Frequency Regime
6.2 Future Work
6.2.4 Development of models for behaviour of polycrystalline thin films
During the course of this doctoral program, extensive experimental work was carried out. A significant portion of the results obtained were explained using theoretical models reported in published literature for piezoelectric single crystal ceramics or epitaxial piezoelectric thin films. This highlighted the need for convincing and detailed models to enable better understanding of preferentially oriented polycrystalline thin films.
101
R
EFERENCES
CHAPTER 1
1.1 S. Roundy, P. K. Wright, and J. M. Rabaey, Energy Scavenging for Wireless
Sensor Networks (Kluwer, Boston, 2003).
1.2 Z. L. Wang and J. Song, Science 312 242 (2006).
1.3 X. Wang, J. Song, J. Liu, and Z. L. Wang, Science 316 102 (2007).
1.4 Z. Wang, J. Hu, A. P. Suryavanshi, K. Yum, and M.-F. Yu, Nano Lett. 7 2966 (2007).
1.5 B. Jaffe, W. R. Cook, and H. Jaffe, Piezoelectric Ceramics (Academic, New York, 1971), p. 136.
1.6 C. Bedoya, Ch. Muller, J.-L. Baudour, V. Madigou, M. Anne, and M. Roubin,
Mater. Sci. Eng. B 75 43 (2000).
1.7 Y. Yu and R. N. Singh, J. Appl. Phys. 88 7249 (2000).
1.8 Y. Yu, J. Tu, and R. N. Singh, J. Am. Ceram. Soc. 84 333 (2001).
1.9 H. Zheng, I. M. Reaney, W. E. Lee, N. Jones, and H. Thomas, J. Am. Ceram.
Soc. 85 207 (2002).
CHAPTER 2
2.1 S. Sriram, M. Bhaskaran, and A. S. Holland, Semicond. Sci. Technol. 21 1236 (2006).
References
102
2.2 C. Miclea, C. Tanasoiu, C. F. Miclea, L. Amarande, A. Gheorghiu, I. Spanulescu, C. Plavitu, C. T. Miclea, M. C. Cioangher, L. Trupina, and A. Iuga, J. Eur. Ceram.
Soc. 27 4055 (2007).
2.3 A. Garg and D. C. Agrawal, Mater. Sci. Eng. B 56 46 (1999).
2.4 S. M. Rossnegal, I. Yang, and J. J. Cuomo, Thin Solid Films 199 59 (1991).
2.5 L. Castaldi, M. R. J. Gibbs, and H. A. Davies, J. Appl. Phys. 93 9165 (2003).
2.6 M. Bhaskaran, S. Sriram, K. T. Short, D. R. G. Mitchell, and A. S. Holland, Thin
Solid Films 516 8101 (2008).
2.7 S. Sriram, M. Bhaskaran, J. du Plessis, K. T. Short, V. P. Sivan, and A. S. Holland, Micron 40 104 (2009).
2.8 K. Wasa, M. Kitabatake, and H. Adachi, Thin Film Materials Technology:
Sputtering of Compound Materials (Springer-Verlag, Heidelberg, 2004).
2.9 Powder Diffraction Pattern Files, International Centre for Diffraction Data (ICDD, formerly the Joint Committee for Powder Diffraction Studies), Newtown Square, PA 19073, Card 04-0784.
2.10 B. Jaffe, W. R. Cook, and H. Jaffe, Piezoelectric Ceramics (Academic, New York, 1971), p. 136.
2.11 Powder Diffraction Pattern Files, International Centre for Diffraction Data (ICDD, formerly the Joint Committee for Powder Diffraction Studies), Newtown Square, PA 19073, Card 04-002-5985.
2.12 Powder Diffraction Pattern Files, International Centre for Diffraction Data (ICDD, formerly the Joint Committee for Powder Diffraction Studies), Newtown Square, PA 19073, Card 04-0802.
2.13 S. Sriram, M. Bhaskaran, D. R. G. Mitchell, K. T. Short, A. S. Holland, and A. Mitchell, Microscopy Microanal. 15 30 (2009).
2.14 D. X. Lu, E. Y. B. Pun, E. M. W. Wong, P. S. Chung, and Z. Y. Lee, IEEE T.
References
103
CHAPTER 3
3.1 XP Series Stylus Profiler User’s Manual, Ambios Technology, Inc. (2003), p. 79.
3.2 N. Sumida and K. Ikeda, Ultramicr. 39 313 (1991).
3.3 D. R. G. Mitchell, D. J. Attard, and G. Triani, Thin Solid Films 441 885 (2003).
3.4 S. Sriram, M. Bhaskaran, and A. S. Holland, In: J.-C. Chiao, A. S. Dzurak, C. Jagadish, and D. V. Thiel (Eds.), Micro- and Nanotechnology: Materials,
Processes, Packaging, and Systems III, Proceedings of the SPIE Volume 6415
(2006), pp. 64150J.
3.5 S. Sriram, M. Bhaskaran, A. S. Holland, K. T. Short, and B. A. Latella, J. Appl.
Phys. 101 104910 (2007).
3.6 R. Wenzel, F. Goesmann, and R. Schmid-Fetzer, J. Mater. Sci.: Mater. Electron. 9 109 (1998).
3.7 S. Kanamori and H. Sudo, IEEE Trans. Comp. Hybrids Manuf. Tech. CHMT-5 318 (1982).
3.8 M. Bhaskaran, S. Sriram, K. T. Short, D. R. G. Mitchell, and A. S. Holland, Thin
Solid Films 516 8101 (2008).
3.9 Powder Diffraction Pattern Files, International Centre for Diffraction Data (ICDD, formerly the Joint Committee for Powder Diffraction Studies), Newtown Square, PA 19073, Card 04-0784.
3.10 S. Sriram, M. Bhaskaran, and A. S. Holland, Semicond. Sci. Technol. 21 1236 (2006).
CHAPTER 4
4.1 W. G. Cady, Piezoelectricity (Dover Publications, New York, 1964), vol. 1.
4.2 K. Lefki and G. J. M. Dormans, J. Appl. Phys. 76 1764 (1994).
4.3 A. Gruverman and S. V. Kalinin, J. Mater. Sci. 41 107 (2006).
References
104
4.5 E. Karapetian, M. Kachanov, and S. V. Kalinin, Philos. Mag. 85 1017 (2005).
4.6 S. Sridhar, A. E. Giannakopoulos, and S. Suresh, J. Appl. Phys. 87 8451 (2000).
4.7 M. Algueróa, M. L. Calzada, A. J. Bushby, and M. J. Reece, Appl. Phys. Lett. 85 2023 (2004).
4.8 A. Rar, G. M. Pharr, W. C. Oliver, E. Karapetian, and S. V. Kalinin, J. Mater. Res. 21 552 (2006).
4.9 S. Sriram, M. Bhaskaran, A. S. Holland, K. T. Short, and B. A. Latella, J. Appl.
Phys. 101 104910 (2007).
4.10 S. V. Kalinin and D. A. Bonnell, In: S. Hong (Ed.), Nanoscale Phenomena in
Ferroelectric Thin Films (Kluwer Academic, Boston, 2004), pp. 183-217.
4.11 A. Amin, L. E. Cross, and H.-Y. Lee, J. Appl. Phys. 101 114103 (2007).
4.12 J. Ouyang, J. Slusker, I. Levin, D.-M. Kim, C.-B. Eom, R. Ramesh, and A. L. Roytburd, Adv. Funct. Mater. 17 2094 (2007).
4.13 V. Nagarajan and R. Ramesh, In: S. Hong (Ed.), Nanoscale Phenomena in
Ferroelectric Thin Films (Kluwer Academic, Boston, 2004), pp. 87-109.
4.14 S. Sriram, M. Bhaskaran, K. T. Short, G. I. Matthews, and A. S. Holland, Micron 40 109 (2009).
CHAPTER 5
5.1 C. Bedoya, Ch. Muller, J.-L. Baudour, V. Madigou, M. Anne, and M. Roubin,
Mater. Sci. Eng. B 75 43 (2000).
5.2 Y. Yu and R. N. Singh, J. Appl. Phys. 88 7249 (2000).
5.3 Y. Yu, J. Tu, and R. N. Singh, J. Am. Ceram. Soc. 84 333 (2001).
5.4 H. Zheng, I. M. Reaney, W. E. Lee, N. Jones, and H. Thomas, J. Am. Ceram.
Soc. 85 207 (2002).
5.5 S. Roundy, P. K. Wright, and J. M. Rabaey, Energy Scavenging for Wireless
References
105
5.6 Z. L. Wang and J. Song, Science 312 242 (2006).
5.7 X. Wang, J. Song, J. Liu, and Z. L. Wang, Science 316 102 (2007).
5.8 Z. Wang, J. Hu, A. P. Suryavanshi, K. Yum, and M.-F. Yu, Nano Lett. 7 2966 (2007).
5.9 S. Sriram, M. Bhaskaran, A. S. Holland, K. T. Short, and B. A. Latella, J. Appl.
Phys. 101 104910 (2007).
5.10 S. Sriram, M. Bhaskaran, K. T. Short, G. I. Matthews, and A. S. Holland, Micron 40 109 (2009).
5.11 V. Snitka, A. Ulcinas, K. Nemiciauskas, and V. Lendraitis, Microelectronic Eng. 83 1456 (2006).
5.12 S. Sriram, M. Bhaskaran, and A. S. Holland, In: J.-C. Chiao, A. S. Dzurak, C. Jagadish, and D. V. Thiel (Eds.), Micro- and Nanotechnology: Materials,
Processes, Packaging, and Systems III, Proceedings of the SPIE Volume 6415
(2006), pp. 64150J.
5.13 S. Sriram, M. Bhaskaran, and A. S. Holland, Semicond. Sci. Technol. 21 1236 (2006).
5.14 X. Ren, Nature Mater. 3 91 (2004).
5.15 J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science 299 1719 (2003).
5.16 J. Ouyang, J. Slusker, I. Levin, D.-M. Kim, C.-B. Eom, R. Ramesh, and A. L. Roytburd, Adv. Funct. Mater. 17 2094 (2007).
5.17 K. Lefki and G. J. M. Dormans, J. Appl. Phys. 76 1764 (1994).
5.18 V. Nagarajan, A. Roytburd, A. Stanishevsky, S. Prasertchoung, T. Zhao, L. Chen, J. Melngailis, O. Auciello, and R. Ramesh, Nature Mater. 2 43 (2003).
5.19 D. E. Grupp and A. M. Goldman, Science 276 392 (1997).
References
106
5.21 Z. Wu and R. E. Cohen, Phys. Rev. Lett. 95 037601 (2005).
5.22 Z. Zhao, H. L. W. Chan, and C. L. Choy, Ferroelectrics 195 35 (1997).
5.23 M. Bhaskaran, S. Sriram, K. T. Short, D. R. G. Mitchell, and A. S. Holland, Thin
Solid Films 516 8101 (2008).
5.24 L. E. Cross, Ferroelectrics 76, 241 (1987).
5.25 W. G. Cady, Piezoelectricity (Dover Publications, New York, 1964), vol. 1.
5.26 V. Koval, M. J. Reece, and A. J. Bushby, J. Appl. Phys. 97 074301 (2005).
5.27 K. Wasa, M. Kitabatake, and H. Adachi, Thin Film Materials Technology:
Sputtering of Compound Materials (Springer-Verlag, Heidelberg, 2004).
CHAPTER 6
6.1 V. Snitka, A. Ulcinas, K. Nemiciauskas, and V. Lendraitis, Microelectronic Eng. 83 1456 (2006).
6.2 S. Sriram, M. Bhaskaran, A. S. Holland, K. T. Short, and B. A. Latella, J. Appl.
Phys. 101 104910 (2007).
6.3 K. Wasa, M. Kitabatake, and H. Adachi, Thin Film Materials Technology:
Sputtering of Compound Materials (Springer-Verlag, Heidelberg, 2004).
APPENDIX B
B.1 J. Zhao, L. Lu, C. V. Thompson, Y. Lu, and W. D. Song, In: I. Miyamoto, Y. F. Lu, K. Sugioka, and J. J. Dubowski (Eds.), Second International Symposium on
Laser Precision Microfabrication, Proceedings of the SPIE Volume 4426 (2002),
pp. 221-224.
B.2 R. Ramesh, International Patent WO/1994/013471. Available online at http://www.wipo.int/pctdb/en/wo.jsp?IA=US1993010387
B.3 C. Bedoya, Ch. Muller, J.-L. Baudour, V. Madigou, M. Anne, and M. Roubin,
References
107
B.4 H. Zheng, I. M. Reaney, W. E. Lee, N. Jones, and H. Thomas, J. Am. Ceram.
Soc. 85 207 (2002).
B.5 S. Sriram, M. Bhaskaran, A. S. Holland, K. T. Short, and B. A. Latella, J. Appl.
Phys. 101 104910 (2007).
B.6 S. Sriram, M. Bhaskaran, and A. S. Holland, Semicond. Sci. Technol. 21 1236 (2006).
B.7 M. Bhaskaran, S. Sriram, K. T. Short, D. R. G. Mitchell, and A. S. Holland, Thin
Solid Films 516 8101 (2008).
APPENDIX C
C.1 B. Jaffe, W. R. Cook, and H. Jaffe, Piezoelectric Ceramics (Academic, New York, 1971), p. 136.
C.2 Y. Xu, Ferroelectric Materials and Their Applications (North-Holland, Amsterdam, 1991).
C.3 S. Sriram, M. Bhaskaran, A. S. Holland, K. T. Short, and B. A. Latella, J. Appl.
Phys. 101 104910 (2007).
C.4 H. Zheng, I. M. Reaney, W. E. Lee, N. Jones, and H. Thomas, J. Am. Ceram.
Soc. 85 207 (2002).
C.5 C. Bedoya, Ch. Muller, J.-L. Baudour, V. Madigou, M. Anne, and M. Roubin,
Mater. Sci. Eng. B 75 43 (2000).
C.6 H. Zheng, I. M. Reaney, W. E. Lee, N. Jones, and H. Thomas, J. Am. Ceram.
Soc. 85 2337 (2002).
C.7 Powder Diffraction Pattern Files, International Centre for Diffraction Data (ICDD, formerly the Joint Committee for Powder Diffraction Studies), Newtown Square, PA 19073, Card 04-0802.
References
108
C.8 Powder Diffraction Pattern Files, International Centre for Diffraction Data (ICDD, formerly the Joint Committee for Powder Diffraction Studies), Newtown Square, PA 19073, Card 04-006-6495.
C.9 A. G. Souza Filho, K. S. V. Lima, A. P. Ayala, I. Guedes, P. T. C. Freire, F. E. A. Melo, J. Mendes Filho, E. B. Araújo, and J. A. Eiras, Phys. Rev. B 66 132107 (2002).
C.10 G. Burns and B. A. Scott, Phys. Rev. Lett. 25 1191 (1970).
C.11 W. J. Brya, Phys. Rev. Lett. 26 1114 (1971).
C.12 F. M. Pontes, S. H. Leal, P. S. Pizani, M. R. M. C. Santos, E. R. Leite, E. Longo, F. Lanciotti, T. M. Boschi, and J. A. Varela, J. Mater. Res. 18 659 (2003).
C.13 C. E. F. Costa, F. M. Pontes, A. G. Souza, E. R. Leite, P. S. Pizani, and E. Longo, Appl. Phys. A: Mater. Sci. Proc. 79 593 (2004).
109
A
PPENDIX
A
EXPERIMENTAL DETAILS FOR
MATERIALS CHARACTERISATION
This appendix provides a succinct overview of all instruments used, with the corresponding experimental conditions. Care has been taken to ensure sufficient detail is presented in order to enable repetition of experiments.
A.1 Microscopy
Microscopy tools have been used extensively throughout this research program in order to characterise deposited PSZT thin films and in the development of a technique for the measurement of thin film d33.