Optical Interference Coatings

PROCEEDINGS

WEM

IH^HT^

k

wi^^^rr-SERIES

Optical

Interference

_Coatings

Florin

Abeles

Chair/Editor

6-10

_June

1994

Grenoble,

France

Sponsored by

DRET—Direction des Recherches Etudeset

_Techniques,

France Le Ministerede

_{I'Enseignement}

Superieur

etde la

Recherche,

France

The Commissionof the

European Communities,

Directorate General for

Science, Research,

and

_Development

OSA—The

_Optical

_Society

of America

EOS—European

Optical

Society

SPIE—The International

Society

for

Optical Engineering

Published

by

SPIE—The International Society for

Optical Engineering

[proceedingsSI HIFS

Volume 2253

Part One ofTwo Parts

SPIE(The Societyof

_{Photo-Optical}

Instrumentation

_Engineers)

isa

nonprofit society

dedicated to the advancement ofoptical and optoelectronic applied science and technology.

Contents

XV Conference Committee xix Introduction

Part One

SESSION 1 ADVANCES IN DESIGNAND DESIGN

_TECHNIQUES

2

_Design

of

_{optical multilayer coatings}

_{(Invited Paper)}[2253-01]

P. W. _{Baumeister, Deposition}

_Sciences,

Inc. (USA)

10

_Development

of the needle

_{optimization technique}

and newfeatures of

OptiLayer design

software _[2253-02]

A. V.

_Tikhonravov,

M. K.

_Trubetskov,

Moscow State Univ. (Russia)

21

_{Stack-by-stack synthesis}

of antireflection

_coatings

with wide

_angular

incidence [2253-03] M. L. Rastello, Istituto Elettrotecnico Nazionale

_(Italy);

A. Premoli, Univ. deTrieste

_(Italy)

29 Explicit

design

of

_{equiripple edge}

filters [2253-04]

J. S.

Seeley,

Retired (UK)

42

_Synthesis

of infrared filters foruse in

spaceflight

systems [2253-05] C.

_Cole,

R. _Hunneman,J. W. _Bowen, Univ.of

_Reading

(UK)

51 _Overcoming low-index limitations inantireflection_coatingswith additional thickness_[2253-07]

R. R.

_Willey,

_Opto

_Mechanik,

Inc. (USA)

59

_{Analytical approach}

ofrugate filter

_{properties using}

Mathieu functions [2253-08]

Y. Rouxel, CEA/LETI/CMO (France)

73

_Synthesis

of

_{optical coatings using}

asimulated

annealing algorithm

[2253-09] P. Chaton, P. Pinston, J. P. Gailliard,CEA/LETI/CMO(France)

81 Thin film designprogrambased onthe flip-flopmethod witha random search [2253-10] A. M.Piegari, G.Emiliani, ENEA Thin Film Lab.

_(Italy)

89 Polarization effects inopticalthin films [2253-1 1]

K. Rabinovitch, G. Toker, ELOP—Electrooptics Industries Ltd. (Israel)

103 Developmentof transparent conductive ZnO byrf magnetronsputtering [2253-1 3]

F. Demichelis, C. F. _Pirri, E._Tresso, Politecnico di Torino _(Italy) SESSION 2 ADVANCES IN DESIGN AND DESIGNTECHNIQUES: POSTERS

116 Antireflection

_coatings

fortwo

_widely

separated

wavelengths

[2253-14]

120 Designof broadband dichroic mirrorsusing admittance

_matching

[2253-15]

A. G. Dinca, V. _Lupei, Institute of Atomic

_{Physics (Romania);}

M. P. _Dinca, Bucharest Univ. (Romania)

130

_Design

of

_{graded-reflectivity}

mirrors using

rotating

masks

_[2253-16]

A. G. _Dinc5, V. _Lupei, Institute of Atomic

_{Physics (Romania);}

M. P. _{Dinca, Bucharest} Univ. (Romania)

140

_Design

of dielectric

_high

reflectorsfordispersioncontrol in femtosecond lasers[2253-1 7]

R. _Szipdcs, A.

_Kohazi-Kis,

Research Institute for Solid State

_Physics

_(Hungary)

150 Robust filterdesign

by

stochastic

_optimization

[2253-18]

H. Greiner, Philips

Forschungslaboratorien

GmbH (FRG)

161 Fouriertransform techniquewith

_frequency

filteringfor antireflection

_coating

design [2253-146]

P. G.Verly, National Research Council of Canada

168 Darwinian evolution of

_{homogeneous multilayer}

_systems:a new method for

optical coatings

design [2253-149]

S.Martin,A. Brunet-Bruneau, J.

Rivory,

Univ. PierreetMarie Curie(France); M.

_Schoenauer,

Ctr. de

_{Math6matiques}

Appliqu6es (France)

SESSION 3 COATINGS FOR SEVERE ENVIRONMENTAL CONDITIONS

1 76

_Coatings

_{in space:}

_ground-

and

_{space-based stability investigations}

[2253-139]

E.

_Hacker,

P.

_WeiBbrodt,

L.

_Raupach,

H. Lauth,JENOPTIK

Technologie

GmbH _(FRG); H.

_Kappel,

S.

_{Wagner, Jena-Optronik}

GmbH (FRG); D.-R.Schmitt, Deutsche

_{Forschungsanstalt}

fur Luft- und Raumfahrt eV (FRG)

188

_Degradation

of thin films in low earth orbit and

_comparisons

with

_laboratory

simulation[2253-140]

B. R.

_Spady,

R. A.

_Synowicki,

J. S.

_Hale,

M.J. DeVries, N.J. lanno,W.A.

_McGahan,

J. A.

_Woollam,

Univ. of Nebraska/Lincoln (USA)

195

_Optical

and structural

_properties

ofYF3thin films

_{prepared by}

ion-assisted

_deposition

orion beamsputtering

techniques

[2253-141]

J.-Y.

Robic,

V.

_Muffato,

P.

_Chaton,

M.

_Ida,

M. _Berger,CEA/LETI/DOPT (France)

208

_Properties

of rf_magnetron

_sputtered

C and C:N thin films [2253-142]

J. Sobota, Institute of Scientific Instruments (Czech

Republic);

J.

Hrdina,

V.

_Vorlteek,

I.

_Gregora,

Institute of

_Physics

(Czech

Republic);

P.

_Siroky,

HVM Plasma Ltd. (Czech

Republic);

V. _Pefina,

Institute of Nuclear

_Physics

(Czech

Republic)

220

_{High-stability coatings}

_{for space}

_{optics: application}

to _{silex program} [2253-143]

P. Davi, Matra DOD/UAO (France)

228 Recent

_developments

in

_highly

durable

_{protective/antireflection}

coatings for GeandZnS substrates [2253-144]

W. Hasan,

Hughes

Danbury

Optical Systems,

Inc. (USA); S. H. Propst, HughesSanta Barbara Research Ctr. (USA)

236 Multidielectric mirrors for the_super-ACO

_storage-ring

free-electron laser in theUV_[2253-145]

D.

_Garzella,

Univ. de Paris-Sud (France); M. E.Couprie, T. Hara, CEA DSMDRECAM SPAM

(France);

A.

_Delboub<§,

Univ. deParis-Sud (France);M. Billardon, ESPCI (France) SESSION4 COATINGS FOR THE EXTREME REGION OF THE ELECTROMAGNETICSPECTRUM

248

Multilayer

optics for synchrotron x-ray

applications

[2253-129]

E.Ziegler, European

Synchrotron

Radiation

_Facility

(France)

260 _{Glancing-incidencex-rayscattering by multilayers}for XUV mirrors[2253-130] J. P.

_Chauvineau,

Y. _Chambet, C.Marliere,Ctr. Univ. d'Orsay (France)

268 Pulsed laserdepositionofx-rayoptical layer stacks withatomicallyflat interfaces[2253-131]

H. Mai,R. Dietsch, Th. Holz, S. Vollmar, Fraunhofer-lnstitut furWerkstoffphysik und

Schichttechnologie

(FRG);S.

_Hopfe,

R.

_Scholz,

Max-Planck-lnstitutfur

_{Mikrostrukturphysik}

(FRG); P.Wei&brodt, JENOPTIK Technologie GmbH (FRG); R. Krawietz, B.Wehner,Technische

Univ._{Dresden (FRG);} H.

_Eichler,

H.

Wendrock,

Institut fur

Festkorper-

und

_{Werkstofforschung}

(FRG)

280

Multilayer

coatingsfor_{x-ray optics made}

_by

distributed electron

_cyclotron

resonance(DECR)

plasma sputtering [2253-132]

P. Hoghoj, E. Ziegler, E.

Luken,

J.-C.

Peffen,

A. K.

_Freund,

_European

_Synchrotron

Radiation

Facility

(France)

287

_{Manufacturing}

andtesting ofa

laterally graded

divisionparameter

multilayer

inferential mirror

for theXUV[2253-133]

C.

Guichet,

R. Rivoira,G. Rasigni, Facultydes SciencesetTechniquesde St._{Je>6me (France);}

R.J. Barchewitz,J.

Andr6,

Univ. PierreetMarie Curie (France)

299 Multilayer supermirrors:broadband reflection coatingsfor the 15- to 100-keV

range [2253-134]

K. D._Joensen, P. _Gorenstein, Harvard-Smithsonian Ctr.for

_Astrophysics

(USA); F. E.

Christensen,

DanishSpace ResearchInstitute; P.

_Hoghoj,

E.

_Ziegler,

_{J. Susini,}A. K.

_Freund,

_European

Synchrotron

Radiation

_Facility

(France);J. L.

_Wood,

Ovonic

_Synthetic

Materials Co. (USA)

309

_Design

and fabrication ofIRfilters with

_good

flatness [2253-135]

A.

_Zheng,

A.

_Whatley,

Barr_Associates, Ltd. (UK)

319

_Fabrication,

_structure,

_{optical properties,}

and

_stability

ofW-Si

_multilayer

_x-ray

reflectors _[2253-136]

H.-J.

Kuhn,

J.

Kraufclich,

Friedrich-Schiller-Univ. Jena (FRG)

327 Growth

_monitoring

of W/Simultilayers

by

x-ray

reflectivity

and kinetic ellipsometry [2253-1 37]

E. Luken, E.

_Ziegler,

P.

_Heghoj,

A. K. Freund, European Synchrotron Radiation Facility (France);

E.

_Gerdau,

Univ.

_Hamburg

(FRG);A. Fontaine, LURE (France)

333 Infrared filters for space-flightfocal planearray

applications

[2253-154] G.J. Hawkins, R. Hunneman, C.Cole, Univ. of

Reading

(UK)

SESSION 5 MANUFACTURINGTOPICS: PROCESSES I

350 Energetic particlesforvacuum

deposition

(Invited Paper)[2253-19] H. R.

Dobler,

CarlZeiss (FRG)

362 Low-loss ion beam

_{sputtered coatings}

inthenineties [2253-20]

D. T. _Wei, Xerox_Corp. (USA)

374

_Application

of ion-assisted

_deposition

usingagridlessend-Hall ion source for volume

manufacturing

ofthin film optical filters[2253-21]

M. L. Fulton, Avimo Electro-Optics Pte. Ltd. (Singapore)

394 Plasma ion-assisted _deposition: anovel technique for theproductionof

optical

coatings [2253-22]

A._Zoller, S. BeiGwenger, R. _Cotzelmann, K. Matl, LeyboldAG (FRG) SESSION 6 MANUFACTURING TOPICS: MONITORING AND CONTROL

404 Controlofsilicon oxynitridesrefractive index byreactive assisted ion beam sputter

deposition [2253-23]

M. Ida, P.

Chaton,

B.

Rafin,

CEA/LETI/CMO(France)

414 Direct

_optical

monitoring instrument with adouble detection system for the control of

_multilayer

systemsfrom the visibletothenear infrared [2253-24]

M. Tilsch, V.Scheuer, J. Staub, T. T.Tschudi, Technische Hochschule Darmstadt(FRG)

423 In situ

_optical

multichannel _spectrometer system[2253-25]

H. H. _Bauer, E. Nufcler, Carl Zeiss(FRG)

432

_{Computer-integrated manufacturing}

of advanced thin film coatings [2253-26]

H. H. _Bauer, E.

_Nu&ler,

Carl Zeiss(FRG)

SESSION 7 MANUFACTURINGTOPICS: PROCESSES II

438 Newsourceof

energetic

neutral

particles

[2253-27]

H. R.

_Dobler,

Carl Zeiss(FRG)

445 Reduction of

_absorption

losses in ion beamsputter

deposition

of

_{optical coatings}

for the visible

and near infrared [2253-28]

V. Scheuer,M.

_Tilsch,

T. T.

_Tschudi,

Technische Hochschule Darmstadt (FRG)

455 Molecular beam

_deposition

of fluorides [2253-29]

S. _Laux, U. _Kaiser,W.

_Richter,

Univ. Jena (FRG)

462 Electron

_cyclotron

resonance

plasma

chemical vapor

deposition

for rugate filter

manufacturing

[2253-31]

P. V.

_Bulkin,

P. L. _Swart, B.M.

_Lacquet,

Rand Afrikaans Univ. (South Africa)

470 _Rugatefilters for

_{image projection}

in head-mounted displays [2253-32]

J.

Allen,

P. G. _Girow,B. D.

_Herrington,

P. Gee, Omitec Thin Films Ltd. (UK)

476 Laser_protectiondevices basedon multilayer coatingson

polycarbonate

substrates [2253-33]

G.

_Hubrach,

K.J.

Becker,

Rupp and Hubrach KG (FRG); E.

_Hacker,

H.

_Bernitizki,

H. _Lauth,

JENOPTIK

Technologie

GmbH (FRG)

486

_{Optical coatings}

on

plastic

lenses

by

PICVD-technique [2253-34]

W. Mohl,U. _Lange, V. Paquet, Schott Research Ctr. (FRG)

492 Structural and chemical _propertiesofthin films

_{(Al203, Zr02,}

BN) and

multicomponent

films

(Zr02,Ti)

deposited by

pulsedlaserdeposition [2253-36]

E. W. _Kreutz,M. Alunovic, A.Voss, W.

_Pfleging,

H. _Sung, D. A._Wesner,

Rheinisch-Westfalischen Technischen Hochschule Aachen (FRG)

502

_Single

and

_multilayer

coatings deposited bylaser-assisted electron beam _{evaporation [2253-37]}

D.

_Schafer,

P. _{Thomsen-Schmidt,} Berliner Institut fur

_Optik

GmbH

_(FRG);

H.

_Johansen,

T. _Martini,Max-Planck-lnstitutfur _{Mikrostrukturphysik (FRG);} B.

_Steiger,

G.

_Pfeifer,

G.

_ReiGe,

Hochschule fur Technik und Wirtschaft (FRG)

SESSION 8 MANUFACTURING TOPICS: MATERIALS AND PROPERTIES

512

Amorphous fluoropolymer:

next-generation optical coating candidate(Invited Paper) [2253-39]

R. Chow, G. E.Loomis,M. K.

_Spragge,

E. F. Lindsey, F. Rainer, R. L. Ward,M. R. Kozlowski,

Lawrence Livermore National Lab.(USA)

521

_{Investigation}

of the

_preparation

andproperties oforganic dye/metal oxide compositethin films [2253-40]

S._Jager, F. Neumann, C.-P.

Klages,

Fraunhofer-lnstitut fur Schicht- und Oberflachentechnik (FRG)

528 Correlation between structural,

mechanical,

and

_optical

_properties of_ZnSe-MgF2mixturethin films [2253-41]

L. Nouvelot, J.-Y. Robic,CEA/LETI/CMO (France)

539 Depositionand characterization of a-SiC:H thin films [2253-42]

F. Demichelis, C. F. _Pirri, E. _Tresso, F.

_Valente,

Politecnico di Torino

_(Italy);

E.

_Bolzan,

V. _Rigato,

INFM di Padova(Italy)

SESSION 9 MANUFACTURING TOPICS: POSTERS

552 Ion-assisted deposition ofyttrium fluorideas asubstitute for thorium fluoride:

application

to infrared antireflection coatingon

germanium

[2253-43]

J.-Y. Robic, B. _{Rolland, J.} C.

_Deutsch,

CEA/LETI/CMO(France); P.

_Gallais,

SOPELEM/SOFRETEC (France)

559 lon-beam-assisted

_deposition

of

_{thermally evaporated}

Crthin films [2253-44] C. K.

_Hwangbo,

K.-L. _Yoo, H.-J.

Cho,

Inha Univ. (Korea)

566 Film thicknessand

_growth

rate measurement

_by

modulation of the interference of

_light

in a

plate [2253-46]

M. T. Tavassoli,Tehran Univ. _(Iran); M. _Cargar, H.

_Assadi,

Ghods

_Industry

(Iran)

577 Low-loss mirrors at 514 nmfor

large

interferometer

optics

[2253-48] H. H.Bauer, E.

_NuGler,

Carl Zeiss (FRG)

SESSION 10 NONOPTICAL CHARACTERIZATION:BASICTECHNIQUES

584 Thinfilm

_morphology

in transmission electron microscopy(TEM)as revealedbyheat-shock

fracturingand

_replication

of film cross sections (Invited Paper) [2253-49] T. MUller, BAL-TEC AG (Liechtenstein); H. K. Pulker, Balzers AG(Liechtenstein)

596 Investigation of the microstructure of

_coatings

for

_high-power

lasers

_{by nonoptical}

techniques

[2253-50]

R. J. Tench,M. R.

_Kozlowski,

R.

_Chow,

Lawrence LivermoreNational Lab. (USA)

603

_Secondary

neutral massspectrometry(SNMS)

depth profile analysis

of

optical

coatings

[2253-51]

P.

_Weiftbrodt,

D.

_Mademann,

E.

_Hacker,

JENOPTIK

Technologie

GmbH (FRC)

SESSION 11 NONOPTICAL CHARACTERIZATION:STRUCTURAL ANDMECHANICAL PROPERTIES

614

_Overlapping

of

_roughness

_spectra measured in

_macroscopic

(optical)andmicroscopic(AFM) bandwidths [2253-53]

C. _Amra,C. _Deumie, D.Torricini, P. Roche, R. Galindo,Ecole NationaleSuperieurede _Physique

de Marseille (France); P. Dumas,F. Salvan, Faculte des Sciences de Luminy (France)

631 Characterization of

_{statistically rough}

surfaces of thindeposits byan autoregressive

process[2253-62]

M.

_Lafraxo,

M. _Rasigni,F.

_Abdellani,

V. _Buat,G.

_Rasigni,

Lab. dePhysiquedes Interactions Photons-Matiere (France);A. Llebaria, Lab. d'Astronomie

Spatiale

(France)

643 Surface

_topography

restitution for

_rough

thin filmdeposits [2253-55]

A.

_Llebaria,

Lab. d'Astronomie

_{Spatiale (France);}

F.Abdellani,M. Rasigni, G.Rasigni, Lab. de

_Physique

des Interactions Photons-Matiere (France)

655 Modified floatationmethod as anaccuratetool fordeterminingthemacroscopic massdensity of

_optical

interference

_coatings

[2253-57]

M.

_Vogel,

O.

_Stenzel,

Univ.of

_Technology

Chemnitz-Zwickau (FRG)

667

_Application

of the Fouriertransform in a

preliminary analysis

of the

reflectivity

curveobtained

by grazing

x-rayreflectometry [2253-58]

F. Bridou, Institutd'Optique (France); B.

_Pardo,

Univ. Pierre et Marie Curie(France)

679

_X-ray

investigationsof

supersmooth

surfaces [2253-59]

I. V. Kozhevnikov, P.N. LebedevPhysicalInstitute _(Russia);V. E.Asadchikov, B. M.Alaudinov,

Institute ofCrystallography (Russia); A. Yu.

_Karabekov,

A. V.

_Vinogradov,

P.N. Lebedev

_Physical

Institute(Russia)

SESSION 12 NONOPTICALCHARACTERIZATION:POSTERS

692 Effects ofanear-surfacetransition

layer

on_{x-ray reflection and} scattering [2253-60] I. A. Artioukov, I. V. Kozhevnikov, P.N. Lebedev

_Physical

Institute (Russia)

704

_Study

on the hardness of

composite

films prepared by the ion-assistedcoevaporationprocess

[2253-61]

R.Y._Tsai, F. C. _Ho, Industrial

_Technology

Research Institute (Taiwan)

712 Measurementof thermal

_conductivity

in dielectric films

by

the thermal

_pulse

method [2253-63]

M.

_Dieckmann,

D. Ristau, U.Willamowski, H.

Schmidt,

Laser Zentrum Hannover (FRG)