The electrode system

The electrode system in the SHIPTRAP gas cell has to guide the ions towards the nozzle. Two different types of electrodes are used, an exclusive DC electrode for the ion acceleration and the focussing funnel structure using DC and RF fields. Fig. 3.3 shows this electrode system together with the support structures.

To exit nozzle

RF (+ DC) funnel DC electrode 320 mm

180 mm

Figure 3.3

The electrode system of the SHIPTRAP buffer-gas cell with the RF (+ DC) funnel (40 ring electrodes) and the DC electrode system (5 segments).

3.3.3.1. The DC electrode

The DC-electrode system contains the stopping volume for the ions and is responsible for the fast acceleration towards the funnel structure. As the beam enters the cell almost perpendicular to the extraction direction, the transmission of the incoming ions through the electrodes has to be considered.

The system consists of 5 cylindrical electrodes with an outer diameter of 180 mm, an inner diameter of 160 mm and a moulded depth of 35 mm. In order to ensure high transmission of the ions into the stopping volume, the electrodes form an open structure at the entrance side of the ion beam as visible in Figure 3.4, resulting in a geometrical transmission of 93 %. The mesh structure of the outside is etched in a stainless-steel strip (thickness of 0.2 mm) welded onto the support structure. The different electrode segments are connected together via ceramic screws at a distance of 1 mm.

Figure 3.4

The DC-electrode system, consisting of 5 segments to achieve a homogeneous electric field gradient for the acceleration of the ions. The open shape to one side (achieved by an etched strip structure) ensures high transmission of the ions into the stopping volume when entering under 82.5° at SHIPTRAP. The system is fixed to the backside end flange via four ceramic

The stack of electrodes is fixed via four ceramic insulators to the backside flange, where the five voltage feedthroughs are also placed. Electrodes and feedthroughs are coupled via stainless-steel rods with crimp connections. The voltage, typically 150 – 350 V, is applied via five channels of an iseg HV module (model EHQ F025p). Figure 3.5 shows a distribution of equi-potential lines calculated with SIMION for the used DC-electrode geometry. At the left and the bottom part the mesh structure of the electrode is visible. With these simulations the maximum distances between the wires were determined in order to avoid penetrations of the fields. At the right part of the picture the first two electrode rings of the funnel structure are visible (see next section).

funnel

entrance window

Distribution of equi-potential lines generated with SIMION. Besides the five segments of the DC electrode the first two electrode rings of the funnel structure are visible.

3.3.3.2. The funnel structure

The SHIPTRAP funnel structure consists of 40 stainless-steel ring electrodes with inner diameters between 130 and 5 mm. The rings have a thickness of 1 mm each

and a distance of 1 mm between adjacent rings. Each ring is supported at three positions each enclosing an angle of 120°.

Ceramic end caps Electrical coupling links Ceramic spacer Holding rod Ground plate 5 mm 130 mm 1 mm Figure 3.6

The SHIPTRAP funnel structure in a schematic view with the 40 ring electrode plates and the ceramic spacers (blue/green) between adjacent plates.

In order to decrease the electrical capacitance of the system (in the present configuration about 850 pF), adjacent rings are not fixed to the same holding rod. Since all ring electrodes are individually electrically coupled, ceramic spacer plates are used to isolate the rings. In total six holding rods are mounted to a ground plate to guarantee mechanical stability.

As the rods themselves are grounded, they are covered at the ends by ceramic end caps that prevent sparking between the rods and the adjacent electrodes.

Figure 3.7

Photograph of the funnel structure. The 40 wires for the electrical connections are visible. In order to avoid short-cuts the wires are covered with ceramic beads acting as insulating spacers. The six holder rods (sitting on ground potential) wear ceramic caps in order to avoid discharges.

Two 25-pin SUB-D feedthroughs, one for each RF phase and both placed on a DN100-CF flange, are used for the electrical connection from outside the chamber. In order to avoid impurities and to enable baking the SUB-D plugs inside the chamber are made of aluminium oxide. The electrical coupling to the individual ring electrodes is done via stainless-steel rods (diameter 1 mm), bent in such a way to fit to a

ceramic stress-relief plate attached to the funnel. From there silver-plated copper wires, mutually insulated by ceramic beads, are used to connect to the feedthroughs. This can be seen in Fig. 3.7, showing a photograph of the funnel structure and the electrical connections. The wires are connected to the funnel and the feedthroughs via crimp connectors in order to avoid soldering within the chamber. Outside the chamber an electronic circuit (‘RF-DC Mixer’) is attached to generate the combination of DC and RF voltages supplied to the funnel electrodes. Figure 3.8 schematically shows the principle of this electronic component.

V_RF,in V_RF+ V_RF- P₁ P₂ P₃₉ U_DC1 U_DC2 U_DC39 P₄₀ U_DC40 100 k_Ω 100 nF 1 nF Figure 3.8

Principle of the electrical circuit for the RF funnel. All 40 ring electrode plates (P1 – P40) are connected separately to the 40 DC supply channels.

The sinusoidal function of the RF voltage is supplied by a function generator (SRS DS345). As higher amplitudes (typically 100 – 200 Vpp) are needed than delivered by the DS345, the signal is amplified by an RF power amplifier (KALMUS 170F, 200 W maximum power). Since the funnel has been tested at different RF frequencies, the RF has not been coupled resonantly. Therefore the high output power of the amplifier was chosen in order to deal with the capacitance of the funnel of 850 pF, leading to a required RF power in the range of 50 – 100 W, and in order to deal with the reflection of the RF power back to the amplifier. Behind the amplifier the two RF phases (shifted by π) are separated by coils on a toroidal core. The separated RF amplitudes are then fed to the mixing circuit.

The different DC voltages (typically in the range from 30 to 150 V) are provided by a 40-channel DC power supply.