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Magnetron Sputtering

Pulsed DC reactive magnetron sputtering of aluminum nitride thin films

Pulsed DC reactive magnetron sputtering of aluminum nitride thin films

... The basal plane in the hexagonal structure has the lowest surface energy and the maximum atomic density. More energetic atoms from the target are ejected at higher target current and thus adatoms on the substrate have a ...

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Growth and Characterization of Cu2znsns4 Thin Film by RF-Magnetron Sputtering

Growth and Characterization of Cu2znsns4 Thin Film by RF-Magnetron Sputtering

... beam sputtering [10], electron beam evaporation [11, 12], RF sputtering [13, 14], hybrid sputtering [15], pulsed laser deposition [16], photo- chemical deposition [17], sol–gel [18], spray pyrolysis ...

6

High power impulse magnetron sputtering discharges: Instabilities and plasma self organization

High power impulse magnetron sputtering discharges: Instabilities and plasma self organization

... impulse magnetron sputtering plasmas which are likely to be of the generalized drift wave ...the magnetron and cause periodic shifts in floating ...

6

Catalytic growth of ZnO nanostructures by r f  magnetron sputtering

Catalytic growth of ZnO nanostructures by r f magnetron sputtering

... The catalytic effect of gold seed particles deposited on a substrate prior to zinc oxide (ZnO) thin film growth by magnetron sputtering was investigated. For this purpose, selected ultra thin gold layers, ...

6

Stability of Postannealed Silicon Dioxide Electret Thin Films Prepared
by Magnetron Sputtering

Stability of Postannealed Silicon Dioxide Electret Thin Films Prepared by Magnetron Sputtering

... on Al-coated and uncoated Si wafer substrates at a tempera- ture of 250 to 350 ◦ C by conventional planar r.f. magnetron sputtering using a fused quartz target: target and substrate surface separation, 40 ...

5

Characteristics of GaN Thin Films Using Magnetron Sputtering System

Characteristics of GaN Thin Films Using Magnetron Sputtering System

... the magnetron sputtering system under various conditions. Sputtering with pure argon gas under 40 W - 50 W RF power and low pressure (4 mT - 5 mT) has resulted in dark shade films that are highly ...

10

Effect Of Electrical Grounding Of Substrate On The Magnetron Sputtering Of Titanium Film

Effect Of Electrical Grounding Of Substrate On The Magnetron Sputtering Of Titanium Film

... The titanium oxide is selected as a target in DC magnetron sputtering. The effect electrical grounding is identified by using three types of tester and they are the optical image by using a microscope, ...

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Magnetron Sputtering Silicon Thin Film Electrodes for Lithium-Ion Batteries

Magnetron Sputtering Silicon Thin Film Electrodes for Lithium-Ion Batteries

... Thin silicon films were deposited on surface-modified copper foil by magnetron sputtering; Si mass loading varied from 0.013 to 0.400 mg/cm. Scanning electron microscopy (SEM), X-ray photoelectron ...

15

Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique

Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique

... Defect formation in PVD coatings is well known and has been described before by various authors [2–10].They have systematically defined the defects according to their size and shape. In this research extensive SEM ...

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Plasma diagnosis of reactive high power impulse magnetron sputtering (HiPIMS) discharges

Plasma diagnosis of reactive high power impulse magnetron sputtering (HiPIMS) discharges

... Several studies [107–109] have investigated the formation of negative ions scattered from metallic surfaces exposed to oxygen. Negative ion yields for a clean Mg surface were found to be small, however, it was found that ...

220

Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering

Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering

... deposited by RF magnetron sputtering at a constant power of 150 W and at different working pressures, i.e., (3, 5) Pa, have been shown in Figure 2a,b for unbiased substrates. Both the surface structures ...

9

Studies on Nanocrystalline Cods Thin Films Prepared By Magnetron Sputtering Technique

Studies on Nanocrystalline Cods Thin Films Prepared By Magnetron Sputtering Technique

... Abstract: Cadmium sulphide (CdS) thin films in nanocrystalline form were deposited on corning glass substrate at temperatures 240K and 260K by d. c. magnetron sputtering in argon plasma. The prepared films ...

7

Deposition and characterisation of Ti02 layer using magnetron sputtering deposition technique

Deposition and characterisation of Ti02 layer using magnetron sputtering deposition technique

... Study shows that Ti02 thin film quality using magnetron sputtering technique is highly depended on critical parameters such as oxygen partial pressure, substrate type, discharge power, w[r] ...

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Fabrication of smart glass electrochromic device using RF magnetron sputtering

Fabrication of smart glass electrochromic device using RF magnetron sputtering

... about sputtering process on 1852 whereas others had observed the effect while studying glow ...then, magnetron sputtering was studied by several researcher and the first uses of radio frequency (RF) ...

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Magnetron Sputtering Coating of Protective Fabric Study on Influence of Thermal Properties

Magnetron Sputtering Coating of Protective Fabric Study on Influence of Thermal Properties

... of magnetron sput- tering coating on the fabric, so that the fabric has a heat insulation cooling ...tron sputtering technique, the high pure aluminum as the sputtering target material; non metal ...

8

Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering

Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering

... Zinc sulfide [ZnS] thin films were deposited on glass substrates using radio frequency magnetron sputtering. The substrate temperature was varied in the range of 100°C to 400°C. The structural and optical ...

7

Heteroepitaxial growth of TiN film on MgO (100) by reactive magnetron sputtering

Heteroepitaxial growth of TiN film on MgO (100) by reactive magnetron sputtering

... reactive sputtering is commonly used for deposition of polycrystalline and single-crystalline ...reactive magnetron sputtering of pure Ti ...) magnetron sputtering of a Ti target has ...

5

DLC Film Fabricated by a Composite Technique of Unbalanced
Magnetron Sputtering and PIII

DLC Film Fabricated by a Composite Technique of Unbalanced Magnetron Sputtering and PIII

... DLC multilayer films were deposited on an AISI 304 stainless steel substrate by the composite technique of unbalanced magnetron sputtering and plasma immersion ion implantation (PIII). Structure ...

5

Characterization Of Microwave Obtained Zno Thin Films By RF Magnetron Sputtering

Characterization Of Microwave Obtained Zno Thin Films By RF Magnetron Sputtering

... r.f magnetron sputtering using a zinc target (99, 99%) with diameter of 51 mm and 6 mm ...organic. Magnetron sputtering was carried out in oxygen and argon mixed gas atmosphere by supplying ...

5

Preparation of Calcium Phosphate Films by Radiofrequency Magnetron Sputtering

Preparation of Calcium Phosphate Films by Radiofrequency Magnetron Sputtering

... in sputtering to obtain highly adhered coatings, particularly for calcium phosphate ...RF magnetron sputtering using fully-dense hot-pressed -TCP targets, and the effects of the process conditions on ...

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