZ films is at least half an order of magnitude lower than for pulsed laser deposited polycrystalline films which ex- hibit

Scratch tests found that films were adherent to the substrate, with critical loadvalues similar to those recorded for other hard coatings deposited on

– Perovskite used in solid oxide fuel cells, catalysis Thin films synthesized by pulsed laser deposition. Havelia,