• No results found

CHAPTER 8 SUMMARY AND FUTURE WORKS 108 

8.2 Future works 111 

Future efforts on T2SLs should focus on identifying and reducing the mid-gap SRH recombination centers that is the major technological barrier in the applications of T2SL photodetectors. The point defect analysis methods demonstrated here based on Z-contrast imaging and strain mapping can be applied to the full-device structures of T2SLs. Combination of defect analysis with electrical characterization will be the first step to achieve the goal of identifying the mid-gap SRH recombination centers. To reduce the point defects, a comparative study between various T2SLs with systematic designs in growth parameters are required.

112

The growth of T2SLs using MOCVD is also an important research direction because it is the favorable growth method in manufacturing thanks to low cost and high yield production. A comprehensive structure and composition analysis applied the MOCVD-grown samples can lead to significant gains in understanding the evolution of thin film growth in MOCVD compared to the MBE-grown T2SLs (with same design).

We have learned that the interface engineering using forced thin InSb layer played a vital role in improving and controlling the device performance of the InAs/GaSb T2SLs. This promising approach needs to be further investigated, especially whether such treatment can be also utilized for the Ga-free T2SLs to further enhance the minority carrier lifetime and the subsequent investigation of structures with the methods in this thesis can be followed.

For the future microscopy works, further improvement of measurement precision on strain is possible with the help of the post-data processing techniques such as averaging a series of images [141, 142] and refinement of atomic positions using a statistical method [143]. This will provide improved sensitivity on detecting atomic displacements and help to sort out the origins of specific arrangement of atomic structure. Lastly, thanks to an aberration corrected STEM, the depth-of-focus is reduced significantly, thereby increasing the vertical resolution limit along the sample thickness direction to nanometer scale. Hence, the through-focal series imaging allows for the detection of atomic column displacements in three dimensions (3D), which enables the 3D information of strain distribution.

113

REFERENCES

[1] C. Downs, T.E. Vandervelde. Progress in infrared photodetectors since 2000, Sensors 13 (2013) 5054-5098.

[2] M.P. Hansen, D.S. Malchow. Overview of SWIR detectors, cameras, and applications. SPIE Defense and Security Symposium: International Society for Optics and Photonics, 2008. p.69390I-69390I-69311. [3] E.A. Plis. InAs/GaSb type-II superlattice detectors, Advances in Electronics 2014 (2014).

[4] P. Norton. HgCdTe infrared detectors, Optoelectronics review (2002) 159-174. [5] "Atmospheric transmission chart." [Online].

Available: http://www.globalwarmingart.com/images/7/7c/Atmosphericn Transmission.png.

[6] A. Rogalski. HgCdTe infrared detector material: history, status and outlook, Reports on Progress in Physics 68 (2005) 2267.

[7] M.B. Reine. HgCdTe photodiodes for IR detection: a review. Symposium on Integrated Optics: International Society for Optics and Photonics, 2001. p.266-277.

[8] J. Bajaj, G. Sullivan, D. Lee, E. Aifer, M. Razeghi. Comparison of type-II superlattice and HgCdTe infrared detector technologies. Defense and Security Symposium: International Society for Optics and Photonics, 2007. p.65420B-65420B-65428.

[9] G. Sai‐Halasz, R. Tsu, L. Esaki. A new semiconductor superlattice, Applied Physics Letters 30 (1977) 651-653.

[10] D.L. Smith, C. Mailhiot. Proposal for Strained Type-Ii Superlattice Infrared Detectors, Journal of Applied Physics 62 (1987) 2545-2548.

[11] C. Grein, P. Young, H. Ehrenreich. Minority carrier lifetimes in ideal InGaSb/InAs superlattices, Applied Physics Letters 61 (1992) 2905-2907.

[12] E.R. Youngdale, J.R. Meyer, C.A. Hoffman, F.J. Bartoli, C.H. Grein, P.M. Young, H. Ehrenreich, R.H. Miles, D.H. Chow. Auger lifetime enhancement in InAs–Ga1−xInxSb superlattices, Applied Physics Letters 64 (1994) 3160-3162.

114

[13] D.R. Rhiger. Performance comparison of long-wavelength infrared type II superlattice devices with HgCdTe, Journal of Electronic Materials 40 (2011) 1815-1822.

[14] W. Tennant. “Rule 07” revisited: still a good heuristic predictor of p/n HgCdTe photodiode performance?, Journal of Electronic Materials 39 (2010) 1030-1035.

[15] M. Razeghi, B.-M. Nguyen. Band gap tunability of Type II Antimonide-based superlattices, Physics Procedia 3 (2010) 1207-1212.

[16] A. Rogalski, P. Martyniuk. InAs/GaInSb superlattices as a promising material system for third generation infrared detectors, Infrared Physics & Technology 48 (2006) 39-52.

[17] G.J. Brown. Type-II InAs/GaInSb superlattices for infrared detection: an overview, Proc. SPIE 5783 (2005) 65-77.

[18] J.W. Mayer, S. Lau. Electronic materials science: for integrated circuits in Si and GaAs, Prentice Hall, 1990.

[19] L.B. Freund, S. Suresh. Thin film materials: stress, defect formation and surface evolution, Cambridge University Press, 2004.

[20] G. Osbourn. Strained-layer superlattices-A brief review, IEEE journal of quantum electronics 22 (1986) 1677-1681.

[21] G. Osbourn. Strained-layer superlattices from lattice mismatched materials, Journal of Applied Physics 53 (1982) 1586-1589.

[22] H. Toyoshima, K. Onda, E. Mizuki, N. Samoto, M. Kuzuhara, T. Itoh, A. Okamoto, T. Anan, T. Ichihashi. Molecular beam epitaxial growth of InAs/GaAs superlattices on GaAs substrates and its application to a superlattice channel modulation doped field effect transistor, Journal of Applied Physics 69 (1991) 3941-3949.

[23] R. Behtash, H. Tobler, M. Neuburger, A. Schurr, H. Leier, Y. Cordier, F. Semond, F. Natali, J. Massies. AlGaN/GaN HEMTs on Si (111) with 6.6 W/mm output power density, Electronics Letters 39 (2003) 626-627.

115

[24] J. Faist, F. Capasso, D.L. Sivco, C. Sirtori, A.L. Hutchinson, A.Y. Cho. Quantum cascade laser, Science 264 (1994) 553-556.

[25] R. Magri, A. Zunger. Effects of interfacial atomic segregation and intermixing on the electronic properties of InAs/GaSb superlattices, Physical Review B 65 (2002) 165302.

[26] D. Donetsky, G. Belenky, S. Svensson, S. Suchalkin. Minority carrier lifetime in type-2 InAs–GaSb strained-layer superlattices and bulk HgCdTe materials, Applied Physics Letters 97 (2010) 052108. [27] D. Donetsky, S.P. Svensson, L.E. Vorobjev, G. Belenky. Carrier lifetime measurements in short- period InAs/GaSb strained-layer superlattice structures, Applied physics letters 95 (2009) 212104.

[28] B.C. Connelly, G.D. Metcalfe, H. Shen, M. Wraback. Direct minority carrier lifetime measurements and recombination mechanisms in long-wave infrared type II superlattices using time-resolved photoluminescence, Applied physics letters 97 (2010) 251117.

[29] S.P. Svensson, D. Donetsky, D. Wang, H. Hier, F.J. Crowne, G. Belenky. Growth of type II strained layer superlattice, bulk InAs and GaSb materials for minority lifetime characterization, Journal of Crystal Growth 334 (2011) 103-107.

[30] E.H. Steenbergen, B.C. Connelly, G.D. Metcalfe, H. Shen, M. Wraback, D. Lubyshev, Y. Qiu, J.M. Fastenau, A.W.K. Liu, S. Elhamri, O.O. Cellek, Y.-H. Zhang. Significantly improved minority carrier lifetime observed in a long-wavelength infrared III-V type-II superlattice comprised of InAs/InAsSb, Applied Physics Letters 99 (2011) 251110.

[31] Y. Wei, A. Hood, H. Yau, V. Yazdanpanah, M. Razeghi, M.Z. Tidrow, V. Nathan. High-performance type-II InAs/GaSb superlattice photodiodes with cutoff wavelength around 7 μm, Applied Physics Letters 86 (2005) 091109.

[32] Y. Huang, J.H. Ryou, R.D. Dupuis, V.R. D'Costa, E.H. Steenbergen, J. Fan, Y.H. Zhang, A. Petschke, M. Mandl, S.L. Chuang. Epitaxial growth and characterization of InAs/GaSb and InAs/InAsSb type-II superlattices on GaSb substrates by metalorganic chemical vapor deposition for long wavelength infrared photodetectors, Journal of Crystal Growth 314 (2011) 92-96.

[33] J.V. Li, C.J. Hill, J. Mumolo, S. Gunapala, S. Mou, S.-L. Chuang. Midinfrared type-II InAs⁄GaSb superlattice photodiodes toward room temperature operation, Applied Physics Letters 93 (2008) 163505.

116

[34] Y. Zhou, J. Chen, Q. Xu, L. He. Studies on InAs/GaSb superlattice structural properties by high resolution x-ray diffraction, Journal of Vacuum Science & Technology B 30 (2012) 051203.

[35] Y. Meng, H. Kim, J.-L. Rouviére, D. Isheim, D.N. Seidman, J.-M. Zuo. Digital model for X-ray diffraction with application to composition and strain determination in strained InAs/GaSb superlattices, Journal of applied physics 116 (2014) 013513.

[36] M. Wang, D. Collins, T. McGill, R. Grant, R. Feenstra. Study of interface asymmetry in InAs–GaSb heterojunctions, Journal of Vacuum Science & Technology B 13 (1995) 1689-1693.

[37] B.Z. Nosho, B.R. Bennett, L.J. Whitman, M. Goldenberg. Effects of As2 versus As4 on InAs/GaSb heterostructures: As-for-Sb exchange and film stability, Journal of Vacuum Science & Technology B 19 (2001) 1626-1630.

[38] H. Kim, Y. Meng, J.-L. Rouviére, D. Isheim, D.N. Seidman, J.-M. Zuo. Atomic resolution mapping of interfacial intermixing and segregation in InAs/GaSb superlattices: A correlative study, Journal of Applied Physics 113 (2013) 103511.

[39] M. Müller, B. Gault, M. Field, G.J. Sullivan, G.D.W. Smith, C.R.M. Grovenor. Interfacial chemistry in an InAs/GaSb superlattice studied by pulsed laser atom probe tomography, Applied Physics Letters 100 (2012) 083109.

[40] Y. Sun, S.E. Thompson, T. Nishida. Physics of strain effects in semiconductors and metal-oxide- semiconductor field-effect transistors, Journal of Applied Physics 101 (2007) 104503.

[41] S. Bedell, A. Khakifirooz, D. Sadana. Strain scaling for CMOS, Mrs Bulletin 39 (2014) 131-137. [42] J.C. Spence. High-resolution electron microscopy, Oxford University Press, 2013.

[43] A. Crewe, J. Wall. A scanning microscope with 5 Å resolution, Journal of molecular biology 48 (1970) 375-393.

[44] S. Pennycook, A. Lupini, M. Varela, A. Borisevich, Y. Peng, M. Oxley, K. Van Benthem, M. Chisholm. Scanning transmission electron microscopy for nanostructure characterization. Scanning Microscopy for Nanotechnology. Springer, 2007. pp. 152-191.

117

[45] L. Reimer, H. Kohl. Transmission electron microscopy: physics of image formation, Springer Science & Business Media, 2008.

[46] S.J. Pennycook, P.D. Nellist. Scanning transmission electron microscopy: imaging and analysis, Springer Science & Business Media, 2011.

[47] P. Nellist, S. Pennycook. The Principles and Interpretations of Annular Dark-Field Z-Contrast Imaging, Advances in Imaging and Electron Physics 113 (2000) 148-204.

[48] D.B. Williams, C.B. Carter. The transmission electron microscope, Springer, 1996.

[49] B. Fultz, J.M. Howe. Transmission electron microscopy and diffractometry of materials, Springer Science & Business Media, 2012.

[50] N. Browning, J. Buban, M. Chi, B. Gipson, M. Herrera, D. Masiel, S. Mehraeen, D. Morgan, N. Okamoto, Q. Ramasse. The application of scanning transmission electron microscopy (STEM) to the study of nanoscale systems. Modeling Nanoscale Imaging in Electron Microscopy. Springer, 2012. pp. 11-40. [51] S. Pennycook, D. Jesson. High-resolution Z-contrast imaging of crystals, Ultramicroscopy 37 (1991) 14-38.

[52] Z. Wang, J. Cowley. Simulating high-angle annular dark-field STEM images including inelastic thermal diffuse scattering, Ultramicroscopy 31 (1989) 437-453.

[53] Z.L. Wang. New developments in transmission electron microscopy for nanotechnology, Advanced Materials 15 (2003) 1497-1514.

[54] O. Scherzer. Spharische und chromatische korrektur von elektronen-linsen, Optik 2 (1947) 114-132. [55] O. Scherzer. über einige Fehler von Elektronenlinsen, Zeitschrift für Physik 101 (1936) 593-603. [56] A. Bleloch, Q. Ramasse. Lens Aberrations: Diagnosis and Correction. Aberration-Corrected Analytical Transmission Electron Microscopy. John Wiley & Sons, Ltd, 2011. pp. 55-87.

[57] A. Bleloch, A. Lupini. Imaging at the picoscale, Materials Today 7 (2004) 42-48.

[58] M. Haider, H. Rose, S. Uhlemann, E. Schwan, B. Kabius, K. Urban. A spherical-aberration-corrected 200kV transmission electron microscope, Ultramicroscopy 75 (1998) 53-60.

118

[59] H. Rose. Outline of a spherically corrected semiaplanatic medium-voltage transmission electron- microscope, Optik 85 (1990) 19-24.

[60] P.W. Hawkes. Advances in imaging and electron physics, Academic Press, 2003.

[61] P.E. Batson, N. Dellby, O.L. Krivanek. Sub-angstrom resolution using aberration corrected electron optics, Nature 418 (2002) 617-620.

[62] P.D. Nellist, M.F. Chisholm, N. Dellby, O. Krivanek, M. Murfitt, Z. Szilagyi, A.R. Lupini, A. Borisevich, W. Sides, S.J. Pennycook. Direct sub-angstrom imaging of a crystal lattice, Science 305 (2004) 1741-1741.

[63] R. Erni, M.D. Rossell, C. Kisielowski, U. Dahmen. Atomic-resolution imaging with a sub-50-pm electron probe, Physical Review Letters 102 (2009) 096101.

[64] D. Muller, L.F. Kourkoutis, M. Murfitt, J. Song, H. Hwang, J. Silcox, N. Dellby, O. Krivanek. Atomic-scale chemical imaging of composition and bonding by aberration-corrected microscopy, Science 319 (2008) 1073-1076.

[65] A. d’Alfonso, B. Freitag, D. Klenov, L. Allen. Atomic-resolution chemical mapping using energy- dispersive x-ray spectroscopy, Physical Review B 81 (2010) 100101.

[66] M.-W. Chu, S. Liou, C.-P. Chang, F.-S. Choa, C. Chen. Emergent chemical mapping at atomic- column resolution by energy-dispersive X-ray spectroscopy in an aberration-corrected electron microscope, Physical Review Letters 104 (2010) 196101.

[67] R. Egerton. Electron energy-loss spectroscopy in the electron microscope, Springer Science & Business Media, 2011.

[68] R. Egerton. Electron energy-loss spectroscopy in the TEM, Reports on Progress in Physics 72 (2009) 016502.

[69] D.H. Chow, R.H. Miles, J.N. Schulman, D.A. Collins, T.C. Mcgill. Type-Ii Superlattices for Infrared Detectors and Devices, Semiconductor Science and Technology 6 (1991) C47-C51.

[70] M.Z. Tidrow. Type II strained layer superlattice: A potential future IR solution, Infrared Physics & Technology 52 (2009) 322-325.

119

[71] M. Walther, J. Schmitz, R. Rehm, S. Kopta, F. Fuchs, J. Fleißner, W. Cabanski, J. Ziegler. Growth of InAs/GaSb short-period superlattices for high-resolution mid-wavelength infrared focal plane array detectors, Journal of Crystal Growth 278 (2005) 156-161.

[72] J.B. Rodriguez, P. Christol, L. Cerutti, F. Chevrier, A. Joullie. MBE growth and characterization of type-II InAs/GaSb superlattices for mid-infrared detection, Journal of Crystal Growth 274 (2005) 6-13. [73] J. Steinshnider, J. Harper, M. Weimer, C.H. Lin, S.S. Pei, D.H. Chow. Origin of Antimony Segregation in GaInSb/InAs Strained-Layer Superlattices, Physical Review Letters 85 (2000) 4562-4565. [74] E. Luna, B. Satpati, J.B. Rodriguez, A.N. Baranov, E. Tournié, A. Trampert. Interfacial intermixing in InAs/GaSb short-period-superlattices grown by molecular beam epitaxy, Applied Physics Letters 96 (2010) 021904.

[75] K. Mahalingam, K. Eyink, G. Brown, D. Dorsey, C. Kisielowski, A. Thust. Compositional analysis of mixed–cation‐anion III–V semiconductor interfaces using phase retrieval high‐resolution transmission electron microscopy, Journal of microscopy 230 (2008) 372-381.

[76] Y. Ashuach, Y. Kauffmann, D. Isheim, Y. Amouyal, D.N. Seidman, E. Zolotoyabko. Atomic intermixing in short-period InAs/GaSb superlattices, Applied Physics Letters 100 (2012).

[77] J. Steinshnider, M. Weimer, R. Kaspi, G. Turner. Visualizing interfacial structure at non-common- atom heterojunctions with cross-sectional scanning tunneling microscopy, Physical Review Letters 85 (2000) 2953.

[78] T.F. Kelly, D.J. Larson, K. Thompson, R.L. Alvis, J.H. Bunton, J.D. Olson, B.P. Gorman. Atom probe tomography of electronic materials, Annu. Rev. Mater. Res. 37 (2007) 681-727.

[79] S.G. Kim, S.C. Erwin, B.Z. Nosho, L.J. Whitman. Electronic versus geometric contrast in cross- sectional STM images of III-V semiconductor heterostructures, Physical Review B 67 (2003).

[80] A. Ourmazd, D.W. Taylor, J. Cunningham. Chemical mapping of semiconductor interfaces at near- atomic resolution, Physical Review Letters 62 (1989) 933-936.

[81] D.N. Seidman. Three-dimensional atom-probe tomography: advances and applications, Annu. Rev. Mater. Res. 37 (2007) 127-158.

120

[82] O. Moutanabbir, D. Isheim, D.N. Seidman, Y. Kawamura, K.M. Itoh. Ultraviolet-laser atom-probe tomographic three-dimensional atom-by-atom mapping of isotopically modulated Si nanoscopic layers, Applied Physics Letters 98 (2011).

[83] S.J. Pennycook, D.E. Jesson. Atomic resolution Z-contrast imaging of interfaces, Acta Metallurgica Et Materialia 40 (1992) S149-S159.

[84] S. Hillyard, R.F. Loane, J. Silcox. Annular dark-field imaging: Resolution and thickness effects, Ultramicroscopy 49 (1993) 14-25.

[85] S.J. Pennycook. Z-contrast stem for materials science, Ultramicroscopy 30 (1989) 58-69.

[86] J.-M. Zuo, A.B. Shah, H. Kim, Y. Meng, W. Gao, J.-L. Rouviére. Lattice and strain analysis of atomic resolution Z-contrast images based on template matching, Ultramicroscopy 136 (2014) 50-60.

[87] M. Müller, B. Gault, G. Smith, C. Grovenor. Accuracy of pulsed laser atom probe tomography for compound semiconductor analysis, Journal of physics: Conference Series 326 (2011) 012031.

[88] M. Müller, D. Saxey, G. Smith, B. Gault. Some aspects of the field evaporation behaviour of GaSb, Ultramicroscopy 111 (2011) 487-492.

[89] K. Thompson, D. Lawrence, D.J. Larson, J.D. Olson, T.F. Kelly, B. Gorman. In situ site-specific specimen preparation for atom probe tomography, Ultramicroscopy 107 (2007) 131-139.

[90] X. Sauvage, L. Renaud, B. Deconihout, D. Blavette, D. Ping, K. Hono. Solid state amorphization in cold drawn Cu/Nb wires, Acta materialia 49 (2001) 389-394.

[91] R. Magri, A. Zunger. Effects of interfacial atomic segregation and intermixing on the electronic properties of InAs/GaSb superlattices, Physical Review B 65 (2002).

[92] K. Muraki, S. Fukatsu, Y. Shiraki, R. Ito. Surface segregation of In atoms during molecular beam epitaxy and its influence on the energy levels in InGaAs/GaAs quantum wells, Applied Physics Letters 61 (1992) 557-559.

[93] N.F. Gardner, G.O. Müller, Y.C. Shen, G. Chen, S. Watanabe, W. Götz, M.R. Krames. Blue-emitting InGaN–GaN double-heterostructure light-emitting diodes reaching maximum quantum efficiency above 200A⁄cm2, Applied Physics Letters 91 (2007) 243506.

121

[94] J. Welser, J. Hoyt, J. Gibbons. Electron mobility enhancement in strained-Si n-type metal-oxide- semiconductor field-effect transistors, Electron Device Letters, IEEE 15 (1994) 100-102.

[95] G. Abstreiter, H. Brugger, T. Wolf, H. Jorke, H. Herzog. Strain-Induced Two-Dimensional Electron Gas in Selectively Doped Si/Si_ {x} Ge_ {1-x} Superlattices, Physical Review Letters 54 (1985) 2441. [96] M. Semtsiv, M. Wienold, S. Dressler, W. Masselink. Short-wavelength (λ≈ 3.05 μm) InP-based strain-compensated quantum-cascade laser, Applied Physics Letters 90 (2007) 051111-051111-051113. [97] D.G. Schlom, L.-Q. Chen, C.-B. Eom, K.M. Rabe, S.K. Streiffer, J.-M. Triscone. Strain tuning of ferroelectric thin films*, Annu. Rev. Mater. Res. 37 (2007) 589-626.

[98] D.G. Schlom, L.-Q. Chen, C.J. Fennie, V. Gopalan, D.A. Muller, X. Pan, R. Ramesh, R. Uecker. Elastic strain engineering of ferroic oxides, Mrs Bulletin 39 (2014) 118-130.

[99] M. Kim, J. Zuo, G.-S. Park. High-resolution strain measurement in shallow trench isolation structures using dynamic electron diffraction, Applied physics letters 84 (2004) 2181-2183.

[100] L. Clément, R. Pantel, L.F.T. Kwakman, J.L. Rouvière. Strain measurements by convergent-beam electron diffraction: The importance of stress relaxation in lamella preparations, Applied physics letters 85 (2004) 651-653.

[101] K. Usuda, T. Numata, T. Irisawa, N. Hirashita, S. Takagi. Strain characterization in SOI and strained- Si on SGOI MOSFET channel using nano-beam electron diffraction (NBD), Materials Science and Engineering: B 124 (2005) 143-147.

[102] A. Béché, J.-L. Rouvière, L. Clément, J.-M. Hartmann. Improved precision in strain measurement using nanobeam electron diffraction, Applied physics letters 95 (2009) 123114.

[103] D. Cooper, T. Denneulin, J.-P. Barnes, J.-M. Hartmann, L. Hutin, C. Le Royer, A. Béché, J.-L. Rouvière. Strain mapping with nm-scale resolution for the silicon-on-insulator generation of semiconductor devices by advanced electron microscopy, Journal of Applied Physics 112 (2012) 124505.

[104] M. Hÿtch, E. Snoeck, R. Kilaas. Quantitative measurement of displacement and strain fields from HREM micrographs, Ultramicroscopy 74 (1998) 131-146.

122

[105] P.L. Galindo, S. Kret, A.M. Sanchez, J.Y. Laval, A. Yanez, J. Pizarro, E. Guerrero, T. Ben, S.I. Molina. The Peak Pairs algorithm for strain mapping from HRTEM images, Ultramicroscopy 107 (2007) 1186-1193.

[106] S.H. Vajargah, M. Couillard, K. Cui, S.G. Tavakoli, B. Robinson, R.N. Kleiman, J.S. Preston, G.A. Botton. Strain relief and AlSb buffer layer morphology in GaSb heteroepitaxial films grown on Si as revealed by high-angle annular dark-field scanning transmission electron microscopy, Applied Physics Letters 98 (2011) 082113.

[107] K. Mahalingam, H.J. Haugan, G.J. Brown, K.G. Eyink. Quantitative analysis of interfacial strain in InAs/GaSb superlattices by aberration-corrected HRTEM and HAADF-STEM, Ultramicroscopy 127 (2013) 70-75.

[108] K. Watanabe, N. Nakanishi, T. Yamazaki, J.R. Yang, S.Y. Huang, K. Inoke, J.T. Hsu, R.C. Tu, M. Shiojiri. Atomic-scale strain field and In atom distribution in multiple quantum wells InGaN/GaN, Applied Physics Letters 82 (2003) 715-717.

[109] J.J.P. Peters, R. Beanland, M. Alexe, J.W. Cockburn, D.G. Revin, S.Y. Zhang, A.M. Sanchez. Artefacts in geometric phase analysis of compound materials, Ultramicroscopy.

[110] P. Voyles, D. Muller, J. Grazul, P. Citrin, H.-J. Gossmann. Atomic-scale imaging of individual dopant atoms and clusters in highly n-type bulk Si, Nature 416 (2002) 826-829.

[111] S.H. Oh, K.v. Benthem, S.I. Molina, A.Y. Borisevich, W. Luo, P. Werner, N.D. Zakharov, D. Kumar, S.T. Pantelides, S.J. Pennycook. Point defect configurations of supersaturated Au atoms inside Si nanowires, Nano letters 8 (2008) 1016-1019.

[112] A. Hashimoto, K. Suenaga, A. Gloter, K. Urita, S. Iijima. Direct evidence for atomic defects in graphene layers, Nature 430 (2004) 870-873.

[113] S.-Y. Chung, S.-Y. Choi, T. Yamamoto, Y. Ikuhara. Atomic-scale visualization of antisite defects in LiFePO 4, Physical Review Letters 100 (2008) 125502.

[114] H. Haugan, F. Szmulowicz, G. Brown, K. Mahalingam. Band gap tuning of InAs⁄ GaSb type-II superlattices for mid-infrared detection, Journal of applied physics 96 (2004) 2580.

123

[115] H. Mohseni, M. Razeghi, G. Brown, Y. Park. High-performance InAs/GaSb superlattice photodiodes for the very long wavelength infrared range, Applied physics letters 78 (2001) 2107-2109.

[116] P.B. Hirsch, A. Howie, R. Nicholson, D. Pashley, M.J. Whelan. Electron microscopy of thin crystals, 1965, 549 P. Butterworth INC., 7300 Pearl St., Washington, D. C. 20014 (1966).

[117] H.L. Xin, D.A. Muller. Aberration-corrected ADF-STEM depth sectioning and prospects for reliable 3D imaging in S/TEM, Journal of electron microscopy 58 (2009) 157-165.

[118] A.Y. Borisevich, A.R. Lupini, S.J. Pennycook. Depth sectioning with the aberration-corrected scanning transmission electron microscope, Proceedings of the National Academy of Sciences of the United States of America 103 (2006) 3044-3048.

[119] L. Muratov, S. Little, Y. Yang, B.R. Cooper, T.H. Myers, J.M. Wills. Predicted lattice relaxation around point defects in zinc selenide, Physical Review B 64 (2001) 035206.

[120] P. Blaha, K. Schwarz, G. Madsen, D. Kvasnicka, J. Luitz. WIEN2k: An Augmented Plane Wave plus Local Orbitals Program for Calculating Crystal Properties, edited by K, Schwarz (Vienna University of Technology, Austria, 2001) (2001).

[121] P.E. Blöchl. Projector augmented-wave method, Physical Review B 50 (1994) 17953-17979. [122] J. Shen, S.Y. Ren, J.D. Dow. Deep levels in type-II InAs/GaSb superlattices, Physical Review B 46 (1992) 6938.

[123] Y. Wei, J. Bae, A. Gin, A. Hood, M. Razeghi, G.J. Brown, M. Tidrow. High quality type II InAs/GaSb superlattices with cutoff wavelength ∼3.7 μm using interface engineering, Journal of Applied Physics 94 (2003) 4720-4722.

[124] D. Zuo, P. Qiao, D. Wasserman, S.L. Chuang. Direct observation of minority carrier lifetime improvement in InAs/GaSb type-II superlattice photodiodes via interfacial layer control, Applied Physics Letters 102 (2013) 141107.

[125] P.-F. Qiao, S. Mou, S.L. Chuang. Electronic band structures and optical properties of type-II superlattice photodetectors with interfacial effect, Optics express 20 (2012) 2319-2334.

124

[126] Z. Xu, J. Chen, F. Wang, Y. Zhou, C. Jin, L. He. Interface layer control and optimization of InAs/GaSb type-II superlattices grown by molecular beam epitaxy, Journal of Crystal Growth 386 (2014) 220-225.

[127] M. Razeghi, S.A. Pour, E. Huang, G. Chen, A. Haddadi, B.-M. Nguyen. High-operating temperature MWIR photon detectors based on Type II InAs/GaSb superlattice. SPIE Defense, Security, and Sensing: International Society for Optics and Photonics, 2011. p.80122Q-80122Q-80111.

[128] R. Feenstra, D. Collins, D.-Y. Ting, M. Wang, T. McGill. Interface roughness and asymmetry in InAs/GaSb superlattices studied by scanning tunneling microscopy, Physical Review Letters 72 (1994) 2749.

[129] M.W. Wang, D.A. Collins, T.C. McGill, R.W. Grant, R.M. Feenstra. Study of interface asymmetry in InAs–GaSb heterojunctions, Journal of Vacuum Science & Technology B 13 (1995) 1689-1693. [130] R. Feenstra, D. Collins, D.Y. Ting, M. Wang, T. McGill. Scanning tunneling microscopy of InAs/GaSb superlattices: Subbands, interface roughness, and interface asymmetry, Journal of Vacuum Science & Technology B 12 (1994) 2592-2597.

[131] K. Mahalingam, E.H. Steenbergen, G.J. Brown, Y.-H. Zhang. Quantitative analysis of strain distribution in InAs/InAs1−xSbx superlattices, Applied physics letters 103 (2013) 061908.

[132] J. Nicolai, C. Gatel, B. Warot-Fonrose, R. Teissier, A. Baranov, C. Magen, A. Ponchet. Elastic strains at interfaces in InAs/AlSb multilayer structures for quantum cascade lasers, Applied Physics Letters 104 (2014) 031907.

[133] D. Cooper, C. Le Royer, A. Béché, J.-L. Rouvière. Strain mapping for the silicon-on-insulator generation of semiconductor devices by high-angle annular dark field scanning electron transmission microscopy, Applied physics letters 100 (2012) 233121.

[134] C. Grein, J. Garland, M. Flatte. Strained and unstrained layer superlattices for infrared detection, Journal of electronic materials 38 (2009) 1800-1804.

[135] H.S. Kim, O.O. Cellek, Z.-Y. Lin, Z.-Y. He, X.-H. Zhao, S. Liu, H. Li, Y.-H. Zhang. Long-wave infrared nBn photodetectors based on InAs/InAsSb type-II superlattices, Applied Physics Letters 101 (2012) 161114.

125

[136] R. Beanland. Dark field transmission electron microscope images of III–V quantum dot structures, Ultramicroscopy 102 (2005) 115-125.

[137] R. Pérez, P. Gumbsch. An ab initio study of the cleavage anisotropy in silicon, Acta Materialia 48 (2000) 4517-4530.

[138] I. Vurgaftman, J. Meyer, L. Ram-Mohan. Band parameters for III–V compound semiconductors and their alloys, Journal of applied physics 89 (2001) 5815-5875.

[139] D. Lackner, O.J. Pitts, M. Steger, A. Yang, M.L.W. Thewalt, S.P. Watkins. Strain balanced InAs/InAsSb superlattice structures with optical emission to 10μm, Applied Physics Letters 95 (2009) 081906.

[140] G. Bertoni, J. Verbeeck. Accuracy and precision in model based EELS quantification, Ultramicroscopy 108 (2008) 782-790.

[141] K. Kimoto, T. Asaka, X. Yu, T. Nagai, Y. Matsui, K. Ishizuka. Local crystal structure analysis with several picometer precision using scanning transmission electron microscopy, Ultramicroscopy 110 (2010) 778-782.

[142] A.B. Yankovich, B. Berkels, W. Dahmen, P. Binev, S.I. Sanchez, S.A. Bradley, A. Li, I. Szlufarska, P.M. Voyles. Picometre-precision analysis of scanning transmission electron microscopy images of platinum nanocatalysts, Nat Commun 5 (2014).

[143] S. Bals, S. Van Aert, G. Van Tendeloo, D. Ávila-Brande. Statistical estimation of atomic positions from exit wave reconstruction with a precision in the picometer range, Physical Review Letters 96 (2006) 096106.

Related documents